Inventor · disambiguated record
Tetsuo Gocho
Also filed as: GOCHO TETSUO
20 granted patents·4 pending applications·755 citations·filing 1990–2025
96Inventor score
Top patents by PatentIndex Score
24 records- 0193US11985443B2Solid-state image sensorSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2019·Granted May 14, 2024·4 cites·19 claims
- 0291US11476329B2Semiconductor deviceSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2019·Granted Oct 18, 2022·6 cites·18 claims
- 0390US5698352ASemiconductor device containing Si, O and N anti-reflective layerSONY CORP·Filed 1997·Granted Dec 16, 1997·75 cites·10 claims
- 0490US5641607AAnti-reflective layer used to form a semiconductor deviceSONY CORP·Filed 1995·Granted Jun 24, 1997·85 cites·5 claims
- 0590US5498565AMethod of forming trench isolation having polishing step and method of manufacturing semiconductor deviceSONY CORP·Filed 1992·Granted Mar 12, 1996·137 cites·2 claims
- 0687US5632910AMultilayer resist pattern forming methodSONY CORP·Filed 1994·Granted May 27, 1997·74 cites·12 claims
- 0787US5600165ASemiconductor device with antireflection filmSONY CORP·Filed 1995·Granted Feb 4, 1997·90 cites·11 claims
- 0886US5254171ABias ECR plasma CVD apparatus comprising susceptor, clamp, and chamber wall heating and cooling meansSONY CORP·Filed 1992·Granted Oct 19, 1993·52 cites·5 claims
- 0986US2025344465A1Semiconductor deviceSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2025·Application pending·0 cites
- 1085US6258654B1Method of manufacturing a semiconductor deviceSONY CORP·Filed 1999·Granted Jul 10, 2001·52 cites·18 claims
- 1183US12389647B2Semiconductor device including a field effect transistor with nanostructure based laminated channel structure and a field effect transistor with a single channel structureSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2024·Granted Aug 12, 2025·0 cites·15 claims
- 1281US12342093B2Solid-state image sensorSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2024·Granted Jun 24, 2025·0 cites·20 claims
- 1380US5472827AMethod of forming a resist pattern using an anti-reflective layerSONY CORP·Filed 1993·Granted Dec 5, 1995·53 cites·14 claims
- 1476US11961885B2Semiconductor deviceSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2022·Granted Apr 16, 2024·0 cites·15 claims
- 1573US5648202AMethod of forming a photoresist pattern using an anti-reflectiveSONY CORP·Filed 1995·Granted Jul 15, 1997·32 cites·12 claims
- 1664US5700349AMethod for forming multi-layer interconnectionsSONY CORP·Filed 1996·Granted Dec 23, 1997·32 cites·16 claims
- 1762US5502008AMethod for forming metal plug and/or wiring metal layerSONY CORP·Filed 1994·Granted Mar 26, 1996·30 cites·2 claims
- 1856US2025113655A1Semiconductor device, method of manufacturing the same, and electronic apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2023·Application pending·0 cites
- 1955US2024413185A1Semiconductor apparatus and method for manufacturing semiconductor apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2022·Application pending·0 cites
- 2049US5242853AManufacturing process for a semiconductor device using bias ecrcvd and an etch stop layerSONY CORP·Filed 1990·Granted Sep 7, 1993·13 cites·4 claims
- 2149US2023317759A1Semiconductor apparatus, imaging apparatus, and manufacturing method of semiconductor apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2021·Application pending·0 cites
- 2248US10991723B2Semiconductor device, method of manufacturing semiconductor device, and electronic apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2018·Granted Apr 27, 2021·0 cites·10 claims
- 2345US6218266B1Method of fabricating electronic devices of the type including smoothing process using polishingSONY CORP·Filed 1992·Granted Apr 17, 2001·14 cites·9 claims
- 2437USRE38363EMethod of forming trench isolation having polishing step and method of manufacturing semiconductor deviceSONY CORP·Filed 1998·Granted Dec 23, 2003·6 cites·2 claims
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