Inventor · disambiguated record
Yaswanth Rangineni
Also filed as: RANGINENI YASWANTH
20 granted patents·6 pending applications·82 citations·filing 2014–2024
93Inventor score
Files withLAM RES CORP26
Top patents by PatentIndex Score
26 records- 0196US10622962B2Combiner and distributor for adjusting impedances or power across multiple plasma processing stationsLAM RES CORP·Filed 2019·Granted Apr 14, 2020·7 cites·18 claims
- 0296US9644271B1Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabricationLAM RES CORP·Filed 2016·Granted May 9, 2017·21 cites·24 claims
- 0396US9263350B2Multi-station plasma reactor with RF balancingLAM RES CORP·Filed 2014·Granted Feb 16, 2016·19 cites·12 claims
- 0494US10187032B2Combiner and distributor for adjusting impedances or power across multiple plasma processing stationsLAM RES CORP·Filed 2016·Granted Jan 22, 2019·8 cites·26 claims
- 0594US10128160B2Systems and methods for detection of plasma instability by electrical measurementLAM RES CORP·Filed 2017·Granted Nov 13, 2018·6 cites·20 claims
- 0693US9840776B2Multi-station plasma reactor with RF balancingLAM RES CORP·Filed 2015·Granted Dec 12, 2017·7 cites·8 claims
- 0793US2025070741A1Combiner and distributor for adjusting impedances or power across multiple plasma processing stationsLAM RES CORP·Filed 2024·Application pending·0 cites
- 0890US11258420B2Mutually induced filtersLAM RES CORP·Filed 2020·Granted Feb 22, 2022·2 cites·22 claims
- 0989US10145010B2Multi-station plasma reactor with RF balancingLAM RES CORP·Filed 2017·Granted Dec 4, 2018·4 cites·18 claims
- 1088US2024348223A1Mutually induced filtersLAM RES CORP·Filed 2024·Application pending·0 cites
- 1187US9824941B2Systems and methods for detection of plasma instability by electrical measurementLAM RES CORP·Filed 2016·Granted Nov 21, 2017·3 cites·21 claims
- 1286US10637427B2Mutually induced filtersLAM RES CORP·Filed 2018·Granted Apr 28, 2020·3 cites·23 claims
- 1383US9997422B2Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instabilityLAM RES CORP·Filed 2016·Granted Jun 12, 2018·2 cites·20 claims
- 1482US12143087B2Combiner and distributor for adjusting impedances or power across multiple plasma processing stationsLAM RES CORP·Filed 2022·Granted Nov 12, 2024·0 cites·20 claims
- 1578US12052006B2Mutually induced filtersLAM RES CORP·Filed 2022·Granted Jul 30, 2024·0 cites·20 claims
- 1675US2023246624A1Systems and methods for providing shunt cancellation of parasitic components in a plasma reactorLAM RES CORP·Filed 2023·Application pending·0 cites
- 1769US11258421B2Combiner and distributor for adjusting impedances or power across multiple plasma processing stationsLAM RES CORP·Filed 2020·Granted Feb 22, 2022·0 cites·22 claims
- 1858US2025285847A1Radio frequency system protection based on temperature inferenceLAM RES CORP·Filed 2023·Application pending·0 cites
- 1956US10879092B2Fault detection using showerhead voltage variationLAM RES CORP·Filed 2018·Granted Dec 29, 2020·0 cites·17 claims
- 2054US10044338B2Mutually induced filtersLAM RES CORP·Filed 2015·Granted Aug 7, 2018·0 cites·18 claims
- 2153US9941113B2Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabricationLAM RES CORP·Filed 2017·Granted Apr 10, 2018·0 cites·24 claims
- 2251US9875883B2Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matchingLAM RES CORP·Filed 2017·Granted Jan 23, 2018·0 cites·18 claims
- 2351US2018175819A1Systems and methods for providing shunt cancellation of parasitic components in a plasma reactorLAM RES CORP·Filed 2016·Application pending·0 cites
- 2448US10043690B2Fault detection using showerhead voltage variationLAM RES CORP·Filed 2016·Granted Aug 7, 2018·0 cites·14 claims
- 2548US9754769B2Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matchingLAM RES CORP·Filed 2015·Granted Sep 5, 2017·0 cites·18 claims
- 2644US2022375721A1Radio frequency (rf) power imbalancing in a multi-station integrated circuit fabrication chamberLAM RES CORP·Filed 2020·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →