Inventor · disambiguated record
Brent A. Mcclure
Also filed as: MCCLURE BRENT · MCCLURE BRENT A
16 granted patents·1 pending application·424 citations·filing 1996–2007
94Inventor score
Top patents by PatentIndex Score
17 records- 0191US6780666B1Imager photo diode capacitor structure with reduced process variation sensitivityMICRON TECHNOLOGY INC·Filed 2003·Granted Aug 24, 2004·42 cites·28 claims
- 0289US5844771ACapacitor constructionMICRON TECHNOLOGY INC·Filed 1997·Granted Dec 1, 1998·82 cites·3 claims
- 0387US5843830ACapacitor, and methods for forming a capacitorMICRON TECHNOLOGY INC·Filed 1996·Granted Dec 1, 1998·69 cites·15 claims
- 0484US5930639AMethod for precision etching of platinum electrodesMICRON TECHNOLOGY INC·Filed 1996·Granted Jul 27, 1999·71 cites·37 claims
- 0580US6171925B1Capacitor, and methods for forming a capacitorMICRON TECHNOLOGY INC·Filed 1998·Granted Jan 9, 2001·48 cites·1 claims
- 0678US7440255B2Capacitor constructions and methods of formingMICRON TECHNOLOGY INC·Filed 2003·Granted Oct 21, 2008·20 cites·56 claims
- 0776US6709945B2Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor deviceMICRON TECHNOLOGY INC·Filed 2001·Granted Mar 23, 2004·21 cites·11 claims
- 0871US7326503B2Process for color filter array residual pigment removalMICRON TECHNOLOGY INC·Filed 2005·Granted Feb 5, 2008·4 cites·22 claims
- 0969US5792593AMethod for forming a structure using redeposition of etchable layerMICRON TECHNOLOGY INC·Filed 1997·Granted Aug 11, 1998·37 cites·9 claims
- 1062US7015528B2Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor deviceMICRON TECHNOLOGY INC·Filed 2004·Granted Mar 21, 2006·9 cites·18 claims
- 1162US7008816B2Imager photo diode capacitor structure with reduced process variation sensitivityMICRON TECHNOLOGY INC·Filed 2004·Granted Mar 7, 2006·4 cites·10 claims
- 1259US7037764B2Method of forming a contact in a pixel cellMICRON TECHNOLOGY INC·Filed 2004·Granted May 2, 2006·6 cites·26 claims
- 1354US7233038B2Self masking contact using an angled implantMICRON TECHNOLOGY INC·Filed 2005·Granted Jun 19, 2007·0 cites·20 claims
- 1452US6027860AMethod for forming a structure using redeposition of etchable layerMICRON TECHNOLOGY INC·Filed 1998·Granted Feb 22, 2000·11 cites·33 claims
- 1543US2005269669A1Capacitor constructions and methods of formingMCCLURE BRENT A·Filed 2005·Application pending·0 cites
- 1638US8129079B2Process for color filter array residual pigment removalHODGE EARNEST·Filed 2007·Granted Mar 6, 2012·0 cites·10 claims
- 1736US6586816B2Semiconductor structures formed using redeposition of an etchable layerMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 1, 2003·0 cites·17 claims
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