Inventor · disambiguated record
Jusuke Ogura
Also filed as: OGURA JUSUKE
24 granted patents·4 pending applications·223 citations·filing 2000–2014
95Inventor score
Files withADVANCED MICRO DEVICES INC10FUJITSU SEMICONDUCTOR LTD5FUJITSU LTD4OGURA JUSUKE2SPANSION LLC2
Top patents by PatentIndex Score
28 records- 0190US6617215B1Memory wordline hard maskADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 9, 2003·47 cites·20 claims
- 0289US8049334B1Buried silicide local interconnect with sidewall spacers and method for making the sameADVANCED MICRO DEVICES INC·Filed 2010·Granted Nov 1, 2011·8 cites·20 claims
- 0388US6642148B1RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresistADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 4, 2003·46 cites·16 claims
- 0485US7199426B2Nonvolatile semiconductor memory device and method for fabricating the sameFUJITSU LTD·Filed 2005·Granted Apr 3, 2007·16 cites·9 claims
- 0581US8173514B2Method of manufacturing semiconductor deviceOGURA JUSUKE·Filed 2009·Granted May 8, 2012·10 cites·13 claims
- 0678US8368219B2Buried silicide local interconnect with sidewall spacers and method for making the sameADVANCED MICRO DEVICES INC·Filed 2011·Granted Feb 5, 2013·3 cites·20 claims
- 0774US7786003B1Buried silicide local interconnect with sidewall spacers and method for making the sameADVANCED MICRO DEVICES INC·Filed 2005·Granted Aug 31, 2010·5 cites·11 claims
- 0873US7892969B2Method of manufacturing semiconductor deviceFUJITSU SEMICONDUCTOR LTD·Filed 2008·Granted Feb 22, 2011·4 cites·10 claims
- 0973US6809033B1Innovative method of hard mask removalFASL LLC·Filed 2001·Granted Oct 26, 2004·15 cites·23 claims
- 1070US6461973B1Method for forming high quality multiple thickness oxide layers by reducing descum induced defectsADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 8, 2002·13 cites·19 claims
- 1167US7816206B2Semiconductor device and method for fabricating the sameFUJITSU SEMICONDUCTOR LTD·Filed 2008·Granted Oct 19, 2010·2 cites·12 claims
- 1264US6573140B1Process for making a dual bit memory device with isolated polysilicon floating gatesADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 3, 2003·11 cites·17 claims
- 1364US6479411B1Method for forming high quality multiple thickness oxide using high temperature descumFiled 2000·Granted Nov 12, 2002·9 cites·21 claims
- 1463US7265014B1Avoiding field oxide gouging in shallow trench isolation (STI) regionsSPANSION LLC·Filed 2004·Granted Sep 4, 2007·9 cites·9 claims
- 1561US8362569B2Semiconductor device and semiconductor device fabrication methodFUJITSU SEMICONDUCTOR LTD·Filed 2010·Granted Jan 29, 2013·2 cites·13 claims
- 1660US6537866B1Method of forming narrow insulating spacers for use in reducing minimum component sizeADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 25, 2003·7 cites·21 claims
- 1757US6432618B1Method for forming high quality multiple thickness oxide layers by reducing descum induced defectsADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 13, 2002·5 cites·18 claims
- 1854US6828199B2Monos device having buried metal silicide bit lineADVANCED MICRO DEVICES LTD·Filed 2001·Granted Dec 7, 2004·9 cites·9 claims
- 1953US9287168B2Semiconductor device and process for producing the sameFUJITSU SEMICONDUCTOR LTD·Filed 2014·Granted Mar 15, 2016·0 cites·3 claims
- 2052US8790974B2Method of manufacturing semiconductor integrated circuit deviceFUJITSU SEMICONDUCTOR LTD·Filed 2013·Granted Jul 29, 2014·0 cites·4 claims
- 2151US8884375B2Semiconductor integrated circuit deviceNAKAI SATOSHI·Filed 2009·Granted Nov 11, 2014·0 cites·9 claims
- 2250US2007262412A1Avoiding Field Oxide Gouging In Shallow Trench Isolation (STI) RegionsSPANSION LLC·Filed 2007·Application pending·0 cites
- 2347US8518795B2Method of manufacturing semiconductor deviceOGURA JUSUKE·Filed 2012·Granted Aug 27, 2013·0 cites·3 claims
- 2446US2006220097A1Semiconductor device and method for fabricating the sameFUJITSU LTD·Filed 2005·Application pending·0 cites
- 2545US6713809B1Dual bit memory device with isolated polysilicon floating gatesADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 30, 2004·2 cites·17 claims
- 2643US2009032844A1Semiconductor device and method of manufacturing the sameFUJITSU LTD·Filed 2008·Application pending·0 cites
- 2741US8749062B2Semiconductor device and process for producing the sameMORIOKA HIROSHI·Filed 2007·Granted Jun 10, 2014·0 cites·6 claims
- 2841US2006220144A1Semiconductor device and its manufacture methodFUJITSU LTD·Filed 2005·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →