Inventor · disambiguated record
Minako Inukai
Also filed as: INUKAI MINAKO
12 granted patents·9 pending applications·6 citations·filing 2008–2025
82Inventor score
Top patents by PatentIndex Score
21 records- 0191US11833550B2Substrate processing apparatus and substrate processing methodKIOXIA CORP·Filed 2022·Granted Dec 5, 2023·2 cites·12 claims
- 0276US2023260780A1Method for cleaning substrate and cleaning deviceKIOXIA CORP·Filed 2023·Application pending·0 cites
- 0373US2025144677A1Method for cleaning substrate and cleaning deviceKIOXIA CORP·Filed 2025·Application pending·0 cites
- 0470US12172194B2Substrate processing apparatus and substrate processing methodKIOXIA CORP·Filed 2023·Granted Dec 24, 2024·0 cites·19 claims
- 0570US11651953B2Method for cleaning substrate and cleaning deviceKIOXIA CORP·Filed 2020·Granted May 16, 2023·0 cites·13 claims
- 0664US8567420B2Cleaning apparatus for semiconductor waferINUKAI MINAKO·Filed 2009·Granted Oct 29, 2013·3 cites·20 claims
- 0761US10882082B2Freeze cleaning apparatusTOSHIBA MEMORY CORP·Filed 2020·Granted Jan 5, 2021·0 cites·4 claims
- 0858US11264233B2Method for cleaning substrate and substrate processing apparatusKIOXIA CORP·Filed 2020·Granted Mar 1, 2022·0 cites·12 claims
- 0957US8114755B2Method of manufacturing semiconductor deviceMIZUSHIMA ICHIRO·Filed 2008·Granted Feb 14, 2012·1 cites·20 claims
- 1054US2018047565A1Method for cleaning substrate and cleaning deviceTOSHIBA MEMORY CORP·Filed 2017·Application pending·0 cites
- 1152US2008308132A1Semiconductor substrate cleaning method using bubble/chemical mixed cleaning liquidTOMITA HIROSHI·Filed 2008·Application pending·0 cites
- 1251US10692715B2Method for cleaning substrate and substrate processing apparatusTOSHIBA MEMORY CORP·Filed 2017·Granted Jun 23, 2020·0 cites·10 claims
- 1351US8375964B2Template cleaning method, system, and apparatusTOSHIBA KK·Filed 2009·Granted Feb 19, 2013·0 cites·20 claims
- 1448US2018272391A1Freeze cleaning apparatusTOSHIBA MEMORY CORP·Filed 2017·Application pending·0 cites
- 1546US2011088731A1Semiconductor substrate cleaning method using bubble/chemical mixed cleaning liquidTOSHIBA KK·Filed 2010·Application pending·0 cites
- 1643US8961696B2Method and device for cleaning semiconductor substrateTOMITA HIROSHI·Filed 2012·Granted Feb 24, 2015·0 cites·7 claims
- 1742US11185895B2Substrate processing method, substrate processing apparatus, and composite processing apparatusTOSHIBA MEMORY CORP·Filed 2019·Granted Nov 30, 2021·0 cites·5 claims
- 1842US2009250431A1Substrate processing apparatus and substrate processing methodINUKAI MINAKO·Filed 2009·Application pending·0 cites
- 1937US2012118334A1Exhaust gas treatment device and method and semiconductor manufacturing systemOKUCHI HISASHI·Filed 2011·Application pending·0 cites
- 2036US2011061684A1Cleaning method for semiconductor waferTOMITA HIROSHI·Filed 2010·Application pending·0 cites
- 2135US10486203B2Substrate production method, substrate processing apparatus, and substrate production systemTOSHIBA MEMORY CORP·Filed 2016·Granted Nov 26, 2019·0 cites·21 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →