Inventor · disambiguated record
Seung Chan Moon
Also filed as: MOON SEUNG C · MOON SEUNG CHAN
23 granted patents·6 pending applications·765 citations·filing 1990–2009
95Inventor score
Files withHYNIX SEMICONDUCTOR INC20HYUNDAI ELECTRONICS IND7DONGJIN SEMICHEM CO LTD1YOUNGCHANG CHEMICAL CO LTD1
Top patents by PatentIndex Score
29 records- 0198US7238653B2Cleaning solution for photoresist and method for forming pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Jul 3, 2007·464 cites·23 claims
- 0298US6916594B2Overcoating composition for photoresist and method for forming photoresist pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Jul 12, 2005·128 cites·16 claims
- 0387US7303858B2Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Dec 4, 2007·9 cites·26 claims
- 0481US7442648B2Method for fabricating semiconductor device using tungsten as sacrificial hard maskHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Oct 28, 2008·9 cites·20 claims
- 0574US5716758AProcess for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masksHYUNDAI ELECTRONICS IND·Filed 1997·Granted Feb 10, 1998·36 cites·8 claims
- 0673US7494935B2Method for forming fine pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Feb 24, 2009·4 cites·20 claims
- 0773US7462439B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Dec 9, 2008·3 cites·22 claims
- 0873US7381519B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Jun 3, 2008·4 cites·22 claims
- 0971US7534548B2Polymer for immersion lithography and photoresist compositionHYNIX SEMICONDUCTOR INC·Filed 2005·Granted May 19, 2009·2 cites·18 claims
- 1071US5741625AProcess for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled materialHYUNDAI ELECTRONICS IND·Filed 1996·Granted Apr 21, 1998·32 cites·4 claims
- 1169US7288364B2Top anti-reflective coating composition and method for pattern formation of semiconductor device using the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Oct 30, 2007·3 cites·39 claims
- 1267US7615338B2Photoresist coating composition and method for forming fine pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Nov 10, 2009·2 cites·21 claims
- 1362US7494599B2Method for fabricating fine pattern in semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Feb 24, 2009·1 cites·24 claims
- 1462US5583069AMethod for making a fine annular charge storage electrode in a semiconductor device using a phase-shift maskHYUNDAI ELECTRONICS IND·Filed 1995·Granted Dec 10, 1996·32 cites·20 claims
- 1558US7838201B2Method for manufacturing a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2009·Granted Nov 23, 2010·0 cites·18 claims
- 1658US7022458B2Photoresist polymer and photoresist composition containing the sameDONGJIN SEMICHEM CO LTD·Filed 2003·Granted Apr 4, 2006·5 cites·20 claims
- 1751US7205089B2Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Apr 17, 2007·1 cites·15 claims
- 1843US5650250ALight exposure mask for semiconductor devicesHYUNDAI ELECTRONICS IND·Filed 1995·Granted Jul 22, 1997·8 cites·2 claims
- 1943US2007042298A1Method for manufacturing semiconductor device using immersion lithography processHYNIX SEMICONDUCTOR INC·Filed 2006·Application pending·0 cites
- 2043US2007117410A1Method for manufacturing semiconductor device using immersion lithography processHYNIX SEMICONDUCTOR INC·Filed 2006·Application pending·0 cites
- 2141US5705319AProcess for forming fine patterns for a semiconductor device utilizing three photosensitive layersHYUNDAI ELECTRONICS IND·Filed 1996·Granted Jan 6, 1998·7 cites·2 claims
- 2241US2005233921A1Cleaning solution for photoresist, method for forming a photoresist pattern using the same, and semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2004·Application pending·0 cites
- 2341US2006141390A1Composition for coating a photoresist patternHYNIX SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 2441US2006246382A1Method for preparing semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 2541US2006147834A1Water-soluble composition for coating photoresist pattern and method for forming fine patterns using the sameYOUNGCHANG CHEMICAL CO LTD·Filed 2005·Application pending·0 cites
- 2638US7198887B2Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Apr 3, 2007·0 cites·10 claims
- 2736US5635335AMethod for fabricating semiconductor device utilizing dual photoresist films imaged with same exposure maskHYUNDAI ELECTRONICS IND·Filed 1994·Granted Jun 3, 1997·8 cites·6 claims
- 2834US5157002AMethod for forming a mask pattern for contact holeHYUNDAI ELECTRONICS IND·Filed 1990·Granted Oct 20, 1992·7 cites·21 claims
- 2929US7419760B2Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the patternHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Sep 2, 2008·0 cites·14 claims
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