Inventor · disambiguated record
Yicheng Li
Also filed as: LI YICHENG
21 granted patents·12 pending applications·2,469 citations·filing 2001–2024
96Inventor score
Files withTOKYO ELECTRON LTD16UNIV JILIN5BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD3LI YICHENG3UNIV JIANGSU3
Top patents by PatentIndex Score
33 records- 0198US7794546B2Sealing device and method for a processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Sep 14, 2010·404 cites·24 claims
- 0298US7740705B2Exhaust apparatus configured to reduce particle contamination in a deposition systemTOKYO ELECTRON LTD·Filed 2006·Granted Jun 22, 2010·565 cites·11 claims
- 0398US7670432B2Exhaust system for a vacuum processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Mar 2, 2010·379 cites·14 claims
- 0498USD593969SProcessing chamber for manufacturing semiconductorsTOKYO ELECTRON LTD·Filed 2007·Granted Jun 9, 2009·541 cites·1 claims
- 0596US11862016B1Multi-intelligence federal reinforcement learning-based vehicle-road cooperative control system and method at complex intersectionUNIV JIANGSU·Filed 2022·Granted Jan 2, 2024·30 cites·5 claims
- 0696US8454749B2Method and system for sealing a first assembly to a second assembly of a processing systemLI YICHENG·Filed 2005·Granted Jun 4, 2013·376 cites·26 claims
- 0793US6437290B1Heat treatment apparatus having a thin light-transmitting windowTOKYO ELECTRON LTD·Filed 2001·Granted Aug 20, 2002·48 cites·30 claims
- 0889US12247956B1Rapid dot matrix micro-nano impact indentation testing systemUNIV JILIN·Filed 2024·Granted Mar 11, 2025·2 cites·5 claims
- 0989US12247957B1Pin-on-disk type in-situ current-carrying friction testing systemUNIV JILIN·Filed 2024·Granted Mar 11, 2025·1 cites·6 claims
- 1084US6448536B2Single-substrate-heat-processing apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2001·Granted Sep 10, 2002·32 cites·25 claims
- 1180US6891131B2Thermal processing systemTOKYO ELECTRON LTD·Filed 2001·Granted May 10, 2005·25 cites·11 claims
- 1280US6845292B2Transfer apparatus and method for semiconductor process and semiconductor processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 18, 2005·27 cites·20 claims
- 1369US11410833B2Lower electrode mechanism and reaction chamberBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2017·Granted Aug 9, 2022·1 cites·24 claims
- 1469US6641302B2Thermal process apparatus for a semiconductor substrateTOKYO ELECTRON LTD·Filed 2001·Granted Nov 4, 2003·13 cites·6 claims
- 1565US2024271310A1Reaction chamber component, preparation method, and reaction chamberBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2024·Application pending·0 cites
- 1662US12436072B1Micro-nano impact indentation testing device and method based on cyclic refrigerationUNIV JILIN·Filed 2024·Granted Oct 7, 2025·0 cites·9 claims
- 1761US2012315404A1Apparatus for thermal and plasma enhanced vapor deposition and method of operatingLI YICHENG·Filed 2012·Application pending·0 cites
- 1860US6889004B2Thermal processing system and thermal processing methodTOKYO ELECTRON LTD·Filed 2001·Granted May 3, 2005·7 cites·16 claims
- 1960US2025314571A1In-situ micro-nano impact indentation testing instrumentUNIV JILIN·Filed 2024·Application pending·0 cites
- 2059US12307789B2Multi-task joint perception network model and detection method for traffic road surface informationUNIV JIANGSU·Filed 2023·Granted May 20, 2025·0 cites·13 claims
- 2159US2025386402A1Dual cooperative induction temperature control device and control method for micro-nano impact indentation testerUNIV JILIN·Filed 2024·Application pending·0 cites
- 2257US2007116872A1Apparatus for thermal and plasma enhanced vapor deposition and method of operatingTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2356US6403926B2Thermal processing apparatus having a coolant passageTOKYO ELECTRON LTD·Filed 2001·Granted Jun 11, 2002·5 cites·14 claims
- 2454US7029505B2Sheet type heat treating apparatus and method for processing semiconductorsTOKYO ELECTRON LTD·Filed 2001·Granted Apr 18, 2006·7 cites·14 claims
- 2550US12032191B2Display screen cover and display screenNANJING LOPU CO LTD·Filed 2022·Granted Jul 9, 2024·0 cites·20 claims
- 2647USD589472SProcessing chamber for manufacturing semiconductorsTOKYO ELECTRON LTD·Filed 2007·Granted Mar 31, 2009·6 cites·1 claims
- 2747US2010212592A1Vacuum processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2844US2006130757A1Apparatus for active dispersion of precursorsLI YICHENG·Filed 2004·Application pending·0 cites
- 2943US2008127895A1Ultraviolet-ray-assisted processing apparatus for semiconductor processSHAO SHOU-QIAN·Filed 2008·Application pending·0 cites
- 3042US2021276548A1An extension adaptive lane-keeping control method with variable vehicle speedUNIV JIANGSU·Filed 2019·Application pending·0 cites
- 3142US2007116873A1Apparatus for thermal and plasma enhanced vapor deposition and method of operatingTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3239US2020406222A1Reaction chamber component, preparation method, and reaction chamberBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2018·Application pending·0 cites
- 3330US2004149215A1Ultraviolet ray assisted processing device for semiconductor processingFiled 2002·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →