Inventor · disambiguated record
Eiichi Murakami
Also filed as: MURAKAMI EIICHI
64 granted patents·2 pending applications·1,868 citations·filing 1982–2020
99Inventor score
Top patents by PatentIndex Score
66 records- 0197US8544344B2Ultrasonic type flow sensorMURAKAMI EIICHI·Filed 2011·Granted Oct 1, 2013·32 cites·18 claims
- 0297US5241197ATransistor provided with strained germanium layerHITACHI LTD·Filed 1991·Granted Aug 31, 1993·188 cites·22 claims
- 0397US4929893AWafer proberCANON KK·Filed 1988·Granted May 29, 1990·206 cites·14 claims
- 0496US5820679AFabrication system and method having inter-apparatus transporterHITACHI LTD·Filed 1996·Granted Oct 13, 1998·144 cites·1 claims
- 0596US4683838APlasma treatment systemHITACHI LTD·Filed 1985·Granted Aug 4, 1987·85 cites·13 claims
- 0694US6099598AFabrication system and fabrication methodHITACHI LTD·Filed 1998·Granted Aug 8, 2000·99 cites·9 claims
- 0792US5416331ASurface atom fabrication method and apparatusHITACHI LTD·Filed 1992·Granted May 16, 1995·69 cites·36 claims
- 0891US7411301B2Semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2005·Granted Aug 12, 2008·16 cites·20 claims
- 0991US7062344B2Fabrication system and fabrication methodRENESAS TECH CORP·Filed 2003·Granted Jun 13, 2006·32 cites·12 claims
- 1090US6633362B2Projection exposure apparatusCANON KK·Filed 2000·Granted Oct 14, 2003·28 cites·21 claims
- 1189US9995612B2Coriolis mass flow meterATSUDEN CO LTD·Filed 2016·Granted Jun 12, 2018·4 cites·13 claims
- 1289US5858863AFabrication system and method having inter-apparatus transporterHITACHI LTD·Filed 1996·Granted Jan 12, 1999·63 cites·18 claims
- 1389US5017798ASurface examining apparatus for detecting the presence of foreign particles on two or more surfacesCANON KK·Filed 1989·Granted May 21, 1991·57 cites·12 claims
- 1488US7392106B2Fabrication system and fabrication methodRENESAS TECH CORP·Filed 2005·Granted Jun 24, 2008·8 cites·8 claims
- 1588US6614535B1Exposure apparatus with interferometerCANON KK·Filed 2000·Granted Sep 2, 2003·33 cites·15 claims
- 1686US9588934B2Ultrasonic type flowmeter apparatus and method of using the sameATSUDEN CO LTD·Filed 2012·Granted Mar 7, 2017·8 cites·8 claims
- 1786US7603194B2Fabrication system and fabrication methodRENESAS TECH CORP·Filed 2008·Granted Oct 13, 2009·6 cites·3 claims
- 1886US7310563B2Fabrication system and fabrication methodRENESAS TECH CORP·Filed 2005·Granted Dec 18, 2007·6 cites·6 claims
- 1985US6962825B2Exposure apparatusCANON KK·Filed 2001·Granted Nov 8, 2005·20 cites·10 claims
- 2085US4795911ASurface examining apparatus for detecting the presence of foreign particles on the surfaceCANON KK·Filed 1987·Granted Jan 3, 1989·54 cites·2 claims
- 2184US8919208B2Ultrasonic flowmeter apparatus having a first and a second housing part with grooves for clamping a resilient conduitMURAKAMI EIICHI·Filed 2011·Granted Dec 30, 2014·7 cites·14 claims
- 2284US4886975ASurface examining apparatus for detecting the presence of foreign particles on two or more surfacesCANON KK·Filed 1989·Granted Dec 12, 1989·44 cites·3 claims
- 2383US5751404AExposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference platesCANON KK·Filed 1996·Granted May 12, 1998·54 cites·29 claims
- 2482US5562800AWafer transport methodHITACHI LTD·Filed 1994·Granted Oct 8, 1996·69 cites·21 claims
- 2580US11181405B2Clamp-type ultrasonic flow measuring apparatus with a mounter for press tight fit of a transmission/reception unit to the measuring pipeRYUSOK CO LTD·Filed 2019·Granted Nov 23, 2021·3 cites·5 claims
- 2680US7236254B2Exposure apparatus with interferometerCANON KK·Filed 2006·Granted Jun 26, 2007·8 cites·9 claims
- 2780US5695897AAlignment method and semiconductor exposure methodCANON KK·Filed 1995·Granted Dec 9, 1997·48 cites·10 claims
- 2879US7046330B2Exposure apparatusCANON KK·Filed 2005·Granted May 16, 2006·4 cites·3 claims
- 2976US6953728B2Semiconductor device and method of manufacturing thereofHITACHI LTD·Filed 2004·Granted Oct 11, 2005·17 cites·5 claims
- 3076US6727146B2Semiconductor device and method of manufacturing thereofHITACHI LTD·Filed 2002·Granted Apr 27, 2004·17 cites·2 claims
- 3176US4934064AAlignment method in a wafer proberCANON KK·Filed 1988·Granted Jun 19, 1990·46 cites·5 claims
- 3274US5689494ASurface atom fabrication method and apparatusHITACHI LTD·Filed 1995·Granted Nov 18, 1997·22 cites·20 claims
- 3373US7023091B2Semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2003·Granted Apr 4, 2006·13 cites·11 claims
- 3473US4903352AFluid flow massaging apparatusRALLY MASTER CO LTD·Filed 1989·Granted Feb 27, 1990·50 cites·13 claims
- 3572US8720280B2Ultrasonic flowmeter apparatusATSUDEN CO LTD·Filed 2013·Granted May 13, 2014·3 cites·20 claims
- 3672US4780205APermselective hollow fiber membrane, process for the preparation thereof, method and apparatus for plasma components separationTEIJIN LTD·Filed 1985·Granted Oct 25, 1988·37 cites·9 claims
- 3771US7977238B2Method of manufacturing a semiconductor integrated circuit deviceRENESAS ELECTRONICS CORP·Filed 2010·Granted Jul 12, 2011·2 cites·16 claims
- 3870US6795161B2Exposure apparatus, method of manufacturing semiconductor devices and plant thereforCANON KK·Filed 2001·Granted Sep 21, 2004·11 cites·20 claims
- 3970US5594549APosition detecting method and projection exposure apparatus using the sameCANON KK·Filed 1993·Granted Jan 14, 1997·23 cites·8 claims
- 4070US4808546ASOI process for forming a thin film transistor using solid phase epitaxyHITACHI LTD·Filed 1987·Granted Feb 28, 1989·37 cites·24 claims
- 4167US6677194B2Method of manufacturing a semiconductor integrated circuit deviceHITACHI LTD·Filed 2002·Granted Jan 13, 2004·11 cites·22 claims
- 4266US7786585B2Semiconductor integrated circuit deviceRENESAS ELECTRONICS CORP·Filed 2008·Granted Aug 31, 2010·2 cites·32 claims
- 4365US5601686AWafer transport methodHITACHI LTD·Filed 1996·Granted Feb 11, 1997·26 cites·22 claims
- 4463US8997581B2Flow rate measuring deviceSATO HARUMICHI·Filed 2010·Granted Apr 7, 2015·3 cites·16 claims
- 4561US7023561B2Exposure apparatus with interferometerCANON KK·Filed 2003·Granted Apr 4, 2006·7 cites·16 claims
- 4661US5083329AApparatus for effecting massage with water streamMURAKAMI EIICHI·Filed 1990·Granted Jan 28, 1992·35 cites·11 claims
- 4761US2010131093A1Fabrication system and fabrication methodRENESAS TECH CORP·Filed 2009·Application pending·0 cites
- 4857US9391606B2Semiconductor integrated circuit deviceRENESAS ELECTRONICS CORP·Filed 2014·Granted Jul 12, 2016·1 cites·6 claims
- 4956US10175078B2Coriolis mass flow meterATSUDEN CO LTD·Filed 2018·Granted Jan 8, 2019·0 cites·12 claims
- 5055US4984048ASemiconductor device with buried side contactHITACHI LTD·Filed 1988·Granted Jan 8, 1991·20 cites·30 claims
Showing the top 50 of 66 patent records by PatentIndex Score.
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