Inventor · disambiguated record
Hitoshi Yokoi
Also filed as: YOKOI HITOSHI
24 granted patents·5 pending applications·222 citations·filing 1988–2013
96Inventor score
Top patents by PatentIndex Score
29 records- 0192US8652240B2Fine particle sensor and mounting structure thereforSUGIYAMA TAKESHI·Filed 2012·Granted Feb 18, 2014·13 cites·5 claims
- 0288US9476807B2Microparticle sensorNGK SPARK PLUG CO·Filed 2013·Granted Oct 25, 2016·8 cites·6 claims
- 0384US9581069B2Microparticle detection systemNGK SPARK PLUG CO·Filed 2013·Granted Feb 28, 2017·6 cites·9 claims
- 0484US7339455B2Platinum resistor temperature sensorNGK SPARK PLUG CO·Filed 2005·Granted Mar 4, 2008·10 cites·19 claims
- 0575US6627964B2Gas sensorNGK SPARK PLUG CO·Filed 2001·Granted Sep 30, 2003·14 cites·8 claims
- 0674US9395273B2Microparticle detection systemNGK SPARK PLUG CO·Filed 2012·Granted Jul 19, 2016·2 cites·5 claims
- 0774US8702305B2Temperature sensorYOKOI HITOSHI·Filed 2009·Granted Apr 22, 2014·10 cites·6 claims
- 0872US8823384B2Fine particle detection systemMATSUOKA TOSHIYA·Filed 2012·Granted Sep 2, 2014·3 cites·8 claims
- 0972US6770508B2Electrode for silicon carbide semiconductor, silicon carbide semiconductor element comprising the electrode, and production method thereforNGK SPARK PLUG CO·Filed 2003·Granted Aug 3, 2004·16 cites·6 claims
- 1071US6117806ADielectric material, a method for producing the same and a dielectric resonator device comprising sameNGK SPARK PLUG CO·Filed 1997·Granted Sep 12, 2000·25 cites·51 claims
- 1166US9206757B2Particulate detection systemMATUOKA TOSHIYA·Filed 2012·Granted Dec 8, 2015·3 cites·7 claims
- 1261US7341694B2Ammonia sensorNGK SPARK PLUG CO·Filed 2003·Granted Mar 11, 2008·4 cites·27 claims
- 1357US5898015AMaterial for absorbing nitrogen oxides comprising hollandite-type complex oxideNGK SPARK PLUG CO·Filed 1996·Granted Apr 27, 1999·21 cites·7 claims
- 1454US8177427B2Temperature sensor and method of producing the sameYOKOI HITOSHI·Filed 2008·Granted May 15, 2012·4 cites·7 claims
- 1553US4956317AWhisker-reinforced ceramicsNGK SPARK PLUG CO·Filed 1988·Granted Sep 11, 1990·11 cites·57 claims
- 1650US6380117B2Dielectric material and process for producing the sameNGK SPARK PLUG CO·Filed 1999·Granted Apr 30, 2002·8 cites·17 claims
- 1750US6221799B1Dielectric ceramic materialNGK SPARK PLUG CO·Filed 1999·Granted Apr 24, 2001·10 cites·22 claims
- 1849US2009014331A1Ammonia gas sensorNGK SPARK PLUG CO·Filed 2008·Application pending·0 cites
- 1947US6319871B1Dielectric materialNGK SPARK PLUG CO·Filed 1999·Granted Nov 20, 2001·9 cites·7 claims
- 2046US5955046ACatalytic material for removing nitrogen oxides apparatus for treating nitrogen oxides using the material, and method of removing nitrogen oxidesNGK SPARK PLUG CO·Filed 1997·Granted Sep 21, 1999·13 cites·10 claims
- 2144US2008178657A1Soot detecting apparatus and soot detecting methodKOMATSU DAISUKE·Filed 2008·Application pending·0 cites
- 2244US2007261471A1Soot sensorKONDO TOMONORI·Filed 2007·Application pending·0 cites
- 2343US6121174ADielectric material with low temperature coefficient and high qualityNGK SPARK PLUG CO·Filed 1997·Granted Sep 19, 2000·9 cites·26 claims
- 2443US6001319AMethod of removing nitrogen oxides using material for absorbing nitrogen oxidesNGK SPARK PLUG CO·Filed 1997·Granted Dec 14, 1999·11 cites·12 claims
- 2541US7408437B2Resistance element, its precursor, and resistance value adjusting methodNGK SPARK PLUG CO·Filed 2005·Granted Aug 5, 2008·0 cites·3 claims
- 2639US6165927ADielectric material and process for producing the sameNGK SPARK PLUG CO·Filed 1998·Granted Dec 26, 2000·8 cites·15 claims
- 2737US2008011052A1Soot sensorKONDO TOMONORI·Filed 2007·Application pending·0 cites
- 2836US5128285ASilicon oxynitride sintered bodyNGK SPARK PLUG CO·Filed 1989·Granted Jul 7, 1992·4 cites·18 claims
- 2935US2002145145A1Electrode for silicon carbide semiconductor, silicon carbide semiconductor element comprising the electrode, and production method thereforNGK SPARK PLUG CO·Filed 2002·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →