Inventor · disambiguated record
Kazuyoshi Mizutani
Also filed as: MIZUTANI KAZUYOSHI
71 granted patents·12 pending applications·848 citations·filing 1990–2022
99Inventor score
Top patents by PatentIndex Score
83 records- 0198US8017304B2Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming methodFUJIFILM CORP·Filed 2009·Granted Sep 13, 2011·79 cites·19 claims
- 0296US8034547B2Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming methodFUJIFILM CORP·Filed 2008·Granted Oct 11, 2011·70 cites·12 claims
- 0395US7625690B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Granted Dec 1, 2009·24 cites·19 claims
- 0490US7214467B2Photosensitive resin compositionFUJIFILM CORP·Filed 2003·Granted May 8, 2007·38 cites·23 claims
- 0590US6165684ABottom anti-reflective coating material composition and method for forming resist pattern using the sameFUJI PHOTO FILM CO LTD·Filed 1997·Granted Dec 26, 2000·70 cites·3 claims
- 0689US6555289B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Apr 29, 2003·35 cites·7 claims
- 0789US6506535B1Positive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jan 14, 2003·33 cites·19 claims
- 0886US6878502B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Apr 12, 2005·27 cites·13 claims
- 0986US6852467B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Feb 8, 2005·25 cites·20 claims
- 1086US6808869B1Bottom anti-reflective coating material composition and method for forming resist pattern using the sameFUJI PHOTO FILM CO LTD·Filed 2000·Granted Oct 26, 2004·28 cites·8 claims
- 1186US6296985B1Positive photoresist composition comprising a polysiloxaneFUJI PHOTO FILM CO LTD·Filed 2000·Granted Oct 2, 2001·27 cites·2 claims
- 1284US6939662B2Positive-working resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Sep 6, 2005·24 cites·11 claims
- 1384US5488182APhenol compounds containing methoxymethyl group or hydroxymethyl groupFUJI PHOTO FILM CO LTD·Filed 1994·Granted Jan 30, 1996·21 cites·5 claims
- 1481US6830872B2Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compoundFUJI PHOTO FILM CO LTD·Filed 2002·Granted Dec 14, 2004·13 cites·17 claims
- 1581US6399269B2Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern using the sameFUJI PHOTO FILM CO LTD·Filed 1999·Granted Jun 4, 2002·46 cites·17 claims
- 1680US6589705B1Positive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jul 8, 2003·19 cites·10 claims
- 1779US8084187B2Resist composition and pattern forming method using the sameMIZUTANI KAZUYOSHI·Filed 2009·Granted Dec 27, 2011·5 cites·12 claims
- 1878US7108951B2Photosensitive resin compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Sep 19, 2006·16 cites·59 claims
- 1978US6387590B1Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted May 14, 2002·13 cites·13 claims
- 2077US7645557B2Positive resist composition for immersion exposure and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Jan 12, 2010·4 cites·14 claims
- 2177US6777161B2Lower layer resist composition for silicon-containing two-layer resistFUJI PHOTO FILM CO LTD·Filed 2002·Granted Aug 17, 2004·14 cites·14 claims
- 2276US7250246B2Positive resist composition and pattern formation method using the sameFUJIFILM CORP·Filed 2005·Granted Jul 31, 2007·4 cites·18 claims
- 2372US9709892B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameKATAOKA SHOHEI·Filed 2011·Granted Jul 18, 2017·2 cites·9 claims
- 2472US7807329B2Photosensitive composition and pattern-forming method using the sameFUJIFILM CORP·Filed 2006·Granted Oct 5, 2010·3 cites·15 claims
- 2568US8092977B2Positive resist composition and pattern forming method using the sameMIZUTANI KAZUYOSHI·Filed 2008·Granted Jan 10, 2012·2 cites·15 claims
- 2667US7374860B2Positive resist composition and pattern forming method using the sameFUJI FILM CORP·Filed 2006·Granted May 20, 2008·9 cites·11 claims
- 2767US7344821B2Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the sameFUJIFILM CORP·Filed 2005·Granted Mar 18, 2008·2 cites·7 claims
- 2866US7202015B2Positive photoresist composition and pattern making method using the sameFUJI PHOTO FILM CO LTD·Filed 2004·Granted Apr 10, 2007·8 cites·7 claims
- 2965US8603733B2Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming methodTARUTANI SHINJI·Filed 2011·Granted Dec 10, 2013·1 cites·29 claims
- 3065US7198880B2Positive resist compositionFUJIFILM CORP·Filed 2003·Granted Apr 3, 2007·8 cites·16 claims
- 3165US5143816ALight-sensitive composition comprising a polysiloxane and a naphthoquinoneFUJI PHOTO FILM CO LTD·Filed 1990·Granted Sep 1, 1992·19 cites·13 claims
- 3264US9551935B2Pattern forming method and resist compositionKATO KEITA·Filed 2011·Granted Jan 24, 2017·1 cites·34 claims
- 3364US7083892B2Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Aug 1, 2006·6 cites·12 claims
- 3464US6248500B1Composition for anti-reflective coating materialFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jun 19, 2001·6 cites·5 claims
- 3563US7157208B2Positive resist composition and pattern forming method using the sameFUJI PHOTO FILM CO LTD·Filed 2005·Granted Jan 2, 2007·7 cites·14 claims
- 3661US6132935ANegative-working image recording materialFUJI PHOTO FILM CO LTD·Filed 1996·Granted Oct 17, 2000·16 cites·13 claims
- 3760US6902862B2Resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Jun 7, 2005·16 cites·20 claims
- 3859US7887988B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Granted Feb 15, 2011·5 cites·4 claims
- 3959US7335454B2Positive resist compositionFUJIFILM CORP·Filed 2002·Granted Feb 26, 2008·5 cites·40 claims
- 4059US7232640B1Positive resist compositionFUJIFILM CORP·Filed 2004·Granted Jun 19, 2007·5 cites·13 claims
- 4159US2022283499A1Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 4258US7163776B2Positive-working resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Jan 16, 2007·5 cites·13 claims
- 4355US7923196B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Granted Apr 12, 2011·4 cites·17 claims
- 4453US7326513B2Positive working resist compositionFUJIFILM CORP·Filed 2004·Granted Feb 5, 2008·3 cites·10 claims
- 4553US6811947B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2003·Granted Nov 2, 2004·3 cites·17 claims
- 4653US6727040B2Positive resist composition to be irradiated with one of an electron beam and X-rayFUJI PHOTO FILM CO LTD·Filed 2001·Granted Apr 27, 2004·3 cites·15 claims
- 4751US6090531ACompostion for anti-reflective coating materialFUJI PHOTO FILM CO LTD·Filed 1997·Granted Jul 18, 2000·10 cites·3 claims
- 4850US9929376B2Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductorFUJIFILM CORP·Filed 2016·Granted Mar 27, 2018·0 cites·9 claims
- 4950US7147987B2Positive resist composition and pattern formation method using the sameFUJI PHOTO FILM CO LTD·Filed 2004·Granted Dec 12, 2006·2 cites·11 claims
- 5050US2006147837A1Resist compositionFUJI PHOTO FILM CO LTD·Filed 2006·Application pending·0 cites
Showing the top 50 of 83 patent records by PatentIndex Score.
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