Inventor · disambiguated record
Neena Garg
Also filed as: GARG NEENA
7 granted patents·2 pending applications·158 citations·filing 2000–2004
85Inventor score
Files withIBM9
Top patents by PatentIndex Score
9 records- 0193US6531375B1Method of forming a body contact using BOX modificationIBM·Filed 2001·Granted Mar 11, 2003·78 cites·13 claims
- 0286US6488778B1Apparatus and method for controlling wafer environment between thermal clean and thermal processingIBM·Filed 2000·Granted Dec 3, 2002·44 cites·52 claims
- 0369US6495429B1Controlling internal thermal oxidation and eliminating deep divots in SIMOX by chlorine-based annealingIBM·Filed 2002·Granted Dec 17, 2002·20 cites·33 claims
- 0461US6784072B2Control of buried oxide in SIMOXIBM·Filed 2002·Granted Aug 31, 2004·9 cites·17 claims
- 0548US6531411B1Surface roughness improvement of SIMOX substrates by controlling orientation of angle of starting materialIBM·Filed 2001·Granted Mar 11, 2003·5 cites·19 claims
- 0646US6967376B2Divot reduction in SIMOX layersIBM·Filed 2004·Granted Nov 22, 2005·2 cites·7 claims
- 0741US7492008B2Control of buried oxide in SIMOXIBM·Filed 2004·Granted Feb 17, 2009·0 cites·10 claims
- 0837US2004266129A1Method of forming silicon-on-insulator wafers having process resistant applicationsIBM·Filed 2003·Application pending·0 cites
- 0936US2002190318A1Divot reduction in SIMOX layersIBM·Filed 2001·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →