Inventor · disambiguated record
Ismail Kashkoush
Also filed as: KASHKOUSH ISMAIL · KASHKOUSH ISMAIL I
26 granted patents·15 pending applications·325 citations·filing 2002–2021
96Inventor score
Top patents by PatentIndex Score
41 records- 0192US7644512B1Systems and methods for drying a rotating substrateAKRION INC·Filed 2007·Granted Jan 12, 2010·49 cites·9 claims
- 0290US8739429B2Systems and methods for drying a rotating substrateAKRION SYSTEMS LLC·Filed 2012·Granted Jun 3, 2014·10 cites·13 claims
- 0390US8056253B2Systems and methods for drying a rotating substrateLIU ZHI LEWIS·Filed 2010·Granted Nov 15, 2011·12 cites·7 claims
- 0489US8276291B2Systems and methods for drying a rotating substrateLIU ZHI LEWIS·Filed 2011·Granted Oct 2, 2012·11 cites·20 claims
- 0587US8084280B2Method of manufacturing a solar cell using a pre-cleaning step that contributes to homogeneous texture morphologyKASHKOUSH ISMAIL·Filed 2010·Granted Dec 27, 2011·7 cites·20 claims
- 0685US6767877B2Method and system for chemical injection in silicon wafer processingAKRION LLC·Filed 2002·Granted Jul 27, 2004·67 cites·18 claims
- 0778US6837944B2Cleaning and drying method and apparatusAKRION LLC·Filed 2002·Granted Jan 4, 2005·24 cites·8 claims
- 0876US9337065B2Systems and methods for drying a rotating substrateAKRION SYSTEMS LLC·Filed 2014·Granted May 10, 2016·2 cites·9 claims
- 0974US6840250B2Nextgen wet process tankAKRION LLC·Filed 2002·Granted Jan 11, 2005·23 cites·24 claims
- 1072US7169253B2Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturingAKRION TECHNOLOGIES INC·Filed 2004·Granted Jan 30, 2007·10 cites·9 claims
- 1172US6626189B2Method of processing substrates using pressurized mist generationAKRION LLC·Filed 2002·Granted Sep 30, 2003·13 cites·14 claims
- 1271US6532974B2Process tank with pressurized mist generationAKRION LLC·Filed 2002·Granted Mar 18, 2003·13 cites·15 claims
- 1368US6766818B2Chemical concentration control deviceAKRION LLC·Filed 2002·Granted Jul 27, 2004·24 cites·23 claims
- 1466US7311847B2System and method for point-of-use filtration and purification of fluids used in substrate processingAKRION TECHNOLOGIES INC·Filed 2004·Granted Dec 25, 2007·10 cites·30 claims
- 1565US7976718B2System and method for selective etching of silicon nitride during substrate processingAKRION SYSTEMS LLC·Filed 2004·Granted Jul 12, 2011·10 cites·16 claims
- 1665US6928750B2Membrane dryerAKRION LLC·Filed 2004·Granted Aug 16, 2005·10 cites·14 claims
- 1764US8741066B2Method for cleaning substrates utilizing surface passivation and/or oxide layer growth to protect from pittingKASHKOUSH ISMAIL·Filed 2008·Granted Jun 3, 2014·2 cites·11 claims
- 1860US6842998B2Membrane dryerAKRION LLC·Filed 2002·Granted Jan 18, 2005·7 cites·15 claims
- 1959US8987032B2Method for selective under-etching of porous siliconKASHKOUSH ISMAIL I·Filed 2010·Granted Mar 24, 2015·1 cites·14 claims
- 2059US6649018B2System for removal of photoresist using spargerAKRION LLC·Filed 2002·Granted Nov 18, 2003·4 cites·15 claims
- 2159US2021210352A1Correlation between conductivity and ph measurements for koh texturing solutions and additivesNAURA AKRION INC·Filed 2021·Application pending·0 cites
- 2258US6871657B2Low profile wafer carrierAKRION LLC·Filed 2002·Granted Mar 29, 2005·9 cites·21 claims
- 2358US6818563B2Process and apparatus for removal of photoresist from semiconductor wafers using spray nozzlesAKRION LLC·Filed 2003·Granted Nov 16, 2004·4 cites·26 claims
- 2457US10181405B2Method for selective under-etching of porous siliconAKRION SYSTEMS LLC·Filed 2016·Granted Jan 15, 2019·0 cites·12 claims
- 2556US6863836B2Method for removal of photoresist using spargerAKRION LLC·Filed 2003·Granted Mar 8, 2005·3 cites·7 claims
- 2655US10991589B2Correlation between conductivity and pH measurements for KOH texturing solutions and additivesNAURA AKRION INC·Filed 2018·Granted Apr 27, 2021·0 cites·9 claims
- 2751US10170350B2Correlation between conductivity and pH measurements for KOH texturing solutions and additivesAKRION SYSTEMS LLC·Filed 2015·Granted Jan 1, 2019·0 cites·17 claims
- 2849US2007123052A1Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturingKASHKOUSH ISMAIL·Filed 2007·Application pending·0 cites
- 2949US2015194563A1Method for selective under-etching of porous siliconAKRION SYSTEMS LLC·Filed 2015·Application pending·0 cites
- 3045US2017133242A1Method of priming and drying substratesAKRION SYSTEMS LLC·Filed 2016·Application pending·0 cites
- 3143US2012102778A1Method of priming and drying substratesKASHKOUSH ISMAIL·Filed 2011·Application pending·0 cites
- 3242US2006260638A1Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devicesFANI PEJMAN·Filed 2006·Application pending·0 cites
- 3342US2008169007A1Apparatus and method for processing a hydrophobic surface of a substrateKASHKOUSH ISMAIL·Filed 2007·Application pending·0 cites
- 3442US2006260639A1Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devicesFANI PEJMAN·Filed 2006·Application pending·0 cites
- 3541US2006286808A1System and method of processing substrates using sonic energy having cavitation controlKASHKOUSH ISMAIL·Filed 2006·Application pending·0 cites
- 3640US2015118785A1Method for consistently texturizing silicon wafers during solar cell wet chemical processingAKRION SYSTEMS LLC·Filed 2013·Application pending·0 cites
- 3740US2006011214A1System and method for pre-gate cleaning of substratesLIU ZHI·Filed 2005·Application pending·0 cites
- 3839US2006054182A1System and method of powering a sonic energy source and use of the same to process substratesKORBLER JOHN·Filed 2005·Application pending·0 cites
- 3938US2003139057A1Process and apparatus for removal of photoresist from semiconductor wafersFiled 2002·Application pending·0 cites
- 4037US2014305471A1Reduced consumptions stand alone rinse tool having self-contained closed-loop fluid circuit, and method of rinsing substrates using the sameKASHKOUSH ISMAIL·Filed 2012·Application pending·0 cites
- 4133US2019219532A1Conductivity sensor and system and method for processing substrates incorporating the sameNAURA AKRION INC·Filed 2019·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →