Inventor · disambiguated record
Kazuyoshi Matsuzaki
Also filed as: MATSUZAKI KAZUYOSHI
11 granted patents·6 pending applications·23 citations·filing 2006–2023
84Inventor score
Top patents by PatentIndex Score
17 records- 0187US8636871B2Plasma processing apparatus, plasma processing method and storage mediumSAWADA IKUO·Filed 2007·Granted Jan 28, 2014·14 cites·18 claims
- 0273US9165810B2Conveyance device and substrate processing systemTOKYO ELECTRON LTD·Filed 2012·Granted Oct 20, 2015·3 cites·12 claims
- 0372US10591194B2Temperature control methodTOKYO ELECTRON LTD·Filed 2017·Granted Mar 17, 2020·1 cites·3 claims
- 0472US9252001B2Plasma processing apparatus, plasma processing method and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 2, 2016·2 cites·4 claims
- 0570US10541158B2Temperature adjustment method using wet surface in a processing chamberTOKYO ELECTRON LTD·Filed 2017·Granted Jan 21, 2020·1 cites·3 claims
- 0667US10643839B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2017·Granted May 5, 2020·1 cites·20 claims
- 0752US9791191B2Temperature control apparatus, processing apparatus, and temperature control methodTOKYO ELECTRON LTD·Filed 2012·Granted Oct 17, 2017·0 cites·7 claims
- 0851US8818545B2Semiconductor fabrication apparatus and temperature adjustment methodMATSUZAKI KAZUYOSHI·Filed 2010·Granted Aug 26, 2014·1 cites·10 claims
- 0951US2025174439A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1049US2013011555A1Coating apparatus and coating methodTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 1148US2009162547A1Coating Apparatus and Coating MethodSAWADA IKUO·Filed 2006·Application pending·0 cites
- 1248US2018155830A1Gas supply and exhaust structureTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1346US11625518B2Learning device, inference device, and learned modelTOKYO ELECTRON LTD·Filed 2019·Granted Apr 11, 2023·0 cites·17 claims
- 1444US2012043024A1Substrate processing apparatus and temperature adjustment methodSASAKI YASUHARU·Filed 2011·Application pending·0 cites
- 1543US10734221B2Method of manufacturing semiconductor device and method of forming metal oxide filmTOKYO ELECTRON LTD·Filed 2018·Granted Aug 4, 2020·0 cites·15 claims
- 1640US10121680B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Nov 6, 2018·0 cites·5 claims
- 1728US2012204576A1Cooling unit, processing chamber, part in the processing chamber, and cooling methodMATSUZAKI KAZUYOSHI·Filed 2012·Application pending·0 cites
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