Inventor · disambiguated record
Toshimasa Nakayama
Also filed as: NAKAYAMA TOSHIMASA
113 granted patents·2 pending applications·2,426 citations·filing 1974–2004
99Inventor score
Files withTOKYO OHKA KOGYO CO LTD107TOKYO OHKA KOGYA CO LTD2CHUGAI PHARMACEUTICAL CO LTD1TOGYO OHKA KOGYO CO LTD1TOKYO OHIKA KOGYO CO LTD1
Top patents by PatentIndex Score
115 records- 0197US5714625ACyanooxime sulfonate compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Feb 3, 1998·143 cites·6 claims
- 0296US5795702APhotoresist stripping liquid compositions and a method of stripping photoresists using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 18, 1998·165 cites·18 claims
- 0395US5792274ARemover solution composition for resist and method for removing resist using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 11, 1998·121 cites·7 claims
- 0493US4833067ADeveloping solution for positive-working photoresist comprising tmah and non-ionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted May 23, 1989·75 cites·1 claims
- 0592US5905063ARemover solution composition for resist and method for removing resist using the sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted May 18, 1999·81 cites·7 claims
- 0689US5968848AProcess for treating a lithographic substrate and a rinse solution for the treatmentTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Oct 19, 1999·97 cites·12 claims
- 0787US4731319APositive-working naphthoquinone diazide photoresist composition with two cresol novolac resinsTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Mar 15, 1988·48 cites·2 claims
- 0886US5496402AMethod and liquid coating composition for the formation of silica-based coating film on substrate surfaceTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 5, 1996·43 cites·12 claims
- 0986US5434031APositive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additiveTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jul 18, 1995·16 cites·9 claims
- 1085US6261745B1Post-ashing treating liquid compositions and a process for treatment therewithTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 17, 2001·71 cites·11 claims
- 1185US5863710ADeveloper solution for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jan 26, 1999·56 cites·6 claims
- 1285US5736296APositive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Apr 7, 1998·46 cites·24 claims
- 1384US5520952AMethod for forming a protective coating film on electronic parts and devicesTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted May 28, 1996·37 cites·7 claims
- 1483US4820621ADeveloper solution for positive-working photoresist compositions comprising a base and a non-ionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Apr 11, 1989·40 cites·6 claims
- 1583US4784937ADeveloping solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Nov 15, 1988·35 cites·2 claims
- 1682US6291142B1Photoresist stripping liquid compositions and a method of stripping photoresists using the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 18, 2001·17 cites·3 claims
- 1782US6068000ASubstrate treatment methodTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted May 30, 2000·62 cites·20 claims
- 1881US4873177AMethod for forming a resist pattern on a substrate surface and a scum-remover thereforTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Oct 10, 1989·31 cites·3 claims
- 1979US6268108B1Composition for forming antireflective coating film and method for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jul 31, 2001·40 cites·7 claims
- 2079US5762697ACoating solution for silica-based coating film and method for the preparation thereofTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jun 9, 1998·33 cites·7 claims
- 2179US5368783ANegative-working radiation-sensitive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Nov 29, 1994·32 cites·9 claims
- 2278US5631314ALiquid coating composition for use in forming photoresist coating films and photoresist material using said compositionTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted May 20, 1997·36 cites·18 claims
- 2377US6815151B2Rinsing solution for lithography and method for processing substrate with the use of the sameTOKYO OHIKA KOGYO CO LTD·Filed 2001·Granted Nov 9, 2004·19 cites·6 claims
- 2475US5908730AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jun 1, 1999·35 cites·19 claims
- 2575US5817444APositive-working photoresist composition and multilayered resist material using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Oct 6, 1998·35 cites·21 claims
- 2674US5929271ACompounds for use in a positive-working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 27, 1999·26 cites·2 claims
- 2773US5756255AUndercoating composition for photolithographyTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted May 26, 1998·38 cites·8 claims
- 2872US6492085B1Positive photoresist composition and process and synthesizing polyphenol compoundTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Dec 10, 2002·10 cites·6 claims
- 2972US5783362ALiquid coating composition for use in forming photoresist coating films and a photoresist material using said compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 21, 1998·27 cites·18 claims
- 3072US4944893ARemover solution for resistTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jul 31, 1990·32 cites·7 claims
- 3169US5614271AMethod for the formation of a silica-based coating filmTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Mar 25, 1997·39 cites·6 claims
- 3268US4882260APositive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dyeTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Nov 21, 1989·19 cites·5 claims
- 3367US5543268ADeveloper solution for actinic ray-sensitive resistTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Aug 6, 1996·17 cites·9 claims
- 3467US4906549APositive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atomsTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Mar 6, 1990·15 cites·5 claims
- 3566US4804612AHighly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturationTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Feb 14, 1989·17 cites·9 claims
- 3665US6296992B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Oct 2, 2001·6 cites·7 claims
- 3765US6225034B1Photoresist stripping liquid compositions and a method of stripping photoresists using the sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted May 1, 2001·20 cites·8 claims
- 3865US6136505ALiquid coating composition for use in forming antireflective film and photoresist material using said antireflective filmTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Oct 24, 2000·21 cites·7 claims
- 3964US6225030B1Post-ashing treating method for substratesTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 1, 2001·22 cites·2 claims
- 4064US5601961AHigh-sensitivity positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Feb 11, 1997·24 cites·44 claims
- 4162US6214104B1Coating solution for forming silica coating and method of forming silica coatingTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Apr 10, 2001·21 cites·20 claims
- 4262US5985525ADeveloper solution for photoresist compositionTOKYO OHTA KOGYO CO LTD·Filed 1993·Granted Nov 16, 1999·18 cites·9 claims
- 4361US5955240APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 21, 1999·23 cites·9 claims
- 4461US5498514ALithographic double-coated patterning plate with undercoat levelling layerTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 12, 1996·13 cites·3 claims
- 4561US5057397AElectron beam-curable resist composition and method for fine patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Oct 15, 1991·20 cites·5 claims
- 4660US6207340B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Mar 27, 2001·4 cites·6 claims
- 4760US6071673AMethod for the formation of resist patternTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jun 6, 2000·26 cites·9 claims
- 4860US5955241AChemical-amplification-type negative resist composition and method for forming negative resist patternTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Sep 21, 1999·19 cites·10 claims
- 4960US5948589APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 7, 1999·20 cites·8 claims
- 5059US6312863B1Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Nov 6, 2001·5 cites·12 claims
Showing the top 50 of 115 patent records by PatentIndex Score.
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