Inventor · disambiguated record
Heiko Siekmann
Also filed as: SIEKMANN HEIKO
8 granted patents·1 pending application·27 citations·filing 2008–2024
83Inventor score
Files withZEISS CARL SMT GMBH5WANGLER JOHANNES1WOLF OLIVER1ZEISS CARL LASER OPTICS GMBH1ZEISS CARL SMT AG1
Top patents by PatentIndex Score
9 records- 0185US9541685B2Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this typeZEISS CARL LASER OPTICS GMBH·Filed 2013·Granted Jan 10, 2017·10 cites·16 claims
- 0282US8976927B2Substrate for mirrors for EUV lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Mar 10, 2015·6 cites·20 claims
- 0377US7880969B2Optical integrator for an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Feb 1, 2011·4 cites·20 claims
- 0475US2025093557A1Method for producing a substrate for an optical element, and reflective optical elementZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0569US9217930B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 22, 2015·1 cites·25 claims
- 0669US8520307B2Optical integrator for an illumination system of a microlithographic projection exposure apparatusWOLF OLIVER·Filed 2010·Granted Aug 27, 2013·4 cites·48 claims
- 0768US8395756B2Illumination system for a microlithographic projection exposure apparatusWANGLER JOHANNES·Filed 2008·Granted Mar 12, 2013·2 cites·49 claims
- 0864US12196986B2Method for producing a substrate for an optical elementZEISS CARL SMT GMBH·Filed 2020·Granted Jan 14, 2025·0 cites·8 claims
- 0956US9575414B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 21, 2017·0 cites·22 claims
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