Inventor · disambiguated record
Paul Jacques Van Wijnen
Also filed as: VAN WIJNEN PAUL JACQUES
10 granted patents·84 citations·filing 2003–2021
88Inventor score
Top patents by PatentIndex Score
10 records- 0196US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 0290US10996176B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2020·Granted May 4, 2021·2 cites·19 claims
- 0389US10317191B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·4 cites·21 claims
- 0485US10746668B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2019·Granted Aug 18, 2020·2 cites·27 claims
- 0583US9594029B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2012·Granted Mar 14, 2017·4 cites·16 claims
- 0678US7679715B2Lithographic processing cell, lithographic apparatus, track and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Mar 16, 2010·4 cites·22 claims
- 0774US11977034B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2021·Granted May 7, 2024·0 cites·18 claims
- 0866US7403259B2Lithographic processing cell, lithographic apparatus, track and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jul 22, 2008·7 cites·24 claims
- 0948US7679714B2Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 16, 2010·0 cites·12 claims
- 1035US8642235B2Method of optimizing a die size, method of designing a pattern device manufacturing method, and computer program productVESELINOVIC PETAR·Filed 2012·Granted Feb 4, 2014·0 cites·20 claims
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