Inventor · disambiguated record
Kentaro Oshimo
Also filed as: OSHIMO KENTARO
15 granted patents·5 pending applications·382 citations·filing 2000–2022
90Inventor score
Top patents by PatentIndex Score
20 records- 0196US6454909B1Method and apparatus for forming a film on an object to be processedTOKYO ELECTRON LTD·Filed 2000·Granted Sep 24, 2002·351 cites·18 claims
- 0289US9136133B2Method of depositing filmTOKYO ELECTRON LTD·Filed 2014·Granted Sep 15, 2015·12 cites·14 claims
- 0386US9714467B2Method for processing a substrate and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jul 25, 2017·5 cites·3 claims
- 0482US9777369B2Method of depositing a film, recording medium, and film deposition apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 3, 2017·2 cites·11 claims
- 0581US11201053B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 14, 2021·1 cites·3 claims
- 0677US10438791B2Film forming method, film forming apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 8, 2019·2 cites·7 claims
- 0773US9136156B2Substrate processing apparatus and film deposition apparatusENOMOTO TADASHI·Filed 2012·Granted Sep 15, 2015·4 cites·8 claims
- 0871US10151031B2Method for processing a substrate and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Dec 11, 2018·1 cites·8 claims
- 0969US10714332B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jul 14, 2020·1 cites·4 claims
- 1056US10900121B2Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2017·Granted Jan 26, 2021·0 cites·4 claims
- 1155US11414753B2Processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 16, 2022·0 cites·13 claims
- 1254US2019292662A1Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1353US2023193464A1Substrate processing apparatus and substrate removal methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1451US7615251B2Processing device using shower head structure and processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Nov 10, 2009·3 cites·13 claims
- 1546US8921237B2Method of depositing a filmTOKYO ELECTRON LTD·Filed 2013·Granted Dec 30, 2014·0 cites·9 claims
- 1644US10550470B2Film forming apparatus and operation method of film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·0 cites·10 claims
- 1743US11171014B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 9, 2021·0 cites·4 claims
- 1842US2014209028A1Film deposition apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1940US2013164936A1Film deposition methodTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 2037US2018237914A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
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