Inventor · disambiguated record
Thomas B. Faure
Also filed as: FAURE THOMAS B · FAURE THOMAS BENJAMIN
23 granted patents·388 citations·filing 1991–2019
96Inventor score
Top patents by PatentIndex Score
23 records- 0189US5160987AThree-dimensional semiconductor structures formed from planar layersIBM·Filed 1991·Granted Nov 3, 1992·197 cites·16 claims
- 0276US5783309ARecovery of an anodically bonded glass device from a substrate by use of a metal interlayerIBM·Filed 1996·Granted Jul 21, 1998·32 cites·10 claims
- 0373US6436605B1Plasma resistant composition and use thereofIBM·Filed 1999·Granted Aug 20, 2002·31 cites·25 claims
- 0473US5459001ALow stress electrodeposition of gold for x-ray mask fabricationIBM·Filed 1994·Granted Oct 17, 1995·18 cites·9 claims
- 0567US6162565ADilute acid rinse after develop for chrome etchIBM·Filed 1998·Granted Dec 19, 2000·22 cites·26 claims
- 0666US8568959B2Techniques for reducing degradation and/or modifying feature size of photomasksBARTLAU PETER H·Filed 2008·Granted Oct 29, 2013·3 cites·24 claims
- 0766US7754394B2Method to etch chrome for photomask fabricationIBM·Filed 2006·Granted Jul 13, 2010·2 cites·12 claims
- 0865US7709300B2Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masksIBM·Filed 2006·Granted May 4, 2010·3 cites·20 claims
- 0964US5124561AProcess for X-ray mask warpage reductionIBM·Filed 1991·Granted Jun 23, 1992·18 cites·32 claims
- 1063US7014959B2CD uniformity of chrome etch to photomask processIBM·Filed 2003·Granted Mar 21, 2006·8 cites·27 claims
- 1162US7861208B2Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masksIBM·Filed 2007·Granted Dec 28, 2010·2 cites·12 claims
- 1260US11143953B2Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3IBM·Filed 2019·Granted Oct 12, 2021·0 cites·19 claims
- 1359US5318687ALow stress electrodeposition of gold for X-ray mask fabricationIBM·Filed 1992·Granted Jun 7, 1994·13 cites·6 claims
- 1454US6758912B2Method of inhibiting contaminants using dilute acid rinseIBM·Filed 2002·Granted Jul 6, 2004·3 cites·13 claims
- 1552US5319240AThree dimensional integrated device and circuit structuresIBM·Filed 1993·Granted Jun 7, 1994·13 cites·7 claims
- 1650US7014958B2Method for dry etching photomask materialIBM·Filed 2003·Granted Mar 21, 2006·2 cites·22 claims
- 1750US6494966B2Method of minimizing contaminating deposits using dilute acid rinseIBM·Filed 2000·Granted Dec 17, 2002·2 cites·11 claims
- 1842US5538151ARecovery of an anodically bonded glass device from a susstrate by use of a metal interlayerIBM·Filed 1995·Granted Jul 23, 1996·6 cites·9 claims
- 1934US6270949B1Single component developer for copolymer resistsIBM·Filed 1999·Granted Aug 7, 2001·4 cites·6 claims
- 2034US6039858APlating process for x-ray mask fabricationIBM·Filed 1998·Granted Mar 21, 2000·4 cites·4 claims
- 2132US6426177B2Single component developer for use with ghost exposureIBM·Filed 2000·Granted Jul 30, 2002·0 cites·6 claims
- 2232US6287434B1Plating cell apparatus for x-ray mask fabricationIBM·Filed 1999·Granted Sep 11, 2001·3 cites·8 claims
- 2331US5409852AMethod of Manufacturing three dimensional integrated device and circuit structuresIBM·Filed 1993·Granted Apr 25, 1995·2 cites·21 claims
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