Inventor · disambiguated record
Mariko Takayanagi
Also filed as: TAKAYANAGI MARIKO
18 granted patents·2 pending applications·158 citations·filing 2001–2017
94Inventor score
Files withTOSHIBA KK14KOBURGER III CHARLES W2FUKUZAWA HIDEAKI1NAT INST FOR MATERIALS SCIENCE1TAKAYANAGI MARIKO1
Top patents by PatentIndex Score
20 records- 0196US8958574B2Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphoneFUKUZAWA HIDEAKI·Filed 2012·Granted Feb 17, 2015·16 cites·34 claims
- 0292US8134209B2Semiconductor device and method for manufacturing the sameYAGISHITA ATSUSHI·Filed 2009·Granted Mar 13, 2012·26 cites·20 claims
- 0387US6600212B2Semiconductor device and method of fabricating the sameTOSHIBA KK·Filed 2002·Granted Jul 29, 2003·40 cites·5 claims
- 0477US6746943B2Semiconductor device and method of fabricating the sameTOSHIBA KK·Filed 2003·Granted Jun 8, 2004·21 cites·19 claims
- 0575US6545317B2Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereofTOSHIBA KK·Filed 2001·Granted Apr 8, 2003·17 cites·8 claims
- 0673US7944004B2Multiple thickness and/or composition high-K gate dielectrics and methods of making thereofTOSHIBA KK·Filed 2009·Granted May 17, 2011·5 cites·21 claims
- 0773US7396748B2Semiconductor device includes gate insulating film having a high dielectric constantTOSHIBA KK·Filed 2005·Granted Jul 8, 2008·3 cites·4 claims
- 0868US8846486B2Deep well structures with single depth shallow trench isolation regionsKOBURGER III CHARLES W·Filed 2012·Granted Sep 30, 2014·2 cites·6 claims
- 0966US7696585B2Semiconductor device and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2007·Granted Apr 13, 2010·3 cites·6 claims
- 1064US10246324B2Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphoneTOSHIBA KK·Filed 2017·Granted Apr 2, 2019·0 cites·7 claims
- 1164US9790087B2Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphoneTOSHIBA KK·Filed 2014·Granted Oct 17, 2017·1 cites·16 claims
- 1262US7910970B2Programmable element and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2008·Granted Mar 22, 2011·2 cites·16 claims
- 1360US8198700B2Deep well structures with single depth shallow trench isolation regionsKOBURGER III CHARLES W·Filed 2010·Granted Jun 12, 2012·1 cites·3 claims
- 1459US6664577B2Semiconductor device includes gate insulating film having a high dielectric constantTOSHIBA KK·Filed 2002·Granted Dec 16, 2003·5 cites·15 claims
- 1558US6675368B2Apparatus for and method of preparing pattern data of electronic partTOSHIBA KK·Filed 2001·Granted Jan 6, 2004·7 cites·20 claims
- 1655US2011251281A1Composite Material Comprising High-Molecular-Weight Matrix and Low-Molecular-Weight Organic Compound and Process For Producing SameNAT INST FOR MATERIALS SCIENCE·Filed 2009·Application pending·0 cites
- 1754US6949425B2Semiconductor device includes gate insulating film having a high dielectric constantTOSHIBA KK·Filed 2003·Granted Sep 27, 2005·3 cites·5 claims
- 1852US7816215B2Semiconductor device manufacturing methodTOSHIBA KK·Filed 2004·Granted Oct 19, 2010·3 cites·21 claims
- 1948US6927459B2Semiconductor device having a gate electrode with a sidewall insulating film and manufacturing method thereofTOSHIBA KK·Filed 2003·Granted Aug 9, 2005·3 cites·20 claims
- 2040US2007158705A1Semiconductor deviceTAKAYANAGI MARIKO·Filed 2007·Application pending·0 cites
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