Inventor · disambiguated record
Hiroo Takizawa
Also filed as: TAKIZAWA HIROO
81 granted patents·37 pending applications·597 citations·filing 1991–2023
99Inventor score
Files withFUJIFILM CORP59FUJI PHOTO FILM CO LTD43FUJI XEROX CO LTD5UDC IRELAND LTD3MURAKAMI TAKESHI2
Top patents by PatentIndex Score
118 records- 0196US7588863B2Hologram recording method and hologram recording materialFUJIFILM CORP·Filed 2004·Granted Sep 15, 2009·103 cites·16 claims
- 0296US7572555B2Hologram recording material, hologram recording method and optical recording mediumFUJIFILM CORP·Filed 2005·Granted Aug 11, 2009·102 cites·17 claims
- 0395US9291896B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·8 cites·20 claims
- 0493US9527809B2Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Dec 27, 2016·6 cites·12 claims
- 0593US9448482B2Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Sep 20, 2016·9 cites·9 claims
- 0691US9291898B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resinFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·8 cites·19 claims
- 0791US9188865B2Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Nov 17, 2015·7 cites·11 claims
- 0891US8945725B2Organic electroluminescence deviceTAKIZAWA HIROO·Filed 2010·Granted Feb 3, 2015·10 cites·29 claims
- 0991US6051359AHeat developable light-sensitive material and method of forming color imagesFUJI PHOTO FILM CO LTD·Filed 1997·Granted Apr 18, 2000·20 cites·15 claims
- 1088US9291897B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Mar 22, 2016·3 cites·11 claims
- 1187US9470980B2Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic deviceFUJIFILM CORP·Filed 2014·Granted Oct 18, 2016·5 cites·18 claims
- 1286US5874203AColor-developing agent, silver halide photographic light-sensitive material and image-forming methodFUJI PHOTO FILM CO LTD·Filed 1996·Granted Feb 23, 1999·14 cites·29 claims
- 1385US9170489B2Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic deviceFUJIFILM CORP·Filed 2014·Granted Oct 27, 2015·4 cites·54 claims
- 1485US7112616B2Two-photon absorbing polymerizable composition and polymerization process thereofFUJI PHOTO FILM CO LTD·Filed 2004·Granted Sep 26, 2006·28 cites·15 claims
- 1585US5756275AColor-developing agent, silver halide photographic light-sensitive material and image-forming methodFUJI PHOTO FILM CO LTD·Filed 1996·Granted May 26, 1998·13 cites·20 claims
- 1684US9651863B2Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted May 16, 2017·2 cites·22 claims
- 1784US7582391B2Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording materialFUJIFILM CORP·Filed 2005·Granted Sep 1, 2009·5 cites·9 claims
- 1883US6084176APhotoelectric conversion device and solar cellFUJI PHOTO FILM CO LTD·Filed 1998·Granted Jul 4, 2000·152 cites·9 claims
- 1982US9069246B2Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using theseFUJIFILM CORP·Filed 2014·Granted Jun 30, 2015·3 cites·14 claims
- 2082US2024057469A1Organic Electroluminescent DeviceUDC IRELAND LTD·Filed 2023·Application pending·0 cites
- 2180US9423690B2Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the sameFUJIFILM CORP·Filed 2015·Granted Aug 23, 2016·3 cites·14 claims
- 2279US8216698B2Organic electroluminescence device, novel platinum complex compound and novel compound capable of being a ligand thereofMURAKAMI TAKESHI·Filed 2009·Granted Jul 10, 2012·7 cites·5 claims
- 2378US9400430B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming patternFUJIFILM CORP·Filed 2014·Granted Jul 26, 2016·2 cites·23 claims
- 2476US9223215B2Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resinFUJIFILM CORP·Filed 2014·Granted Dec 29, 2015·2 cites·16 claims
- 2575US10403832B2Organic electroluminescence deviceUDC IRELAND LTD·Filed 2015·Granted Sep 3, 2019·1 cites·16 claims
- 2674US7236277B2Holographic recording medium and holographic recording method using the sameFUJI PHOTO FILM CO LTD·Filed 2004·Granted Jun 26, 2007·9 cites·4 claims
- 2772US8187729B2Organic electroluminescence deviceMURAKAMI TAKESHI·Filed 2008·Granted May 29, 2012·3 cites·6 claims
- 2871US9799832B2Organic thin-film transistor and method for manufacturing sameFUJIFILM CORP·Filed 2016·Granted Oct 24, 2017·1 cites·13 claims
- 2971US9323153B2Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the sameFUJIFILM CORP·Filed 2014·Granted Apr 26, 2016·2 cites·17 claims
- 3070US9766547B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Sep 19, 2017·1 cites·11 claims
- 3169US11832508B2Organic electroluminescence deviceUDC IRELAND LTD·Filed 2019·Granted Nov 28, 2023·0 cites·19 claims
- 3268US10444627B2Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Oct 15, 2019·1 cites·19 claims
- 3368US10031419B2Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Jul 24, 2018·1 cites·18 claims
- 3468US9411230B2Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Aug 9, 2016·1 cites·25 claims
- 3568US9323150B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming patternFUJIFILM CORP·Filed 2014·Granted Apr 26, 2016·1 cites·22 claims
- 3667US9829796B2Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Nov 28, 2017·1 cites·54 claims
- 3767US7531667B2Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording materialFUJIFILM CORP·Filed 2004·Granted May 12, 2009·5 cites·10 claims
- 3867US6632597B2Methine dye and silver halide photographic material containing the sameFUJI PHOTO FILM CO LTD·Filed 2001·Granted Oct 14, 2003·2 cites·13 claims
- 3966US10008671B2Organic thin-film transistor and method for manufacturing sameFUJIFILM CORP·Filed 2016·Granted Jun 26, 2018·1 cites·20 claims
- 4065US6750003B2Methine dye and silver halide photographic material containing the sameFUJI PHOTO FILM CO LTD·Filed 2003·Granted Jun 15, 2004·4 cites·19 claims
- 4162US7771915B2Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing methodFUJIFILM CORP·Filed 2004·Granted Aug 10, 2010·4 cites·19 claims
- 4261US7524589B2Holographic recording medium and recording methodFUJI XEROX CO LTD·Filed 2004·Granted Apr 28, 2009·5 cites·4 claims
- 4358US9500951B2Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Nov 22, 2016·0 cites·15 claims
- 4458US5468600ASilver halide color photographic materialFUJI PHOTO FILM CO LTD·Filed 1994·Granted Nov 21, 1995·4 cites·17 claims
- 4557US5612174APhotographic yellow dye-forming couplers and silver halide color photographic materials containing the sameFUJI PHOTO FILM CO LTD·Filed 1995·Granted Mar 18, 1997·3 cites·22 claims
- 4657US5484692ASilver halide photographic material and image forming method using the sameFUJI PHOTO FILM CO LTD·Filed 1994·Granted Jan 16, 1996·4 cites·13 claims
- 4755US5719018ASilver halide color light-sensitive materialFUJI PHOTO FILM CO LTD·Filed 1996·Granted Feb 17, 1998·3 cites·21 claims
- 4852US9188862B2Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the sameFUJIFILM CORP·Filed 2014·Granted Nov 17, 2015·0 cites·18 claims
- 4952US9152047B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compoundFUJIFILM CORP·Filed 2014·Granted Oct 6, 2015·0 cites·12 claims
- 5052US5747231ASilver halide photographic materialFUJI PHOTO FILM CO LTD·Filed 1996·Granted May 5, 1998·2 cites·11 claims
Showing the top 50 of 118 patent records by PatentIndex Score.
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