Inventor · disambiguated record
Daniel A. Corliss
Also filed as: CORLISS DANIEL · CORLISS DANIEL A · CORLISS DANIEL ALBERT
31 granted patents·4 pending applications·225 citations·filing 1991–2022
96Inventor score
Top patents by PatentIndex Score
35 records- 0199US10553522B1Semiconductor microcoolerIBM·Filed 2018·Granted Feb 4, 2020·20 cites·6 claims
- 0295US5427878ASemiconductor wafer processing with across-wafer critical dimension monitoring using optical endpoint detectionDIGITAL EQUIPMENT CORP·Filed 1994·Granted Jun 27, 1995·110 cites·7 claims
- 0394US10553516B1Semiconductor microcoolerIBM·Filed 2018·Granted Feb 4, 2020·10 cites·6 claims
- 0492US10347486B1Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2017·Granted Jul 9, 2019·5 cites·20 claims
- 0592US7439001B2Focus blur measurement and control methodIBM·Filed 2005·Granted Oct 21, 2008·13 cites·4 claims
- 0690US10642161B1Baseline overlay control with residual noise reductionIBM·Filed 2018·Granted May 5, 2020·5 cites·19 claims
- 0788US10274836B2Determination of lithography effective dose uniformityIBM·Filed 2017·Granted Apr 30, 2019·3 cites·13 claims
- 0887US10490480B1Copper microcooler structure and fabricationIBM·Filed 2018·Granted Nov 26, 2019·4 cites·25 claims
- 0985US11037786B2Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2019·Granted Jun 15, 2021·2 cites·16 claims
- 1085US10490481B1Copper microcooler structure and fabricationIBM·Filed 2018·Granted Nov 26, 2019·3 cites·20 claims
- 1181US10921715B2Semiconductor structure for optical validationIBM·Filed 2019·Granted Feb 16, 2021·1 cites·20 claims
- 1278US10429743B2Optical mask validationIBM·Filed 2017·Granted Oct 1, 2019·1 cites·20 claims
- 1378US9104113B2Amplification method for photoresist exposure in semiconductor chip manufacturingIBM·Filed 2013·Granted Aug 11, 2015·2 cites·16 claims
- 1477US10281826B2Determination of lithography effective dose uniformityIBM·Filed 2017·Granted May 7, 2019·1 cites·7 claims
- 1573US10650111B2Electrical mask validationIBM·Filed 2017·Granted May 12, 2020·1 cites·24 claims
- 1672US9709898B2Amplification method for photoresist exposure in semiconductor chip manufacturingIBM·Filed 2014·Granted Jul 18, 2017·1 cites·18 claims
- 1771US10937764B2Three-dimensional microelectronic package with embedded cooling channelsIBM·Filed 2019·Granted Mar 2, 2021·1 cites·17 claims
- 1867US7230681B2Method and apparatus for immersion lithographyIBM·Filed 2004·Granted Jun 12, 2007·8 cites·36 claims
- 1966US11462512B2Three-dimensional microelectronic package with embedded cooling channelsIBM·Filed 2020·Granted Oct 4, 2022·0 cites·20 claims
- 2064US11177130B2Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2019·Granted Nov 16, 2021·0 cites·25 claims
- 2163US11288429B2Electrical mask validationIBM·Filed 2020·Granted Mar 29, 2022·0 cites·20 claims
- 2263US6919146B2Planar reticle design/fabrication method for rapid inspection and cleaningIBM·Filed 2002·Granted Jul 19, 2005·4 cites·20 claims
- 2361US7807335B2Immersion lithography contamination gettering layerIBM·Filed 2005·Granted Oct 5, 2010·1 cites·22 claims
- 2460US2024094623A1Attenuated phase shift mask for talbot lithographyMETA PLATFORMS INC·Filed 2022·Application pending·0 cites
- 2559US11056418B2Semiconductor microcoolerIBM·Filed 2019·Granted Jul 6, 2021·0 cites·20 claims
- 2658US11049789B2Semiconductor microcoolerIBM·Filed 2019·Granted Jun 29, 2021·0 cites·20 claims
- 2758US8350235B2Semiconductor intra-field dose correctionFREESCALE SEMICONDUCTOR INC·Filed 2009·Granted Jan 8, 2013·1 cites·15 claims
- 2857US5280437AStructure and method for direct calibration of registration measurement systems to actual semiconductor wafer process topographyDIGITAL EQUIPMENT CORP·Filed 1991·Granted Jan 18, 1994·28 cites·18 claims
- 2955US2009011346A1Focus blur measurement and control methodIBM·Filed 2008·Application pending·0 cites
- 3052US9451684B2Dual pulse driven extreme ultraviolet (EUV) radiation source methodIBM·Filed 2016·Granted Sep 20, 2016·0 cites·19 claims
- 3152US2008138631A1Method to reduce mechanical wear of immersion lithography apparatusIBM·Filed 2006·Application pending·0 cites
- 3250US10921716B1Lithographic dose characterizationIBM·Filed 2019·Granted Feb 16, 2021·0 cites·20 claims
- 3350US9301381B1Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gasIBM·Filed 2014·Granted Mar 29, 2016·0 cites·20 claims
- 3447US2008009142A1Evaporation control using coatingIBM·Filed 2007·Application pending·0 cites
- 3545US7351348B2Evaporation control using coatingIBM·Filed 2005·Granted Apr 1, 2008·0 cites·7 claims
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