Inventor · disambiguated record
Akiyoshi Tamura
Also filed as: TAMURA AKIYOSHI
29 granted patents·12 pending applications·792 citations·filing 1986–2013
97Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD28PANASONIC CORP10MATSUSHITA ELECTRONICS CORP2NAKAZAWA KAZUSHI1
Top patents by PatentIndex Score
41 records- 0199US5616947ASemiconductor device having an MIS structureMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Apr 1, 1997·565 cites·6 claims
- 0289US7728357B2Heterojunction bipolar transistor and manufacturing method thereofPANASONIC CORP·Filed 2006·Granted Jun 1, 2010·19 cites·10 claims
- 0383US7989845B2Semiconductor device having a hetero-junction bipolar transistor and manufacturing method thereofPANASONIC CORP·Filed 2008·Granted Aug 2, 2011·9 cites·15 claims
- 0479US7001820B1Heterojunction bipolar transistor and method for fabricating the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Feb 21, 2006·9 cites·10 claims
- 0574US4992387AMethod for fabrication of self-aligned asymmetric field effect transistorsMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1990·Granted Feb 12, 1991·37 cites·4 claims
- 0671US8436399B2Semiconductor deviceNAKAZAWA KAZUSHI·Filed 2010·Granted May 7, 2013·4 cites·18 claims
- 0771US7144765B2Semiconductor device with Schottky electrode including lanthanum and boron, and manufacturing method thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Dec 5, 2006·4 cites·10 claims
- 0868US8716756B2Semiconductor devicePANASONIC CORP·Filed 2013·Granted May 6, 2014·2 cites·15 claims
- 0962US7495268B2Semiconductor device and manufacturing method of the samePANASONIC CORP·Filed 2007·Granted Feb 24, 2009·2 cites·7 claims
- 1062US5523623AOhmic electrode for a p-type compound semiconductor and a bipolar transistor incorporating the ohmic electrodeMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Jun 4, 1996·20 cites·15 claims
- 1161US8017975B2Semiconductor devicePANASONIC CORP·Filed 2009·Granted Sep 13, 2011·2 cites·4 claims
- 1258US7176099B2Hetero-junction bipolar transistor and manufacturing method thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Feb 13, 2007·1 cites·4 claims
- 1358US5336361AMethod of manufacturing an MIS-type semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1992·Granted Aug 9, 1994·27 cites·3 claims
- 1457US7012337B2Semiconductor device including a photosensitive resin covering at least a portion of a substrate having a via holeMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Mar 14, 2006·8 cites·7 claims
- 1557US6982141B2Semiconductor device and manufacturing method thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Jan 3, 2006·8 cites·20 claims
- 1656US6903388B2Hetero-junction bipolar transistor and manufacturing method thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Jun 7, 2005·6 cites·13 claims
- 1753US7012285B2Semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Mar 14, 2006·8 cites·10 claims
- 1852US6967360B2Pseudomorphic high electron mobility transistor with Schottky electrode including lanthanum and boron, and manufacturing method thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Nov 22, 2005·4 cites·4 claims
- 1952US5907177ASemiconductor device having a tapered gate electrodeMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted May 25, 1999·16 cites·8 claims
- 2049US7091528B2Semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Aug 15, 2006·4 cites·9 claims
- 2145US6037200ACompound semiconductor device and fabrication methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Mar 14, 2000·11 cites·10 claims
- 2245US2010171151A1Heterojunction bipolar transistor and manufacturing method thereofPANASONIC CORP·Filed 2009·Application pending·0 cites
- 2344US2011250726A1Semiconductor device having a hetero-junction bipolar transistor and manufacturing method thereofPANASONIC CORP·Filed 2011·Application pending·0 cites
- 2444US2008088020A1Semiconductor device and manufacturing method of the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2007·Application pending·0 cites
- 2544US2009230482A1Semiconductor device and manufacturing method thereofPANASONIC CORP·Filed 2009·Application pending·0 cites
- 2643US5994728AField effect transistor and method for producing the sameMATSUSHITA ELECTRONICS CORP·Filed 1996·Granted Nov 30, 1999·9 cites·14 claims
- 2742US4752592AAnnealing method for compound semiconductor substrateMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1986·Granted Jun 21, 1988·13 cites·3 claims
- 2842US2008176391A1Method for manufacturing semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2008·Application pending·0 cites
- 2941US2006273396A1Semiconductor device and manufacturing method thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Application pending·0 cites
- 3040US7238542B2Manufacturing method for compound semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Jul 3, 2007·0 cites·17 claims
- 3139US2006237753A1Semiconductor device and method for manufacturing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Application pending·0 cites
- 3239US2006284212A1Hetero-junction bipolar transistor and manufacturing method thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Application pending·0 cites
- 3338US2006076585A1Semiconductor resistor and method for manufacturing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Application pending·0 cites
- 3438US2006281237A1Method of manufacturing junction field effect transistorMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Application pending·0 cites
- 3537US7301181B2Heterojunction bipolar transistor having an emitter layer made of a semiconductor material including aluminumMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Nov 27, 2007·0 cites·5 claims
- 3636US2010314696A1Field-effect transistor and method of fabricating samePANASONIC CORP·Filed 2010·Application pending·0 cites
- 3735US6953729B2Heterojunction field effect transistor and manufacturing method thereofMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Oct 11, 2005·0 cites·10 claims
- 3835US2010187571A1Semiconductor device and manufacturing method thereofPANASONIC CORP·Filed 2010·Application pending·0 cites
- 3933US6380573B1Semiconductor memory device and method for producing the sameMATSUSHITA ELECTRONICS CORP·Filed 1999·Granted Apr 30, 2002·2 cites·31 claims
- 4030US5942772ASemiconductor device and method of manufacturing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Aug 24, 1999·1 cites·5 claims
- 4130US5162242AMethod for annealing compound semiconductor devicesMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1991·Granted Nov 10, 1992·1 cites·10 claims
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