Inventor · disambiguated record
Debra Fenzel-Alexander
Also filed as: FENZEL-ALEXANDER DEBRA
5 granted patents·1 pending application·89 citations·filing 2000–2007
81Inventor score
Files withIBM5
Top patents by PatentIndex Score
6 records- 0196US6806026B2Photoresist compositionIBM·Filed 2002·Granted Oct 19, 2004·62 cites·69 claims
- 0282US7135595B2Photoresist compositionIBM·Filed 2006·Granted Nov 14, 2006·4 cites·1 claims
- 0376US7014980B2Photoresist compositionIBM·Filed 2004·Granted Mar 21, 2006·10 cites·29 claims
- 0474US7261992B2Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositionsIBM·Filed 2002·Granted Aug 28, 2007·11 cites·70 claims
- 0569US7550254B2Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositionsIBM·Filed 2007·Granted Jun 23, 2009·2 cites·10 claims
- 0634US2002081520A1Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applicationsFiled 2000·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →