Inventor · disambiguated record
Sasangan Ramanathan
Also filed as: RAMANATHAN SASANGAN
9 granted patents·3 pending applications·389 citations·filing 1997–2013
91Inventor score
Top patents by PatentIndex Score
12 records- 0193US6589887B1Forming metal-derived layers by simultaneous deposition and evaporation of metalNOVELLUS SYSTEMS INC·Filed 2001·Granted Jul 8, 2003·75 cites·25 claims
- 0291US6720259B2Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor depositionGENUS INC·Filed 2002·Granted Apr 13, 2004·56 cites·30 claims
- 0390US7981473B2Transient enhanced atomic layer depositionAIXTRON INC·Filed 2004·Granted Jul 19, 2011·63 cites·19 claims
- 0489US6951765B1Method and apparatus for introduction of solid precursors and reactants into a supercritical fluid reactorNOVELLUS SYSTEMS INC·Filed 2001·Granted Oct 4, 2005·28 cites·15 claims
- 0587US9159608B2Method for forming TiSiN thin film layer by using atomic layer depositionAIXTRON SE·Filed 2013·Granted Oct 13, 2015·16 cites·7 claims
- 0682US6015759ASurface modification of semiconductors using electromagnetic radiationQUESTER TECHNOLOGY INC·Filed 1997·Granted Jan 18, 2000·72 cites·61 claims
- 0780US5887117AFlash evaporatorSHARP KK·Filed 1997·Granted Mar 23, 1999·62 cites·6 claims
- 0866US6887781B2Method for the formation of diffusion barrierNOVELLUS SYSTEMS INC·Filed 2003·Granted May 3, 2005·9 cites·4 claims
- 0941US2005016956A1Methods and apparatus for cycle time improvements for atomic layer depositionFiled 2004·Application pending·0 cites
- 1040US6071555AFerroelectric thin film composites made by metalorganic decompositionUS ARMY·Filed 1998·Granted Jun 6, 2000·8 cites·11 claims
- 1138US2002081845A1Method for the formation of diffusion barrierNOVELLUS SYSTEMS INC·Filed 2000·Application pending·0 cites
- 1236US2006137609A1Multi-single wafer processing apparatusPUCHACZ JERZY P·Filed 2005·Application pending·0 cites
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