Inventor · disambiguated record
Marc Jurian Kea
Also filed as: KEA MARC JURIAN
9 granted patents·3 pending applications·15 citations·filing 2013–2023
82Inventor score
Files withASML NETHERLANDS BV12
Top patents by PatentIndex Score
12 records- 0186US11392044B2Method of determining a position of a featureASML NETHERLANDS BV·Filed 2020·Granted Jul 19, 2022·2 cites·26 claims
- 0286US11143971B2Control based on probability density function of parameterASML NETHERLANDS BV·Filed 2019·Granted Oct 12, 2021·3 cites·20 claims
- 0382US10578980B2Method of determining a position of a featureASML NETHERLANDS BV·Filed 2017·Granted Mar 3, 2020·2 cites·20 claims
- 0480US9715181B2Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2013·Granted Jul 25, 2017·3 cites·20 claims
- 0578US11860548B2Method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2020·Granted Jan 2, 2024·1 cites·21 claims
- 0676US2024111218A1A method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0774US9507279B2Method of operating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2013·Granted Nov 29, 2016·2 cites·9 claims
- 0867US9958790B2Inspection methods, substrates having metrology targets, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted May 1, 2018·2 cites·13 claims
- 0965US12124179B2Method of wafer alignment using at resolution metrology on product featuresASML NETHERLANDS BV·Filed 2021·Granted Oct 22, 2024·0 cites·20 claims
- 1052US2025336046A1System and method for distortion adjustment during inspectionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1148US11403453B2Defect predictionASML NETHERLANDS BV·Filed 2018·Granted Aug 2, 2022·0 cites·20 claims
- 1244US2024037890A1Topology-based image rendering in charged-particle beam inspection systemsASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
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