Inventor · disambiguated record
Wilhelm Ulrich
Also filed as: ULRICH WILHELM
133 granted patents·33 pending applications·2,622 citations·filing 1989–2018
99Inventor score
Top patents by PatentIndex Score
166 records- 0199US7312847B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2005·Granted Dec 25, 2007·84 cites·47 claims
- 0299US6891596B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2003·Granted May 10, 2005·174 cites·113 claims
- 0398US7414781B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT AG·Filed 2006·Granted Aug 19, 2008·64 cites·50 claims
- 0498US7382540B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2007·Granted Jun 3, 2008·105 cites·3 claims
- 0598US7190527B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2004·Granted Mar 13, 2007·161 cites·57 claims
- 0698US6636350B2Microlithographic reduction projection catadioptric objectiveZEISS STIFTUNG·Filed 2001·Granted Oct 21, 2003·123 cites·26 claims
- 0797US8004755B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT GMBH·Filed 2010·Granted Aug 23, 2011·12 cites·17 claims
- 0897US7682031B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT AG·Filed 2005·Granted Mar 23, 2010·48 cites·49 claims
- 0997US7209286B2Objective with pupil obscurationZEISS CARL SMT AG·Filed 2005·Granted Apr 24, 2007·32 cites·17 claims
- 1097US7199922B2Reflective projection lens for EUV-photolithographyZEISS CARL SMT AG·Filed 2005·Granted Apr 3, 2007·26 cites·6 claims
- 1197US6894834B2Objective with pupil obscurationZEISS CARL SMT AG·Filed 2003·Granted May 17, 2005·90 cites·47 claims
- 1295US8107162B2Catadioptric projection objective with intermediate imagesDODOC AURELIAN·Filed 2005·Granted Jan 31, 2012·18 cites·42 claims
- 1395US7426082B2Catadioptric projection objective with geometric beam splittingZEISS CARL SMT AG·Filed 2005·Granted Sep 16, 2008·20 cites·22 claims
- 1495US7218445B2Microlithographic reduction projection catadioptric objectiveZEISS STIFTUNG·Filed 2003·Granted May 15, 2007·53 cites·9 claims
- 1595US6927901B2Reflective projection lens for EUV-photolithographyZEISS CARL SMT AG·Filed 2002·Granted Aug 9, 2005·54 cites·18 claims
- 1695US6710917B28-mirror microlithography projection objectiveZEISS CARL SMT AG·Filed 2001·Granted Mar 23, 2004·88 cites·29 claims
- 1795US6665126B2Projection exposure lens with aspheric elementsZEISS STIFTUNG·Filed 2000·Granted Dec 16, 2003·66 cites·78 claims
- 1894US7977651B2Illumination system particularly for microlithographyZEISS CARL SMT GMBH·Filed 2009·Granted Jul 12, 2011·15 cites·20 claims
- 1994US7385756B2Catadioptric projection objectiveZEISS CARL SMT AG·Filed 2005·Granted Jun 10, 2008·42 cites·109 claims
- 2094US7209292B2Projection objective, especially for microlithography, and method for adjusting a projection objectiveZEISS CARL SMT AG·Filed 2003·Granted Apr 24, 2007·56 cites·99 claims
- 2194US7145720B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2003·Granted Dec 5, 2006·49 cites·97 claims
- 2294US6600608B1Catadioptric objective comprising two intermediate imagesZEISS STIFTUNG·Filed 1999·Granted Jul 29, 2003·129 cites·64 claims
- 2393US7859748B2Microlithographic reduction projection catadioptric objectiveZEISS CARL SMT GMBH·Filed 2007·Granted Dec 28, 2010·21 cites·20 claims
- 2493US7570343B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Aug 4, 2009·14 cites·8 claims
- 2593US7463422B2Projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·19 cites·23 claims
- 2693US6995930B2Catadioptric projection objective with geometric beam splittingZEISS CARL SMT AG·Filed 2003·Granted Feb 7, 2006·39 cites·52 claims
- 2793US6646718B2Projection objective having adjacently mounted aspheric lens surfacesZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Nov 11, 2003·49 cites·11 claims
- 2892US7463423B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·9 cites·40 claims
- 2992US6560031B1Optical projection lens systemZEISS CARL·Filed 2000·Granted May 6, 2003·42 cites·10 claims
- 3091US8208199B2Catadioptric projection objectiveSHAFER DAVID·Filed 2009·Granted Jun 26, 2012·7 cites·20 claims
- 3191US6906866B2Compact 1½-waist system for sub 100 nm ArF lithographyZEISS CARL SMT AG·Filed 2003·Granted Jun 14, 2005·39 cites·31 claims
- 3290US8208198B2Catadioptric projection objectiveSHAFER DAVID·Filed 2007·Granted Jun 26, 2012·8 cites·4 claims
- 3390US8027022B2Projection objectiveZEISS CARL SMT GMBH·Filed 2008·Granted Sep 27, 2011·12 cites·21 claims
- 3490US7719772B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT AG·Filed 2008·Granted May 18, 2010·30 cites·48 claims
- 3589US8169694B2Catoptric objectives and systems using catoptric objectivesMANN HANS-JUERGEN·Filed 2009·Granted May 1, 2012·7 cites·29 claims
- 3689US7692868B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT AG·Filed 2008·Granted Apr 6, 2010·6 cites·39 claims
- 3789US6496306B1Catadioptric optical system and exposure apparatus having the sameZEISS STIFTUNG·Filed 1999·Granted Dec 17, 2002·64 cites·20 claims
- 3888US8913316B2Catadioptric projection objective with intermediate imagesZEISS CARL SMT GMBH·Filed 2013·Granted Dec 16, 2014·3 cites·26 claims
- 3988US6859328B2Illumination system particularly for microlithographyCARL ZEISS SEMICONDUCTOR·Filed 2002·Granted Feb 22, 2005·58 cites·24 claims
- 4088US6788471B2Projection exposure apparatus for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Sep 7, 2004·34 cites·14 claims
- 4187US8317345B2Catoptric objectives and systems using catoptric objectivesMANN HANS-JUERGEN·Filed 2011·Granted Nov 27, 2012·5 cites·14 claims
- 4287US8054557B2Lithography projection objective, and a method for correcting image defects of the sameZEISS CARL SMT GMBH·Filed 2010·Granted Nov 8, 2011·3 cites·20 claims
- 4387US7920338B2Reduction projection objective and projection exposure apparatus including the sameZEISS CARL SMT GMBH·Filed 2007·Granted Apr 5, 2011·8 cites·57 claims
- 4487US7310187B2Projection objective, especially for microlithography, and method for adjusting a projection objectiveZEISS CARL SMT AG·Filed 2007·Granted Dec 18, 2007·8 cites·32 claims
- 4587US5402267ACatadioptric reduction objectiveZEISS STIFTUNG·Filed 1993·Granted Mar 28, 1995·88 cites·9 claims
- 4686US7532306B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted May 12, 2009·17 cites·10 claims
- 4786US7450301B2Reflective projection lens for EUV-photolithographyZEISS CARL SMT AG·Filed 2007·Granted Nov 11, 2008·8 cites·17 claims
- 4886US6419360B1ScannerZEISS STIFTUNG·Filed 2001·Granted Jul 16, 2002·47 cites·7 claims
- 4985US7348565B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2007·Granted Mar 25, 2008·10 cites·27 claims
- 5085US6806942B2Projection exposure systemZEISS CARL SMT AG·Filed 2003·Granted Oct 19, 2004·32 cites·39 claims
Showing the top 50 of 166 patent records by PatentIndex Score.
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