Inventor · disambiguated record
Shinji Kishimura
Also filed as: KISHIMURA SHINJI
57 granted patents·5 pending applications·366 citations·filing 1990–2006
98Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD25SHINETSU CHEMICAL CO14CENTRAL GLASS CO LTD11MITSUBISHI ELECTRIC CORP9KISHIMURA SHINJI1
Top patents by PatentIndex Score
62 records- 0183US6875556B2Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Apr 5, 2005·20 cites·9 claims
- 0283US6710148B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 23, 2004·20 cites·20 claims
- 0375US7125641B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·13 cites·17 claims
- 0475US6872514B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 29, 2005·13 cites·16 claims
- 0574US7125643B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·11 cites·16 claims
- 0670US6528240B1Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Mar 4, 2003·10 cites·17 claims
- 0770US6511787B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·25 cites·7 claims
- 0868US5123998AMethod of forming patternsMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Jun 23, 1992·20 cites·14 claims
- 0967US7378216B2Resist material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted May 27, 2008·2 cites·22 claims
- 1066US7067231B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Jun 27, 2006·19 cites·7 claims
- 1164US7169869B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2005·Granted Jan 30, 2007·1 cites·8 claims
- 1264US6824955B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Nov 30, 2004·7 cites·11 claims
- 1363US7125642B2Sulfonates, polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·6 cites·19 claims
- 1462US7060775B2Polymer compound, resist material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Jun 13, 2006·6 cites·37 claims
- 1562US6916592B2Esters, polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2003·Granted Jul 12, 2005·16 cites·20 claims
- 1662US6673523B2Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Jan 6, 2004·5 cites·15 claims
- 1761US6861197B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 1, 2005·6 cites·22 claims
- 1860US6461790B1Polymers, chemical amplification resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Oct 8, 2002·5 cites·28 claims
- 1959US6632582B2Pattern formation material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Oct 14, 2003·14 cites·24 claims
- 2059US6582880B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 24, 2003·14 cites·20 claims
- 2156US6933095B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2002·Granted Aug 23, 2005·3 cites·15 claims
- 2255US7166418B2Sulfonamide compound, polymer compound, resist material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Jan 23, 2007·2 cites·15 claims
- 2354US7241553B2Polymer, resist composition, and patterning processCENTRAL GLASS CO LTD·Filed 2005·Granted Jul 10, 2007·4 cites·16 claims
- 2454US6864037B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 8, 2005·11 cites·18 claims
- 2554US6475706B1Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Nov 5, 2002·3 cites·10 claims
- 2653US6521393B1Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Feb 18, 2003·10 cites·8 claims
- 2751US6124081AMethod of forming a resist patternMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Sep 26, 2000·12 cites·20 claims
- 2851US5591654AMethod of manufacturing a semiconductor device and a resist composition used thereinMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jan 7, 1997·21 cites·15 claims
- 2951US5426016AMethod of forming and removing resist patternMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Jun 20, 1995·8 cites·9 claims
- 3050US7001707B2Resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Feb 21, 2006·2 cites·8 claims
- 3150US6645694B2Pattern formation material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Nov 11, 2003·2 cites·20 claims
- 3250US6444395B1Pattern formation material and methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Sep 3, 2002·2 cites·20 claims
- 3349US7169530B2Polymer compound, resist material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Jan 30, 2007·8 cites·25 claims
- 3449US7005228B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2002·Granted Feb 28, 2006·2 cites·18 claims
- 3547US6855477B2Chemically amplified resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Feb 15, 2005·1 cites·5 claims
- 3646US7078147B2Polymers, resist compositions and patterning processMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Jul 18, 2006·6 cites·14 claims
- 3746US6603037B2Ester compoundsSHINETSU CHEMICAL CO·Filed 2002·Granted Aug 5, 2003·0 cites·2 claims
- 3843US6946235B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2003·Granted Sep 20, 2005·4 cites·6 claims
- 3942US6806029B2Pattern formation material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Oct 19, 2004·0 cites·28 claims
- 4042US6790586B2Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Sep 14, 2004·4 cites·11 claims
- 4142US6660447B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 9, 2003·0 cites·24 claims
- 4242US5648199AMethod of forming a resist pattern utilizing an acid water-soluble material overlayer on the resist filmMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Jul 15, 1997·7 cites·12 claims
- 4341US2003091941A1Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Application pending·0 cites
- 4441US2005175935A1Polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2005·Application pending·0 cites
- 4540US5252433AMethod of forming and removing resist patternMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Oct 12, 1993·4 cites·6 claims
- 4640US2005277057A1Resist material and pattern formation methodKISHIMURA SHINJI·Filed 2005·Application pending·0 cites
- 4738US6689536B2Pattern formation material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Feb 10, 2004·0 cites·20 claims
- 4837US7413843B2Sulfonamide compound, polymer compound, resist material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2006·Granted Aug 19, 2008·0 cites·7 claims
- 4937US6753132B2Pattern formation material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Jun 22, 2004·2 cites·20 claims
- 5037US6537736B1Patten formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Mar 25, 2003·0 cites·7 claims
Showing the top 50 of 62 patent records by PatentIndex Score.
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