Inventor · disambiguated record
Kazuo Kohmura
Also filed as: KOHMURA KAZUO
38 granted patents·7 pending applications·80 citations·filing 2001–2025
96Inventor score
Top patents by PatentIndex Score
45 records- 0195US9841670B2Support frame for pelliclesNIPPON LIGHT METAL CO·Filed 2015·Granted Dec 12, 2017·11 cites·16 claims
- 0293US9703187B2Pellicle and EUV exposure device comprising sameMITSUI CHEMICALS INC·Filed 2014·Granted Jul 11, 2017·11 cites·14 claims
- 0388US10108084B2Pellicle membrane, pellicle, original plate for exposure, exposure apparatus, and method of producing semiconductor deviceMITSUI CHEMICALS INC·Filed 2015·Granted Oct 23, 2018·4 cites·17 claims
- 0486US11042085B2Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor deviceMITSUI CHEMICALS INC·Filed 2018·Granted Jun 22, 2021·4 cites·24 claims
- 0585US11204547B2Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicleMITSUI CHEMICALS INC·Filed 2020·Granted Dec 21, 2021·1 cites·17 claims
- 0684US11332643B2Adhesive member and production method for adhesive memberMITSUI CHEMICALS INC·Filed 2018·Granted May 17, 2022·1 cites·12 claims
- 0780US10585348B2Pellicle, pellicle production method and exposure method using pellicleMITSUI CHEMICALS INC·Filed 2017·Granted Mar 10, 2020·2 cites·17 claims
- 0878US7585789B2Method for forming porous insulation filmASM JAPAN·Filed 2006·Granted Sep 8, 2009·6 cites·17 claims
- 0975US10216081B2Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor deviceMITSUI CHEMICALS INC·Filed 2015·Granted Feb 26, 2019·2 cites·21 claims
- 1074US9780008B2Semiconductor device, method for manufacturing the same, and rinsing liquidMITSUI CHEMICALS INC·Filed 2013·Granted Oct 3, 2017·3 cites·7 claims
- 1173US7727907B2Manufacturing method of semiconductor device and semiconductor device produced therewithULVAC INC·Filed 2005·Granted Jun 1, 2010·5 cites·15 claims
- 1271US12287569B2Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithographyMITSUI CHEMICALS INC·Filed 2021·Granted Apr 29, 2025·0 cites·14 claims
- 1370US9169353B2Sealing composition for semiconductor, semiconductor device and method of producing the same, and polymer and method of producing the sameMITSUI CHEMICALS INC·Filed 2013·Granted Oct 27, 2015·2 cites·16 claims
- 1470US2025216772A1Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithographyMITSUI CHEMICALS INC·Filed 2025·Application pending·0 cites
- 1569US8288295B2Manufacturing method of semiconductor device and semiconductor device produced therewithOKU YOSHIAKI·Filed 2005·Granted Oct 16, 2012·4 cites·11 claims
- 1666US12474630B2Pellicle demounting method and pellicle demounting preprocessing deviceMITSUI CHEMICALS INC·Filed 2020·Granted Nov 18, 2025·0 cites·9 claims
- 1766US12271109B2Pellicle demounting method, and pellicle demounting deviceMITSUI CHEMICALS INC·Filed 2020·Granted Apr 8, 2025·0 cites·12 claims
- 1865US8394457B2Precursor composition for porous thin film, method for preparation of the precursor composition, porous thin film, method for preparation of the porous thin film, and semiconductor deviceFUJII NOBUTOSHI·Filed 2007·Granted Mar 12, 2013·2 cites·6 claims
- 1962US7291215B2Coating liquid for forming porous silicaMITSUI CHEMICALS INC·Filed 2004·Granted Nov 6, 2007·8 cites·5 claims
- 2059US2024402590A1Pellicle, exposure original plate, exposure device, and method of manufacturing pellicleMITSUI CHEMICALS INC·Filed 2022·Application pending·0 cites
- 2158US8384208B2Semiconductor device and method of fabricating the sameSANYO ELECTRIC CO·Filed 2007·Granted Feb 26, 2013·2 cites·6 claims
- 2258US7807267B2Method of modifying porous film, modified porous film and use of sameMITSUI CHEMICALS INC·Filed 2003·Granted Oct 5, 2010·7 cites·13 claims
- 2357US11852968B2Pellicle, exposure master, exposure device and method for manufacturing semiconductor deviceMITSUI CHEMICALS INC·Filed 2020·Granted Dec 26, 2023·0 cites·18 claims
- 2457US11243463B2Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor deviceMITSUI CHEMICALS INC·Filed 2020·Granted Feb 8, 2022·0 cites·17 claims
- 2557US11137677B2Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing methodMITSUI CHEMICALS INC·Filed 2019·Granted Oct 5, 2021·0 cites·13 claims
- 2655US6852299B2Water-repellent porous silica, method for preparation thereof and use thereofMITSUI CHEMICALS INC·Filed 2001·Granted Feb 8, 2005·5 cites·21 claims
- 2753US10895805B2Pellicle manufacturing method and method for manufacturing photomask with pellicleMITSUI CHEMICALS INC·Filed 2017·Granted Jan 19, 2021·0 cites·20 claims
- 2852US10955740B2Pellicle frame and pellicleNIPPON LIGHT METAL CO·Filed 2017·Granted Mar 23, 2021·0 cites·7 claims
- 2952US2023080753A1Pellicle, and production method thereforMITSUI CHEMICALS INC·Filed 2021·Application pending·0 cites
- 3051US10606169B2Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicleMITSUI CHEMICALS INC·Filed 2016·Granted Mar 31, 2020·0 cites·8 claims
- 3151US10261411B2Pellicle film, pellicle frame, pellicle, and method for producing sameMITSUI CHEMICALS INC·Filed 2017·Granted Apr 16, 2019·0 cites·9 claims
- 3251US8603588B2Composition and method for production thereof, porous material and method for production thereof, interlayer insulating film, semiconductor material, semiconductor device, and low-refractive-index surface protection filmKOHMURA KAZUO·Filed 2009·Granted Dec 10, 2013·0 cites·9 claims
- 3347US10020238B2Method for manufacturing composite body and compositionMITSUI CHEMICALS INC·Filed 2014·Granted Jul 10, 2018·0 cites·17 claims
- 3445US11859110B2Substrate laminated body and method of manufacturing substrate laminated bodyMITSUI CHEMICALS INC·Filed 2018·Granted Jan 2, 2024·0 cites·17 claims
- 3545US8212338B2Manufacturing method of semiconductor device and semiconductor device produced therewithOKU YOSHIAKI·Filed 2010·Granted Jul 3, 2012·0 cites·4 claims
- 3644US2019121229A1Pellicle film, pellicle frame body, pellicle, and method for manufacturing pellicleMITSUI CHEMICALS INC·Filed 2018·Application pending·0 cites
- 3743US2023036846A1Pellicle film, pellicle, original plate for exposure, exposure device, method of producing pellicle, and method of producing semiconductor deviceMITSUI CHEMICALS INC·Filed 2021·Application pending·0 cites
- 3842US2009053503A1Precursor composition for porous film and method for preparing the composition, porous film and method for preparing the porous film, and semiconductor deviceFUJII NOBUTOSHI·Filed 2006·Application pending·0 cites
- 3941US2009206453A1Method for Preparing Modified Porous Silica Films, Modified Porous Silica Films Prepared According to This Method and Semiconductor Devices Fabricated Using the Modified Porous Silica FilmsULVAC INC·Filed 2006·Application pending·0 cites
- 4039US11581197B2Method for producing semiconductor device and intermediate for semiconductor deviceMITSUI CHEMICALS INC·Filed 2018·Granted Feb 14, 2023·0 cites·11 claims
- 4139US8304924B2Composition for sealing semiconductor, semiconductor device, and process for producing semiconductor deviceONO SHOKO·Filed 2010·Granted Nov 6, 2012·0 cites·9 claims
- 4238US10488751B2Pellicle, production method thereof, exposure methodMITSUI CHEMICALS INC·Filed 2017·Granted Nov 26, 2019·0 cites·15 claims
- 4337US10988647B2Semiconductor substrate manufacturing method, semiconductor device, and method for manufacturing sameMITSUI CHEMICALS INC·Filed 2018·Granted Apr 27, 2021·0 cites·18 claims
- 4437US8105661B2Method for forming porous insulation filmHYODO YASUYOSHI·Filed 2006·Granted Jan 31, 2012·0 cites·13 claims
- 4536US8956977B2Semiconductor device production method and rinseONO SHOKO·Filed 2011·Granted Feb 17, 2015·0 cites·12 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →