Inventor · disambiguated record
Kazuo Nojiri
Also filed as: NOJIRI KAZUO
37 granted patents·3 pending applications·894 citations·filing 1990–2016
98Inventor score
Top patents by PatentIndex Score
40 records- 0195US10056264B2Atomic layer etching of GaN and other III-V materialsLAM RES CORP·Filed 2016·Granted Aug 21, 2018·20 cites·20 claims
- 0290US6607988B2Manufacturing method of semiconductor integrated circuit deviceHITACHI LTD·Filed 2000·Granted Aug 19, 2003·53 cites·10 claims
- 0390US6340632B1Method of manufacturing a semiconductor deviceHITACHI LTD·Filed 2000·Granted Jan 22, 2002·44 cites·37 claims
- 0490US6326218B1Semiconductor integrated circuit and its manufacturing methodHITACHI LTD·Filed 2000·Granted Dec 4, 2001·46 cites·6 claims
- 0590US5734188ASemiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the sameHITACHI LTD·Filed 1996·Granted Mar 31, 1998·73 cites·13 claims
- 0689US5007981AMethod of removing residual corrosive compounds by plasma etching followed by washingHITACHI LTD·Filed 1990·Granted Apr 16, 1991·106 cites·14 claims
- 0787US5868854AMethod and apparatus for processing samplesHITACHI LTD·Filed 1992·Granted Feb 9, 1999·67 cites·45 claims
- 0885US6451665B1Method of manufacturing a semiconductor integrated circuitHITACHI LTD·Filed 1999·Granted Sep 17, 2002·66 cites·8 claims
- 0985US5646489APlasma generator with mode restricting meansHITACHI LTD·Filed 1995·Granted Jul 8, 1997·43 cites·46 claims
- 1083US7419902B2Method of manufacture of semiconductor integrated circuitRENESAS TECH CORP·Filed 2005·Granted Sep 2, 2008·8 cites·44 claims
- 1183US6555464B2Semiconductor device and method of manufacturing the sameHITACHI LTD·Filed 2002·Granted Apr 29, 2003·25 cites·21 claims
- 1282US6537415B2Apparatus for processing samplesHITACHI LTD·Filed 2001·Granted Mar 25, 2003·17 cites·9 claims
- 1381US5661061AProcess for fabricating a semiconductor integrated circuit device having the multi-layered fin structureHITACHI LTD·Filed 1995·Granted Aug 26, 1997·48 cites·13 claims
- 1477US7737023B2Method of manufacture of semiconductor integrated circuit device and semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2008·Granted Jun 15, 2010·5 cites·27 claims
- 1576US7288156B2Methods for cleaning a substrateLAM RES CORP·Filed 2006·Granted Oct 30, 2007·5 cites·16 claims
- 1674US5433789AMethods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwavesHITACHI LTD·Filed 1993·Granted Jul 18, 1995·22 cites·27 claims
- 1773US5917211ASemiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the sameHITACHI LTD·Filed 1997·Granted Jun 29, 1999·37 cites·11 claims
- 1869US7004181B2Apparatus for cleaning a substrateLAM RES CORP·Filed 2002·Granted Feb 28, 2006·12 cites·18 claims
- 1966US6537417B2Apparatus for processing samplesHITACHI LTD·Filed 2001·Granted Mar 25, 2003·6 cites·16 claims
- 2066US6254721B1Method and apparatus for processing samplesHITACHI LTD·Filed 2000·Granted Jul 3, 2001·6 cites·9 claims
- 2165US6528400B2Method of manufacturing a semiconductor deviceHITACHI LTD·Filed 2001·Granted Mar 4, 2003·8 cites·18 claims
- 2265US5264712ASemiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the sameHITACHI LTD·Filed 1992·Granted Nov 23, 1993·27 cites·10 claims
- 2365US5200017ASample processing method and apparatusHITACHI LTD·Filed 1991·Granted Apr 6, 1993·38 cites·13 claims
- 2461US6432835B1Process for fabricating an integrated circuit device having a capacitor with an electrode formed at a high aspect ratioHITACHI LTD·Filed 1999·Granted Aug 13, 2002·25 cites·20 claims
- 2559US6186153B1Plasma treatment method and manufacturing method of semiconductor deviceHITACHI LTD·Filed 1998·Granted Feb 13, 2001·25 cites·16 claims
- 2655US6774020B2Semiconductor device and method of manufacturing the sameRENESAS TECH CORP·Filed 2003·Granted Aug 10, 2004·4 cites·21 claims
- 2753US6656846B2Apparatus for processing samplesHITACHI LTD·Filed 2001·Granted Dec 2, 2003·2 cites·10 claims
- 2852US6989228B2Method and apparatus for processing samplesHITACHI LTD·Filed 2001·Granted Jan 24, 2006·3 cites·16 claims
- 2949US6036816AApparatus for processing a sample having a metal laminateHITACHI LTD·Filed 1995·Granted Mar 14, 2000·8 cites·28 claims
- 3048US7132293B2Method and apparatus for processing samplesHITACHI LTD·Filed 2004·Granted Nov 7, 2006·1 cites·10 claims
- 3147US5952245AMethod for processing samplesHITACHI LTD·Filed 1996·Granted Sep 14, 1999·7 cites·11 claims
- 3247US5822081AFacsimile apparatus with improved network control and power supply section arrangementMATSUSHITA GRAPHIC COMMUNIC·Filed 1995·Granted Oct 13, 1998·10 cites·19 claims
- 3343US2007037292A1Method and apparatus for processing samplesKOJIMA MASAYUKI·Filed 2006·Application pending·0 cites
- 3442US6191045B1Method of treating surface of sampleHITACHI LTD·Filed 1999·Granted Feb 20, 2001·10 cites·18 claims
- 3539US2004092044A1Ion current density measuring method and instrument, and semiconductor device manufacturing methodFiled 2003·Application pending·0 cites
- 3637US5452110ACompact facsimile apparatus with improved component arrangementMATSUSHITA GRAPHIC COMMUNIC·Filed 1994·Granted Sep 19, 1995·4 cites·15 claims
- 3736US6656752B1Ion current density measuring method and instrument, and semiconductor device manufacturing methodHITACHI LTD·Filed 1999·Granted Dec 2, 2003·5 cites·5 claims
- 3835US6077788AMethod and apparatus for processing samplesHITACHI LTD·Filed 1995·Granted Jun 20, 2000·5 cites·6 claims
- 3933US5568277AFacsimile apparatus with improved control board arrangementMATSUSHITA GRAPHIC COMMUNIC·Filed 1995·Granted Oct 22, 1996·3 cites·6 claims
- 4032US2003217762A1Water supply apparatus and method thereofLAM RES CORP·Filed 2003·Application pending·0 cites
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