Inventor · disambiguated record
Kentaro Kasa
Also filed as: KASA KENTARO
11 granted patents·6 pending applications·3 citations·filing 2009–2024
79Inventor score
Top patents by PatentIndex Score
17 records- 0168US9952505B2Imprint device and pattern forming methodTOSHIBA MEMORY CORP·Filed 2014·Granted Apr 24, 2018·1 cites·7 claims
- 0266US12510830B2Measuring device and measuring methodKIOXIA CORP·Filed 2024·Granted Dec 30, 2025·0 cites·11 claims
- 0363US8085393B2Exposure apparatus inspection method and method for manufacturing semiconductor deviceKASA KENTARO·Filed 2009·Granted Dec 27, 2011·2 cites·21 claims
- 0461US12449736B2Measurement apparatus and measurement methodKIOXIA CORP·Filed 2022·Granted Oct 21, 2025·0 cites·20 claims
- 0548US11841331B2Measuring and calculating apparatus and measuring and calculating programKIOXIA CORP·Filed 2021·Granted Dec 12, 2023·0 cites·6 claims
- 0646US8878129B1Pattern measurement apparatus and pattern measurement methodTOSHIBA KK·Filed 2014·Granted Nov 4, 2014·0 cites·20 claims
- 0744US2016043037A1Mark, semiconductor device, and semiconductor waferTOSHIBA KK·Filed 2014·Application pending·0 cites
- 0843US2014340660A1Pattern formation method and pattern formation apparatusTOSHIBA KK·Filed 2013·Application pending·0 cites
- 0942US9188879B2Substrate holding apparatus, pattern transfer apparatus, and pattern transfer methodKASA KENTARO·Filed 2012·Granted Nov 17, 2015·0 cites·20 claims
- 1041US10955753B2Substrate processing control apparatus, recording medium, and method of manufacturing photomaskTOSHIBA MEMORY CORP·Filed 2018·Granted Mar 23, 2021·0 cites·5 claims
- 1141US10325857B2Semiconductor device manufacturing method and semiconductor waferTOSHIBA MEMORY CORP·Filed 2018·Granted Jun 18, 2019·0 cites·4 claims
- 1241US2012090489A1Nanoimprint methodSUZUKI MASATO·Filed 2011·Application pending·0 cites
- 1341US2014094015A1Alignment measurement system, overlay measurement system, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2013·Application pending·0 cites
- 1438US8953163B2Exposure apparatus, exposure method, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2013·Granted Feb 10, 2015·0 cites·20 claims
- 1537US9941177B2Pattern accuracy detecting apparatus and processing systemTOSHIBA MEMORY CORP·Filed 2016·Granted Apr 10, 2018·0 cites·13 claims
- 1636US2012068372A1Nanoimprint template and pattern transcription apparatusMIMOTOGI AKIKO·Filed 2011·Application pending·0 cites
- 1735US2017229300A1Imprint apparatus, imprint method, and pattern forming methodTOSHIBA KK·Filed 2016·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →