Inventor · disambiguated record
Kiichi Sakamoto
Also filed as: SAKAMOTO KIICHI
50 granted patents·1,323 citations·filing 1988–2000
99Inventor score
Top patents by PatentIndex Score
50 records- 0197US5260579ACharged particle beam exposure system and charged particle beam exposure methodFUJITSU LTD·Filed 1992·Granted Nov 9, 1993·167 cites·33 claims
- 0293US6222195B1Charged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 2000·Granted Apr 24, 2001·49 cites·22 claims
- 0392US5144142ABlanking aperture array, method for producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure methodFUJITSU LTD·Filed 1990·Granted Sep 1, 1992·78 cites·27 claims
- 0491US5262341ABlanking aperture array and charged particle beam exposure methodFUJITSU LTD·Filed 1992·Granted Nov 16, 1993·66 cites·5 claims
- 0589US5173582ACharged particle beam lithography system and methodFUJITSU LTD·Filed 1990·Granted Dec 22, 1992·63 cites·6 claims
- 0689US5051556ACharged particle beam lithography system and a method thereofFUJITSU LTD·Filed 1989·Granted Sep 24, 1991·43 cites·19 claims
- 0785US5401974ACharged particle beam exposure apparatus and method of cleaning the sameFUJITSU LTD·Filed 1994·Granted Mar 28, 1995·47 cites·25 claims
- 0885US5036209AFabrication method for semiconductor devices and transparent mask for charged particle beamFUJITSU LTD·Filed 1989·Granted Jul 30, 1991·39 cites·7 claims
- 0985US4980567ACharged particle beam exposure system using line beamsFUJITSU LTD·Filed 1989·Granted Dec 25, 1990·34 cites·12 claims
- 1084US6242751B1Charged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1999·Granted Jun 5, 2001·33 cites·62 claims
- 1183US5719402AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 17, 1998·32 cites·11 claims
- 1281US5364718AMethod of exposing patttern of semiconductor devices and stencil mask for carrying out sameFUJITSU LTD·Filed 1993·Granted Nov 15, 1994·37 cites·8 claims
- 1379US5757015ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1996·Granted May 26, 1998·25 cites·22 claims
- 1478US5391886ACharged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure systemFUJITSU LTD·Filed 1993·Granted Feb 21, 1995·36 cites·18 claims
- 1577US4954717APhotoelectron mask and photo cathode image projection method using the sameFUJITSU LTD·Filed 1988·Granted Sep 4, 1990·21 cites·15 claims
- 1676US5546319AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1995·Granted Aug 13, 1996·21 cites·34 claims
- 1775US6090527AElectron beam exposure mask and method of manufacturing the same and electron beam exposure methodFUJITSU LTD·Filed 1998·Granted Jul 18, 2000·25 cites·9 claims
- 1875US5969365ACharged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1997·Granted Oct 19, 1999·20 cites·18 claims
- 1975US5830612AMethod of detecting a deficiency in a charged-particle-beam exposure maskFUJITSU LTD·Filed 1996·Granted Nov 3, 1998·28 cites·11 claims
- 2075US5288567AStencil mask and charged particle beam exposure method and apparatus using the stencil maskFUJITSU LTD·Filed 1991·Granted Feb 22, 1994·24 cites·22 claims
- 2174US5849437AElectron beam exposure mask and method of manufacturing the same and electron beam exposure methodFUJITSU LTD·Filed 1996·Granted Dec 15, 1998·24 cites·19 claims
- 2274US5422491AMask and charged particle beam exposure method using the maskFUJITSU LTD·Filed 1994·Granted Jun 6, 1995·26 cites·25 claims
- 2373US6137111ACharged particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1998·Granted Oct 24, 2000·26 cites·41 claims
- 2473US5276331AElectron beam exposure systemFUJITSU LTD·Filed 1992·Granted Jan 4, 1994·24 cites·9 claims
- 2573US5023462APhoto-cathode image projection apparatus for patterning a semiconductor deviceFUJITSU LTD·Filed 1989·Granted Jun 11, 1991·19 cites·25 claims
- 2669US5721432AMethod of and system for charged particle beam exposureFUJITSU LTD·Filed 1996·Granted Feb 24, 1998·16 cites·5 claims
- 2768US5256881AMask and charged particle beam exposure method using the maskFUJITSU LTD·Filed 1992·Granted Oct 26, 1993·20 cites·22 claims
- 2867US5347592APattern judging method and mask producing method using the pattern judging methodFUJITSU LTD·Filed 1992·Granted Sep 13, 1994·19 cites·15 claims
- 2967US5234781AMask for lithographic patterning and a method of manufacturing the sameFUJITSU LTD·Filed 1992·Granted Aug 10, 1993·20 cites·8 claims
- 3067US5148033AElectron beam exposure device and exposure method using the sameFUJITSU LTD·Filed 1991·Granted Sep 15, 1992·19 cites·25 claims
- 3166US5376802AStencil mask and charge particle beam exposure method and apparatus using the stencil maskFUJITSU LTD·Filed 1993·Granted Dec 27, 1994·17 cites·5 claims
- 3265US5965895AMethod of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposureFUJITSU LTD·Filed 1997·Granted Oct 12, 1999·13 cites·9 claims
- 3365US5393988AMask and charged particle beam exposure method using the maskFUJITSU LTD·Filed 1994·Granted Feb 28, 1995·19 cites·23 claims
- 3462US5537487APattern judging method, mask producing method, and method of dividing block pattern for use in block exposureFUJITSU LTD·Filed 1994·Granted Jul 16, 1996·16 cites·18 claims
- 3557US5349197AMethod for exposing a pattern on an object by a charged particle beamFUJITSU LTD·Filed 1992·Granted Sep 20, 1994·13 cites·16 claims
- 3656US5590048ABlock exposure pattern data extracting system and method for charged particle beam exposureFUJITSU LTD·Filed 1993·Granted Dec 31, 1996·12 cites·42 claims
- 3755US5952155AMask and method of creating mask as well as electron-beam exposure method and electron-beam exposure deviceFUJITSU LTD·Filed 1998·Granted Sep 14, 1999·10 cites·37 claims
- 3855US5225684ACharged particle beam exposure apparatus control system and a method of operation for providing a drawing start signalFUJITSU LTD·Filed 1992·Granted Jul 6, 1993·12 cites·9 claims
- 3954US5118952APatterned photo cathode and its fabrication method for electron image projectionFUJITSU LTD·Filed 1990·Granted Jun 2, 1992·12 cites·9 claims
- 4053US5180919AElectron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beamFUJITSU LTD·Filed 1991·Granted Jan 19, 1993·10 cites·9 claims
- 4152US5432314ATransparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plateFUJITSU LTD·Filed 1993·Granted Jul 11, 1995·10 cites·20 claims
- 4251US5175435AElectron beam exposure system with increased efficiency of exposure operationFUJITSU LTD·Filed 1991·Granted Dec 29, 1992·14 cites·11 claims
- 4349US5117117AElectron beam exposure system having an improved seal element for interfacing electric connectionsFUJITSU LTD·Filed 1991·Granted May 26, 1992·9 cites·10 claims
- 4448US5194741AMethod for writing a pattern on an object by a focused electron beam with an improved efficiencyFUJITSU LTD·Filed 1992·Granted Mar 16, 1993·9 cites·8 claims
- 4548US5130547ACharged-particle beam exposure method and apparatusFUJITSU LTD·Filed 1990·Granted Jul 14, 1992·8 cites·14 claims
- 4647US6087048AMethod of producing block mask for electron-beam lithography apparatusesADVANTEST CORP·Filed 1999·Granted Jul 11, 2000·11 cites·4 claims
- 4747US5223719AMask for use in a charged particle beam apparatus including beam passing sectionsFUJITSU LTD·Filed 1991·Granted Jun 29, 1993·7 cites·16 claims
- 4846US5824437AMask and method of creating mask as well as electron-beam exposure method and electron-beam exposure deviceFUJITSU LTD·Filed 1996·Granted Oct 20, 1998·6 cites·30 claims
- 4945US5276334ACharged particle beam exposure method and apparatusFUJITSU LTD·Filed 1992·Granted Jan 4, 1994·7 cites·14 claims
- 5035US5029222APhotoelectron image projection apparatusFUJITSU LTD·Filed 1988·Granted Jul 2, 1991·7 cites·8 claims
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