Inventor · disambiguated record
Hung-Chun Wang
Also filed as: WANG HUNG-CHUN
35 granted patents·1 pending application·815 citations·filing 2004–2023
97Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD15TAIWAN SEMICONDUCTOR MFG10WANG HUNG-CHUN7CHEN PEI-SHIANG2A SUN DRAGON ENERGY CO LTD1
Top patents by PatentIndex Score
36 records- 0198US9390217B2Methodology of optical proximity correction optimizationTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 12, 2016·68 cites·20 claims
- 0297US9305799B2Method and system for E-beam lithography with multi-exposureTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Apr 5, 2016·26 cites·20 claims
- 0397US8764995B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofCHANG CHING-HSU·Filed 2010·Granted Jul 1, 2014·305 cites·20 claims
- 0497US8631360B2Methodology of optical proximity correction optimizationWANG HUNG-CHUN·Filed 2012·Granted Jan 14, 2014·34 cites·19 claims
- 0597US8601407B2Geometric pattern data quality verification for maskless lithographyWANG HUNG-CHUN·Filed 2011·Granted Dec 3, 2013·31 cites·20 claims
- 0697US8507159B2Electron beam data storage system and method for high volume manufacturingWANG HUNG-CHUN·Filed 2011·Granted Aug 13, 2013·29 cites·16 claims
- 0797US8473877B2Striping methodology for maskless lithographyWANG HUNG-CHUN·Filed 2011·Granted Jun 25, 2013·26 cites·20 claims
- 0896US9529959B2System and method for pattern correction in e-beam lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 27, 2016·27 cites·17 claims
- 0996US8945803B2Smart subfield method for E-beam lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Feb 3, 2015·26 cites·20 claims
- 1096US8841049B2Electron beam data storage system and method for high volume manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 23, 2014·28 cites·20 claims
- 1196US8627241B2Pattern correction with location effectWANG HUNG-CHUN·Filed 2012·Granted Jan 7, 2014·45 cites·18 claims
- 1296US8468473B1Method for high volume e-beam lithographyWANG HUNG-CHUN·Filed 2012·Granted Jun 18, 2013·34 cites·20 claims
- 1396US8464186B2Providing electron beam proximity effect correction by simulating write operations of polygonal shapesWANG HUNG-CHUN·Filed 2011·Granted Jun 11, 2013·29 cites·20 claims
- 1495US8835082B2Method and system for E-beam lithography with multi-exposureCHEN PEI-SHIANG·Filed 2012·Granted Sep 16, 2014·28 cites·20 claims
- 1595US8609308B1Smart subfield method for E-beam lithographyCHEN PEI-SHIANG·Filed 2012·Granted Dec 17, 2013·31 cites·20 claims
- 1692US10691864B2Method of post optical proximity correction (OPC) printing verification by machine learningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 23, 2020·9 cites·12 claims
- 1788US9262578B2Method for integrated circuit manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Feb 16, 2016·9 cites·20 claims
- 1888US8949749B2Layout design for electron-beam high volume manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Feb 3, 2015·12 cites·22 claims
- 1986US11048161B2Optical proximity correction methodology using pattern classification for target placementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 29, 2021·2 cites·20 claims
- 2082US11308256B2Method of post optical proximity correction (OPC) printing verification by machine learningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 19, 2022·1 cites·20 claims
- 2181US10520829B2Optical proximity correction methodology using underlying layer informationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 31, 2019·2 cites·20 claims
- 2280US9298083B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Mar 29, 2016·2 cites·20 claims
- 2379US10360339B2Method for integrated circuit manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jul 23, 2019·2 cites·20 claims
- 2476US9411924B2Methodology for pattern density optimizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Aug 9, 2016·3 cites·20 claims
- 2575US10049178B2Methodology for pattern density optimizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 14, 2018·1 cites·20 claims
- 2670US9026955B1Methodology for pattern correctionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted May 5, 2015·2 cites·17 claims
- 2764US10860774B2Methodology for pattern density optimizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 8, 2020·0 cites·20 claims
- 2863US9336986B2Electron beam data storage system and method for high volume manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted May 10, 2016·0 cites·20 claims
- 2962US10747938B2Method for integrated circuit manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 18, 2020·0 cites·20 claims
- 3059US10527928B2Optical proximity correction methodology using pattern classification for target placementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 7, 2020·0 cites·20 claims
- 3157US7387855B2Anti-ESD photomask blankTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jun 17, 2008·1 cites·20 claims
- 3254US9418191B2Providing electron beam proximity effect correction by simulating write operations of polygonal shapesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Aug 16, 2016·0 cites·15 claims
- 3350US7348106B2Method for repairing a phase shift maskTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Mar 25, 2008·2 cites·20 claims
- 3449US9165106B2Layout design for electron-beam high volume manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 20, 2015·0 cites·20 claims
- 3548US12342633B2Photovoltaic panel packaging structure and method for the sameA SUN DRAGON ENERGY CO LTD·Filed 2023·Granted Jun 24, 2025·0 cites·11 claims
- 3641US2014119638A1System, method and computer program product to evaluate a semiconductor wafer fabrication processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2012·Application pending·0 cites
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