Inventor · disambiguated record
Hidekatsu Kohara
Also filed as: KOHARA HIDEKATSU
56 granted patents·4 pending applications·743 citations·filing 1986–2004
99Inventor score
Files withTOKYO OHKA KOGYO CO LTD56TOGYO OHKA KOGYO CO LTD1TOKYO OHKA KOBYO CO LTD1TOKYO OHKA KOGYA CO LTD1
Top patents by PatentIndex Score
60 records- 0193US4833067ADeveloping solution for positive-working photoresist comprising tmah and non-ionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted May 23, 1989·75 cites·1 claims
- 0293US4740451APhotosensitive compositions and a method of patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Apr 26, 1988·73 cites·7 claims
- 0387US4731319APositive-working naphthoquinone diazide photoresist composition with two cresol novolac resinsTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Mar 15, 1988·48 cites·2 claims
- 0486US5434031APositive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additiveTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jul 18, 1995·16 cites·9 claims
- 0584US6517993B2Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Feb 11, 2003·25 cites·16 claims
- 0683US4820621ADeveloper solution for positive-working photoresist compositions comprising a base and a non-ionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Apr 11, 1989·40 cites·6 claims
- 0783US4784937ADeveloping solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Nov 15, 1988·35 cites·2 claims
- 0881US4873177AMethod for forming a resist pattern on a substrate surface and a scum-remover thereforTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Oct 10, 1989·31 cites·3 claims
- 0972US6492085B1Positive photoresist composition and process and synthesizing polyphenol compoundTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Dec 10, 2002·10 cites·6 claims
- 1068US4882260APositive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dyeTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Nov 21, 1989·19 cites·5 claims
- 1167US4906549APositive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atomsTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Mar 6, 1990·15 cites·5 claims
- 1266US4804612AHighly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturationTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Feb 14, 1989·17 cites·9 claims
- 1365US6296992B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Oct 2, 2001·6 cites·7 claims
- 1464US5601961AHigh-sensitivity positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Feb 11, 1997·24 cites·44 claims
- 1561US5498514ALithographic double-coated patterning plate with undercoat levelling layerTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 12, 1996·13 cites·3 claims
- 1661US5057397AElectron beam-curable resist composition and method for fine patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Oct 15, 1991·20 cites·5 claims
- 1760US6207340B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Mar 27, 2001·4 cites·6 claims
- 1859US6312863B1Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Nov 6, 2001·5 cites·12 claims
- 1958US5501936APositive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compoundTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 26, 1996·15 cites·11 claims
- 2056US5478692APositive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenoneTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Dec 26, 1995·13 cites·10 claims
- 2155US6120969APolyphenol compound, quinonediazide ester and positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Sep 19, 2000·14 cites·5 claims
- 2254US6475694B2Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl groupTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Nov 5, 2002·4 cites·8 claims
- 2354US5853948APositive photoresist compositions and multilayer resist materials using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 29, 1998·15 cites·10 claims
- 2453US6566031B1Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist patternTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted May 20, 2003·3 cites·11 claims
- 2553US6379859B2Positive photoresist composition and process for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Apr 30, 2002·12 cites·17 claims
- 2653US5728504APositive photoresist compositions and multilayer resist materials using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Mar 17, 1998·15 cites·12 claims
- 2752US6187500B1Positive photoresist compositions and multilayer resist materials using sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Feb 13, 2001·13 cites·11 claims
- 2852US5518860APositive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compoundTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted May 21, 1996·13 cites·5 claims
- 2950US5576138APositive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additivesTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Nov 19, 1996·13 cites·11 claims
- 3049US6939926B2Phenol novolak resin, production process thereof, and positive photoresist composition using the sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 6, 2005·2 cites·1 claims
- 3148US5604077APositive-working photoresist composition comprising a novolac resin made in butyrolactone as a solventTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Feb 18, 1997·11 cites·5 claims
- 3248US5332647APositive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated articleTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jul 26, 1994·9 cites·10 claims
- 3348US4985333APositive-working photosensitive composition with three difference 1,2-naphthoquinone diazide sulfonic acid esters to include the ester of curcuminTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Jan 15, 1991·8 cites·5 claims
- 3447US6620978B2Positive photoresist composition and process for synthesizing polyphenol compoundTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Sep 16, 2003·1 cites·2 claims
- 3547US5384228AAlkali-developable positive-working photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jan 24, 1995·8 cites·7 claims
- 3646US6177226B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jan 23, 2001·7 cites·2 claims
- 3745US5401617AMethod for forming positive patterned resist layer on tantalum substrate utilizing quinone diazide composition with aromatic hydroxy additiveTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 28, 1995·6 cites·12 claims
- 3844US6207788B1Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resinTOKYO OHKA KOGYA CO LTD·Filed 1998·Granted Mar 27, 2001·8 cites·1 claims
- 3944US6030741APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Feb 29, 2000·8 cites·2 claims
- 4044US5180653AElectron beam-curable resist composition and method for fine patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1991·Granted Jan 19, 1993·10 cites·3 claims
- 4143US6106994AProduction process of polyphenol diesters, and positive photosensitive compositionsTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Aug 22, 2000·2 cites·6 claims
- 4243US5738968APositive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Apr 14, 1998·8 cites·8 claims
- 4341US6300033B1Positive photoresist composition and process for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Oct 9, 2001·6 cites·6 claims
- 4440US2002119390A1Positive photoresist composition and process for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Application pending·0 cites
- 4539US5702861APositive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 30, 1997·5 cites·9 claims
- 4639US5599653APattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layerTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Feb 4, 1997·5 cites·2 claims
- 4739US5401605APositive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compoundTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 28, 1995·5 cites·14 claims
- 4838US6127087APositive photoresist compositions and multilayer resist materials using sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Oct 3, 2000·5 cites·10 claims
- 4938US5702862APositive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanoneTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 30, 1997·6 cites·9 claims
- 5038US5281508APositive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresolTOKYO OHKA KOGYO CO LTD·Filed 1992·Granted Jan 25, 1994·4 cites·3 claims
Showing the top 50 of 60 patent records by PatentIndex Score.
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