Inventor · disambiguated record
Vladimir Vitalevitch Ivanov
Also filed as: IVANOV VLADIMIR V · IVANOV VLADIMIR VITAL EVITCH · IVANOV VLADIMIR VITALEVITCH
25 granted patents·3 pending applications·196 citations·filing 2003–2012
96Inventor score
Top patents by PatentIndex Score
28 records- 0198US7462850B2Radical cleaning arrangement for a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Dec 9, 2008·60 cites·13 claims
- 0288US7812330B2Radical cleaning arrangement for a lithographic apparatusASML NETHERLANDS BV·Filed 2008·Granted Oct 12, 2010·8 cites·10 claims
- 0388US7504643B2Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangementASML NETHERLANDS BV·Filed 2006·Granted Mar 17, 2009·10 cites·50 claims
- 0487US7372058B2Ex-situ removal of deposition on an optical elementASML NETHERLANDS BV·Filed 2005·Granted May 13, 2008·8 cites·10 claims
- 0585US7495239B2Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangementASML NETHERLANDS BV·Filed 2005·Granted Feb 24, 2009·8 cites·37 claims
- 0683US7251012B2Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debrisASML NETHERLANDS BV·Filed 2003·Granted Jul 31, 2007·25 cites·53 claims
- 0772US7061574B2Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jun 13, 2006·11 cites·26 claims
- 0871US7767989B2Ex-situ removal of deposition on an optical elementASML NETHERLANDS BV·Filed 2006·Granted Aug 3, 2010·1 cites·29 claims
- 0968US7684012B2Lithographic device, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·2 cites·21 claims
- 1068US7501642B2Radiation sourceASML NETHERLANDS BV·Filed 2005·Granted Mar 10, 2009·7 cites·21 claims
- 1167US7696492B2Radiation system and lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Apr 13, 2010·6 cites·35 claims
- 1267US7279690B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 9, 2007·2 cites·37 claims
- 1366US7135692B2Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiationASML NETHERLANDS BV·Filed 2003·Granted Nov 14, 2006·8 cites·13 claims
- 1465US8018574B2Lithographic apparatus, radiation system and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 13, 2011·2 cites·25 claims
- 1565US7518134B2Plasma radiation source for a lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Apr 14, 2009·6 cites·21 claims
- 1665US6862075B2Lithographic projection apparatus, device manufacturing method, and device manufacturing therebyASML NETHERLANDS BV·Filed 2003·Granted Mar 1, 2005·8 cites·33 claims
- 1762US7696493B2Radiation system and lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Apr 13, 2010·5 cites·22 claims
- 1862US7208746B2Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Apr 24, 2007·9 cites·9 claims
- 1960US8598550B2Ex-situ removal of deposition on an optical elementBANINE VADIM YEVGENYEVICH·Filed 2012·Granted Dec 3, 2013·0 cites·27 claims
- 2060US8362444B2Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2010·Granted Jan 29, 2013·1 cites·26 claims
- 2160US7462851B2Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Dec 9, 2008·5 cites·18 claims
- 2256US8134136B2Ex-situ removal of deposition on an optical elementBANINE VADIM YEVGENYEVICH·Filed 2010·Granted Mar 13, 2012·0 cites·11 claims
- 2353US7838853B2Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Nov 23, 2010·2 cites·20 claims
- 2449US7557366B2Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Jul 7, 2009·2 cites·42 claims
- 2541US2007085984A1Lithographic projection apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 2640US2010141909A1Radiation system and lithographic apparatusASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 2737US7335900B2Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted Feb 26, 2008·0 cites·9 claims
- 2836US2011043777A1Target material, a source, an euv lithographic apparatus and a device manufacturing method using the sameASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
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