Inventor · disambiguated record
De-Ling Zhou
Also filed as: ZHOU DE-LING
5 granted patents·7 pending applications·126 citations·filing 2002–2013
81Inventor score
Top patents by PatentIndex Score
12 records- 0192US6916772B2Sulfoxide pyrolid(in)one alkanolamine cleaner compositionEKC TECHNOLOGY INC·Filed 2002·Granted Jul 12, 2005·58 cites·37 claims
- 0280US7135445B2Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materialsEKC TECHNOLOGY INC·Filed 2003·Granted Nov 14, 2006·27 cites·27 claims
- 0379US7144848B2Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removalEKC TECHNOLOGY INC·Filed 2003·Granted Dec 5, 2006·34 cites·20 claims
- 0458US7915181B2Repair and restoration of damaged dielectric materials and filmsHONEYWELL INT INC·Filed 2004·Granted Mar 29, 2011·7 cites·26 claims
- 0551US8518170B2Boron-comprising inks for forming boron-doped regions in semiconductor substrates using non-contact printing processes and methods for fabricating such boron-comprising inksLEUNG ROGER YU-KWAN·Filed 2008·Granted Aug 27, 2013·0 cites·17 claims
- 0649US2013240794A1Boron-comprising inks for forming boron-doped regions in semiconductor substrates using non-contact printing processes and methods for fabricating such boron-comprising inksHONEYWELL INT INC·Filed 2013·Application pending·0 cites
- 0746US2009239363A1Methods for forming doped regions in semiconductor substrates using non-contact printing processes and dopant-comprising inks for forming such doped regions using non-contact printing processesHONEYWELL INT INC·Filed 2008·Application pending·0 cites
- 0845US2009026924A1Methods of making low-refractive index and/or low-k organosilicate coatingsLEUNG ROGER Y·Filed 2007·Application pending·0 cites
- 0945US2010035422A1Methods for forming doped regions in a semiconductor materialHONEYWELL INT INC·Filed 2008·Application pending·0 cites
- 1035US2008291634A1Thermal interconnect and interface materials, methods of production and uses thereofWEISER MARTIN W·Filed 2008·Application pending·0 cites
- 1135US2004084774A1Gas layer formation materialsFiled 2002·Application pending·0 cites
- 1234US2005173803A1Interlayer adhesion promoter for low k materialsFiled 2002·Application pending·0 cites
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