Inventor · disambiguated record
Shigehiro Miura
Also filed as: MIURA SHIGEHIRO
39 granted patents·14 pending applications·88 citations·filing 2012–2020
96Inventor score
Top patents by PatentIndex Score
53 records- 0197US10202687B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Feb 12, 2019·12 cites·18 claims
- 0293US9111747B2Film deposition apparatus, substrate processing apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2013·Granted Aug 18, 2015·15 cites·17 claims
- 0392US9376751B2Plasma processing device and operation methodTOKYO ELECTRON LTD·Filed 2015·Granted Jun 28, 2016·3 cites·12 claims
- 0492US8871654B2Film deposition apparatus, and method of depositing a filmTOKYO ELECTRON LTD·Filed 2013·Granted Oct 28, 2014·13 cites·7 claims
- 0589US10072336B2Film forming apparatus, film forming method, and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Sep 11, 2018·5 cites·8 claims
- 0688US8927440B2Film deposition apparatus and method of depositing filmTOKYO ELECTRON LTD·Filed 2013·Granted Jan 6, 2015·8 cites·5 claims
- 0787US10480067B2Film deposition methodTOKYO ELECTRON LTD·Filed 2017·Granted Nov 19, 2019·2 cites·10 claims
- 0886US9714467B2Method for processing a substrate and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jul 25, 2017·5 cites·3 claims
- 0982US9777369B2Method of depositing a film, recording medium, and film deposition apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 3, 2017·2 cites·11 claims
- 1082US9583312B2Film formation device, substrate processing device, and film formation methodTOKYO ELECTRON LTD·Filed 2013·Granted Feb 28, 2017·5 cites·9 claims
- 1179US10358720B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jul 23, 2019·1 cites·13 claims
- 1279US9466483B2Film deposition apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2013·Granted Oct 11, 2016·4 cites·4 claims
- 1378US10604837B2Film deposition apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Mar 31, 2020·1 cites·10 claims
- 1477US9865499B2Method and apparatus for gap fill using deposition and etch processesTOKYO ELECTRON LTD·Filed 2016·Granted Jan 9, 2018·2 cites·15 claims
- 1577US9711370B2Substrate processing apparatus and method of processing a substrateTOKYO ELECTRON LTD·Filed 2015·Granted Jul 18, 2017·2 cites·11 claims
- 1672US11479852B2Method for dry cleaning a susceptor and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 25, 2022·1 cites·5 claims
- 1771US11390948B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jul 19, 2022·0 cites·5 claims
- 1871US10151031B2Method for processing a substrate and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Dec 11, 2018·1 cites·8 claims
- 1971US9502215B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Nov 22, 2016·2 cites·11 claims
- 2070US9209011B2Method of operating film deposition apparatus and film deposition apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Dec 8, 2015·2 cites·8 claims
- 2164US10683573B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jun 16, 2020·1 cites·3 claims
- 2262US10385453B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Aug 20, 2019·0 cites·3 claims
- 2361US9583318B2Plasma processing apparatus, plasma processing method, and recording mediumTOKYO ELECTRON LTD·Filed 2016·Granted Feb 28, 2017·1 cites·7 claims
- 2457US10043639B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Aug 7, 2018·0 cites·6 claims
- 2557US2014220260A1Substrate processing apparatus and method of depositing a filmTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2654US11085113B2Film forming method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Aug 10, 2021·0 cites·5 claims
- 2754US10103009B2Plasma processing device and operation methodTOKYO ELECTRON LTD·Filed 2016·Granted Oct 16, 2018·0 cites·8 claims
- 2853US2013087097A1Film deposition apparatus and substrate processing apparatusKATO HITOSHI·Filed 2012·Application pending·0 cites
- 2951US11118264B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 14, 2021·0 cites·12 claims
- 3050US2013180452A1Film deposition apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3149US2017253964A1Film deposition methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 3248US2016260587A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 3347US9865454B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Jan 9, 2018·0 cites·8 claims
- 3446US2014123895A1Plasma process apparatus and plasma generating deviceTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3546US2015118415A1Plasma processing apparatus and method of performing plasma processTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3645US10217642B2Substrate processing apparatus, substrate processing method and substrate holding memberTOKYO ELECTRON LTD·Filed 2016·Granted Feb 26, 2019·0 cites·10 claims
- 3743US11328901B2Deposition methodTOKYO ELECTRON LTD·Filed 2020·Granted May 10, 2022·0 cites·9 claims
- 3843US11131023B2Film deposition apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2017·Granted Sep 28, 2021·0 cites·7 claims
- 3943US9129518B2Device control system, wireless control apparatus, and computer readable recording mediumSASAKI TOMOAKI·Filed 2012·Granted Sep 8, 2015·0 cites·14 claims
- 4042US2013206067A1Film deposition apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 4142US2013203268A1Film deposition apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 4241US2014199856A1Method of depositing a film and film deposition apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 4339US11274372B2Film deposition apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 15, 2022·0 cites·17 claims
- 4439US10796902B2Film deposition methodTOKYO ELECTRON LTD·Filed 2017·Granted Oct 6, 2020·0 cites·8 claims
- 4539US9607828B2Method of depositing a silicon-containing filmTOKYO ELECTRON LTD·Filed 2016·Granted Mar 28, 2017·0 cites·13 claims
- 4638US10287675B2Film deposition methodTOKYO ELECTRON LTD·Filed 2017·Granted May 14, 2019·0 cites·13 claims
- 4738US10151034B2Substrate processing method including supplying a fluorine-containing gas on a surface of a substrateTOKYO ELECTRON LTD·Filed 2016·Granted Dec 11, 2018·0 cites·8 claims
- 4838US2019284691A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 4938US2017167019A1Plasma processing apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 5036US9693434B2Dimming device and illumination system using samePANASONIC IP MAN CO LTD·Filed 2015·Granted Jun 27, 2017·0 cites·7 claims
Showing the top 50 of 53 patent records by PatentIndex Score.
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