Inventor · disambiguated record
Teruyuki Hayashi
Also filed as: HAYASHI TERUYUKI
30 granted patents·20 pending applications·311 citations·filing 1979–2017
96Inventor score
Files withTOKYO ELECTRON LTD24NAT INST OF ADVANCED IND SCIEN4AGENCY IND SCIENCE TECHN3ISHIKAWA HIRAKU3KAWAMURA SHIGERU2
Top patents by PatentIndex Score
50 records- 0197US6903264B2Electric wire coated with polyvinyl chloride resin composition and cableHITACHI CABLE·Filed 2002·Granted Jun 7, 2005·76 cites·21 claims
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- 0386US7420118B2Electric wire and cable with coating/covering of polyvinyl chloride family resin compositionTOKYO ELECTRON LTD·Filed 2005·Granted Sep 2, 2008·5 cites·24 claims
- 0486US6331890B1Thickness measuring apparatus, substrate processing method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Dec 18, 2001·66 cites·18 claims
- 0583US4370258ACatalyst system for hydroformylation of olefinsAGENCY IND SCIENCE TECHN·Filed 1981·Granted Jan 25, 1983·19 cites·5 claims
- 0682US6344387B1Wafer boat and film formation methodTOKYO ELECTRON LTD·Filed 2000·Granted Feb 5, 2002·28 cites·12 claims
- 0782US4229381AProcess for preparation of aldehydesAGENCY IND SCIENCE TECHN·Filed 1979·Granted Oct 21, 1980·15 cites·22 claims
- 0875US8950999B2Substrate processing apparatus and particle adhesion preventing methodTAMURA AKITAKE·Filed 2008·Granted Feb 10, 2015·5 cites·15 claims
- 0973US8040504B2Defect inspecting method and defect inspecting apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Oct 18, 2011·4 cites·10 claims
- 1073US7208428B2Method and apparatus for treating article to be treatedTOKYO ELECTRON LTD·Filed 2001·Granted Apr 24, 2007·17 cites·7 claims
- 1168US7508518B2Particle measuring method and particle measuring apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Mar 24, 2009·2 cites·12 claims
- 1268US6537347B2Method for deciding on the timing of replacing a chemical filter, filter life detection sensor, chemical filter unit, and semiconductor manufacturing apparatusOMRON TATEISI ELECTRONICS CO·Filed 2002·Granted Mar 25, 2003·16 cites·8 claims
- 1366US7829044B2Phosphonamides, process for producing the same, and use thereofJAPAN SCIENCE & TECH AGENCY·Filed 2003·Granted Nov 9, 2010·5 cites·11 claims
- 1465US6774200B2Silsesquioxane polymer molding and method of preparing sameNAT INST OF ADVANCED IND SCIEN·Filed 2002·Granted Aug 10, 2004·6 cites·10 claims
- 1564US8647440B2Substrate processing method and substrate processing apparatusKAWAMURA SHIGERU·Filed 2007·Granted Feb 11, 2014·3 cites·5 claims
- 1664US7946152B2Apparatus and method for measuring the concentration of organic gasTOKYO ELECTRON LTD·Filed 2006·Granted May 24, 2011·1 cites·8 claims
- 1761US8608422B2Particle sticking prevention apparatus and plasma processing apparatusMORIYA TSUYOSHI·Filed 2004·Granted Dec 17, 2013·7 cites·24 claims
- 1860US8008211B2Pattern forming method, semiconductor device manufacturing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Aug 30, 2011·1 cites·9 claims
- 1960US6753401B1Silcon-containing polymersNAT INST OF ADVANCED IND SCIEN·Filed 2000·Granted Jun 22, 2004·5 cites·4 claims
- 2060US2010154712A1Source gas generating device and film forming apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2158US2009194233A1Component for semicondutor processing apparatus and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2257US5151538AOrganosilicon compound and process for producing organosilicon compoundAGENCY IND SCIENCE TECHN·Filed 1990·Granted Sep 29, 1992·7 cites·5 claims
- 2357US2011244693A1Component for semiconductor processing apparatus and manufacturing method thereofTAMURA AKITAKE·Filed 2011·Application pending·0 cites
- 2455US8674397B2Sealing film forming method, sealing film forming device, and light-emitting deviceTOKYO ELECTRON LTD·Filed 2012·Granted Mar 18, 2014·0 cites·8 claims
- 2554US2015114562A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2650US2009065027A1Substrate cleaning apparatus, substrate cleaning method, and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2749US6949621B2Polymer containing 9-oxo-9-phosphafluorene-2,7-diyl skeleton in backbone and process for producing the sameNAT INST OF ADVANCED IND SCIEN·Filed 2002·Granted Sep 27, 2005·2 cites·36 claims
- 2849US2011240223A1Substrate processing systemTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2947US7923680B2Analysis method and analysis apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Apr 12, 2011·0 cites·12 claims
- 3047US2009206253A1Substrate inspection method, substrate inspection apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3147US2013209666A1Evaporating apparatus and evaporating methodKAMADA TOMIKO·Filed 2011·Application pending·0 cites
- 3246US2011090612A1Atmosphere cleaning deviceTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3345US8945412B2Substrate cleaning apparatus, substrate cleaning method, and substrate processing apparatusKAWAMURA SHIGERU·Filed 2012·Granted Feb 3, 2015·0 cites·4 claims
- 3445US2008230096A1Substrate cleaning device and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3544US2009206255A1Substrate inspection device and substrate inspection methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3644US2012031339A1Deposition head and film forming apparatusONO YUJI·Filed 2010·Application pending·0 cites
- 3744US2009183476A1Gas purifying apparatus and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3843US8809207B2Pattern-forming method and method for manufacturing semiconductor deviceISHIKAWA HIRAKU·Filed 2012·Granted Aug 19, 2014·0 cites·10 claims
- 3942US2005143597A1Process for producing carbonyl compoundFiled 2003·Application pending·0 cites
- 4041US10615378B2Reduced-pressure drying apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Apr 7, 2020·0 cites·20 claims
- 4141US8268185B2Method for analyzing quartz memberDOBASHI KAZUYA·Filed 2007·Granted Sep 18, 2012·0 cites·8 claims
- 4241US2006174835A1Vacuum processing apparatus and method of using the sameSAITO MISAKO·Filed 2006·Application pending·0 cites
- 4341US2012094014A1Vapor deposition apparatus and vapor deposition methodONO YUJI·Filed 2010·Application pending·0 cites
- 4439US2013330928A1Film forming device, substrate processing system and semiconductor device manufacturing methodISHIKAWA HIRAKU·Filed 2012·Application pending·0 cites
- 4538US2012160671A1Sputtering deviceISHIKAWA HIRAKU·Filed 2010·Application pending·0 cites
- 4637US6787241B2Film obtained from silsesquioxane polymer and method of preparing sameNAT INST OF ADVANCED IND SCIEN·Filed 2002·Granted Sep 7, 2004·0 cites·9 claims
- 4736US8021623B2Examination method and examination assistant device for quartz product of semiconductor processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Sep 20, 2011·0 cites·18 claims
- 4835US2003065117A1Modified silicone compound, process of producing the same, and cured object obtained therefromFiled 2001·Application pending·0 cites
- 4934US6403498B1Method and device for treating substrateTOKYO ELECTRON LTD·Filed 1998·Granted Jun 11, 2002·4 cites·23 claims
- 5030US2003000458A1Quartz member for semiconductor manufacturing equipment and method for metal analysis in quartz memberFiled 2000·Application pending·0 cites
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