Inventor · disambiguated record
Go Miya
Also filed as: MIYA GO
21 granted patents·18 pending applications·85 citations·filing 2002–2025
94Inventor score
Top patents by PatentIndex Score
39 records- 0192US10872742B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2016·Granted Dec 22, 2020·8 cites·15 claims
- 0289US7396771B2Plasma etching apparatus and plasma etching methodHITACHI HIGH TECH CORP·Filed 2006·Granted Jul 8, 2008·15 cites·4 claims
- 0388US7887669B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Feb 15, 2011·11 cites·7 claims
- 0488US7744721B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2009·Granted Jun 29, 2010·7 cites·2 claims
- 0584US9401297B2Electrostatic chuck mechanism and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jul 26, 2016·5 cites·10 claims
- 0684US8232522B2Semiconductor inspecting apparatusMIYA GO·Filed 2009·Granted Jul 31, 2012·8 cites·14 claims
- 0782US8083889B2Apparatus and method for plasma etchingMIYA GO·Filed 2009·Granted Dec 27, 2011·6 cites·2 claims
- 0880US8519332B2Semiconductor inspecting apparatusMIYA GO·Filed 2012·Granted Aug 27, 2013·4 cites·15 claims
- 0974US11735394B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Aug 22, 2023·1 cites·11 claims
- 1073US12106930B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2019·Granted Oct 1, 2024·1 cites·15 claims
- 1170US7713756B2Apparatus and method for plasma etchingHITACHI HIGH TECH CORP·Filed 2007·Granted May 11, 2010·2 cites·2 claims
- 1268US8653455B2Charged particle beam device and evaluation method using the charged particle beam deviceKITSUNAI HIROYUKI·Filed 2010·Granted Feb 18, 2014·3 cites·11 claims
- 1367US8231759B2Plasma processing apparatusEDAMURA MANABU·Filed 2010·Granted Jul 31, 2012·1 cites·5 claims
- 1461US6899766B2Diagnosis method for semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted May 31, 2005·6 cites·5 claims
- 1561US2024177963A1Charged Particle Beam ApparatusHITACHI HIGH TECH CORP·Filed 2023·Application pending·0 cites
- 1660US2025239430A1Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 1759US6866744B2Semiconductor processing apparatus and a diagnosis method thereforHITACHI HIGH TECH CORP·Filed 2002·Granted Mar 15, 2005·5 cites·3 claims
- 1857US2009095423A1Apparatus and method for plasma etchingMIYA GO·Filed 2008·Application pending·0 cites
- 1955US9704731B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted Jul 11, 2017·0 cites·4 claims
- 2055US2012273136A1Plasma Processing ApparatusEDAMURA MANABU·Filed 2012·Application pending·0 cites
- 2154US8921781B2Measurement or inspecting apparatusHITACHI HIGH TECHNOLOGIES·Filed 2013·Granted Dec 30, 2014·0 cites·8 claims
- 2253US2009152241A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2009·Application pending·0 cites
- 2352US2025170623A1Vacuum Processing Device and Foreign Matter Ejection MethodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 2451US2014004706A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 2549US2008110569A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2007·Application pending·0 cites
- 2648US7147747B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Dec 12, 2006·1 cites·18 claims
- 2748US7147748B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2004·Granted Dec 12, 2006·1 cites·12 claims
- 2848US2006043064A1Plasma processing system and methodTANAKA JUNICHI·Filed 2004·Application pending·0 cites
- 2945US2005224182A1Plasma processing apparatusEDAMURA MANABU·Filed 2004·Application pending·0 cites
- 3044US2005028934A1Apparatus and method for plasma etchingFiled 2004·Application pending·0 cites
- 3143US10128141B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 13, 2018·0 cites·2 claims
- 3243US2011120649A1Vacuum processing apparatusSATOU KOUHEI·Filed 2011·Application pending·0 cites
- 3342US2007209759A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2006·Application pending·0 cites
- 3440US9799486B2Charged particle beam apparatus for measuring surface potential of a sampleHITACHI HIGH TECH CORP·Filed 2015·Granted Oct 24, 2017·0 cites·9 claims
- 3540US2006169671A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2005·Application pending·0 cites
- 3639US2004163595A1Plasma processing apparatusFiled 2003·Application pending·0 cites
- 3738US2006191482A1Apparatus and method for processing waferKANNO SEIICHIRO·Filed 2005·Application pending·0 cites
- 3838US2006291132A1Electrostatic chuck, wafer processing apparatus and plasma processing methodKANNO SEIICHIRO·Filed 2006·Application pending·0 cites
- 3937US2012186745A1Plasma processing apparatusMIYA GO·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →