Inventor · disambiguated record
Walter E. Mlynko
Also filed as: MLYNKO WALTER E
11 granted patents·309 citations·filing 1986–1998
92Inventor score
Files withIBM11
Top patents by PatentIndex Score
11 records- 0191US5312717AResidue free vertical pattern transfer with top surface imaging resistsIBM·Filed 1992·Granted May 17, 1994·78 cites·4 claims
- 0282US6221775B1Combined chemical mechanical polishing and reactive ion etching processIBM·Filed 1998·Granted Apr 24, 2001·64 cites·26 claims
- 0380US6147394AMethod of photolithographically defining three regions with one mask step and self aligned isolation structure formed therebyIBM·Filed 1998·Granted Nov 14, 2000·54 cites·1 claims
- 0473US5972570AMethod of photolithographically defining three regions with one mask step and self aligned isolation structure formed therebyIBM·Filed 1997·Granted Oct 26, 1999·38 cites·19 claims
- 0561US4654115AProcess for removing contaminantIBM·Filed 1986·Granted Mar 31, 1987·22 cites·11 claims
- 0652US5610441AAngle defined trench conductor for a semiconductor deviceIBM·Filed 1995·Granted Mar 11, 1997·15 cites·3 claims
- 0748US4985112AEnhanced plasma etchingIBM·Filed 1987·Granted Jan 15, 1991·16 cites·9 claims
- 0847US5672537AMethod for preparing a narrow angle defined trench in a substrateIBM·Filed 1996·Granted Sep 30, 1997·12 cites·3 claims
- 0933US5053104AMethod of plasma etching a substrate with a gaseous organohalide compoundIBM·Filed 1989·Granted Oct 1, 1991·6 cites·19 claims
- 1033US4853081AProcess for removing contaminantIBM·Filed 1987·Granted Aug 1, 1989·4 cites·11 claims
- 1130US5110409AEnhanced plasma etchingIBM·Filed 1990·Granted May 5, 1992·0 cites·13 claims
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