Inventor · disambiguated record
Tomoko Aoki
Also filed as: AOKI TOMOKO
10 granted patents·4 pending applications·188 citations·filing 1991–2004
90Inventor score
Top patents by PatentIndex Score
14 records- 0189US5459114AMethod for producing ceramic productsTONEN CORP·Filed 1993·Granted Oct 17, 1995·70 cites·12 claims
- 0287US6767641B1Method for sealing fine groove with siliceous material and substrate having siliceous coating formed thereonCLARIANT FINANCE BVI LTD·Filed 2000·Granted Jul 27, 2004·38 cites·15 claims
- 0376US5436398APolymetalosilazane, process of producing same, silicon nitride based ceramic, and process of preparing sameTONEN CORP·Filed 1994·Granted Jul 25, 1995·24 cites·6 claims
- 0475US7754003B2Coating composition and low dielectric siliceous material produced by using sameAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted Jul 13, 2010·18 cites·5 claims
- 0564US6310168B1Aminated polysilazane and process for the preparation thereofTONEN CORP·Filed 1998·Granted Oct 30, 2001·18 cites·3 claims
- 0659US5142082ASilane compound and processes for the preparation thereofTONEN CORP·Filed 1991·Granted Aug 25, 1992·7 cites·5 claims
- 0756US6746714B2Porous silica coating with low dielectric constant, semiconductor device and coating compositionCLARIANT FINANCE BVI LTD·Filed 2003·Granted Jun 8, 2004·4 cites·8 claims
- 0855US5248803ASilane compound and processes for the preparation thereofTONEN CORP·Filed 1992·Granted Sep 28, 1993·6 cites·1 claims
- 0944US5359114ASilane compound and processes for the preparation thereofTONEN CORP·Filed 1993·Granted Oct 25, 1994·3 cites·8 claims
- 1043US7368491B2Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor deviceAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted May 6, 2008·0 cites·2 claims
- 1138US2003099843A1Low-permittivity porous siliceous film, semiconductor devices having such films, and coating composition for forming the filmFiled 2001·Application pending·0 cites
- 1238US2007117892A1Coating composition, porous silica-based film, method for producing porous silica-based film and semiconductor deviceAOKI TOMOKO·Filed 2004·Application pending·0 cites
- 1337US2004081912A1Photosensitive polysilazane composition and method of forming patterned polysilazane filmFiled 2003·Application pending·0 cites
- 1436US2004028828A1Porous siliceous film having low permittivity, semiconductor devices and coating compositionFiled 2001·Application pending·0 cites
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