Inventor · disambiguated record
Atsushi Shigenobu
Also filed as: SHIGENOBU ATSUSHI
10 granted patents·2 pending applications·5 citations·filing 2008–2025
78Inventor score
Top patents by PatentIndex Score
12 records- 0178US8741510B2Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating deviceCANON KK·Filed 2012·Granted Jun 3, 2014·4 cites·5 claims
- 0267US2025376767A1Adjustment processing apparatus, film forming processing system, adjustment processing method and storage mediumTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0363US2025321568A1Information processing apparatus, information processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0459US12130562B2Method of obtaining array of plurality of regions on substrate, exposure apparatus, method of manufacturing article, non-transitory storage medium, and information processing apparatusCANON KK·Filed 2022·Granted Oct 29, 2024·0 cites·14 claims
- 0559US8634061B2Exposure apparatus and device manufacturing methodSHIGENOBU ATSUSHI·Filed 2010·Granted Jan 21, 2014·1 cites·11 claims
- 0657US11947267B2Method of obtaining array of plurality of shot regions on substrate, exposure method, exposure apparatus, method of manufacturing article, non-transitory computer-readable storage medium, and information processing apparatusCANON KK·Filed 2022·Granted Apr 2, 2024·0 cites·13 claims
- 0755US11061337B2Exposure apparatus and article manufacturing methodCANON KK·Filed 2020·Granted Jul 13, 2021·0 cites·14 claims
- 0850US9116444B2Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating deviceCANON KK·Filed 2014·Granted Aug 25, 2015·0 cites·2 claims
- 0942US8564758B2Exposure apparatus and method of decreasing fluctuations in optical characteristics of projection systemSHIGENOBU ATSUSHI·Filed 2009·Granted Oct 22, 2013·0 cites·12 claims
- 1041US8786822B2Projection optical system with deformable optical element, exposure apparatus, and device manufacturing methodYAMADA AKIHIRO·Filed 2010·Granted Jul 22, 2014·0 cites·14 claims
- 1141US7643125B2Exposure apparatus and device manufacturing methodCANON KK·Filed 2008·Granted Jan 5, 2010·0 cites·8 claims
- 1240US11199784B2Exposure apparatus and article manufacturing methodCANON KK·Filed 2020·Granted Dec 14, 2021·0 cites·17 claims
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