Inventor · disambiguated record
Yoshitada Oshida
Also filed as: OSHIDA YOSHITADA
54 granted patents·5 pending applications·1,472 citations·filing 1976–2008
99Inventor score
Files withHITACHI LTD44HITACHI VIA MECHANICS LTD6RENESAS TECH CORP4OSHIDA YOSHITADA2HITACHI DISPLAYS LTD1
Top patents by PatentIndex Score
59 records- 0197US4085423AInformation reproducing apparatus with plural beam readoutHITACHI LTD·Filed 1976·Granted Apr 18, 1978·74 cites·14 claims
- 0295US7217573B1Method of inspecting a DNA chipHITACHI LTD·Filed 2000·Granted May 15, 2007·66 cites·37 claims
- 0395US5677755AMethod and apparatus for pattern exposure, mask used therefor, and semiconductor integrated circuit produced by using themHITACHI LTD·Filed 1994·Granted Oct 14, 1997·147 cites·39 claims
- 0494US7969636B2Laser direct imaging apparatusHITACHI VIA MECHANICS LTD·Filed 2008·Granted Jun 28, 2011·24 cites·2 claims
- 0594US5016149AIlluminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the sameHITACHI LTD·Filed 1989·Granted May 14, 1991·92 cites·23 claims
- 0694US4668089AExposure apparatus and method of aligning exposure mask with workpieceHITACHI LTD·Filed 1984·Granted May 26, 1987·85 cites·22 claims
- 0793US4343553AShape testing apparatusHITACHI LTD·Filed 1980·Granted Aug 10, 1982·57 cites·6 claims
- 0892US5329333AExposure apparatus and methodHITACHI LTD·Filed 1992·Granted Jul 12, 1994·45 cites·48 claims
- 0989US6485891B1Exposure apparatus and methodHITACHI LTD·Filed 2000·Granted Nov 26, 2002·21 cites·23 claims
- 1089US4819033AIllumination apparatus for exposureHITACHI LTD·Filed 1987·Granted Apr 4, 1989·55 cites·8 claims
- 1188US5684565APattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure systemHITACHI LTD·Filed 1994·Granted Nov 4, 1997·57 cites·33 claims
- 1288US5302999AIllumination method, illumination apparatus and projection exposure apparatusHITACHI LTD·Filed 1993·Granted Apr 12, 1994·91 cites·32 claims
- 1387US7400753B2Biological sample optical measuring method and biological sample optical measuring apparatusHITACHI LTD·Filed 2001·Granted Jul 15, 2008·30 cites·14 claims
- 1486US4676637AExposure apparatus with foreign particle detectorHITACHI LTD·Filed 1985·Granted Jun 30, 1987·44 cites·9 claims
- 1585US7277155B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2005·Granted Oct 2, 2007·4 cites·11 claims
- 1685US6760105B2Method and apparatus for inspecting DNA and method for detecting fluorescenceHITACHI LTD·Filed 2002·Granted Jul 6, 2004·26 cites·17 claims
- 1785US5209813ALithographic apparatus and methodHITACHI LTD·Filed 1991·Granted May 11, 1993·53 cites·55 claims
- 1883US5008702AExposure method and apparatusHITACHI LTD·Filed 1989·Granted Apr 16, 1991·33 cites·46 claims
- 1981US4473750AThree-dimensional shape measuring deviceHITACHI LTD·Filed 1981·Granted Sep 25, 1984·36 cites·17 claims
- 2080US8361784B2Method of inspecting a DNA chip and apparatus thereofHITACHI LTD·Filed 2007·Granted Jan 29, 2013·9 cites·4 claims
- 2180US5227862AProjection exposure apparatus and projection exposure methodHITACHI LTD·Filed 1990·Granted Jul 13, 1993·47 cites·63 claims
- 2278US4922290ASemiconductor exposing system having apparatus for correcting change in wavelength of light sourceHITACHI LTD·Filed 1988·Granted May 1, 1990·27 cites·7 claims
- 2377US4553844AConfiguration detecting method and systemHITACHI LTD·Filed 1982·Granted Nov 19, 1985·26 cites·11 claims
- 2476US7309568B2Method in inspecting DNA and apparatus thereforHITACHI LTD·Filed 2002·Granted Dec 18, 2007·13 cites·18 claims
- 2576US6016187AExposure apparatus and methodHITACHI LTD·Filed 1998·Granted Jan 18, 2000·20 cites·17 claims
- 2676US5767949AExposure apparatus and methodHITACHI LTD·Filed 1996·Granted Jun 16, 1998·20 cites·12 claims
- 2775US4125859AVideodisc play-back apparatus with variable width beamHITACHI LTD·Filed 1976·Granted Nov 14, 1978·16 cites·24 claims
- 2872US4564296APlate thickness measuring method and apparatusHITACHI LTD·Filed 1981·Granted Jan 14, 1986·24 cites·14 claims
- 2971US7372478B2Pattern exposure method and pattern exposure apparatusHITACHI VIA MECHANICS LTD·Filed 2005·Granted May 13, 2008·6 cites·13 claims
- 3071US6094268AProjection exposure apparatus and projection exposure methodHITACHI LTD·Filed 1994·Granted Jul 25, 2000·24 cites·23 claims
- 3171US4862008AMethod and apparatus for optical alignment of semiconductor by using a hologramHITACHI LTD·Filed 1988·Granted Aug 29, 1989·21 cites·40 claims
- 3270US6335146B1Exposure apparatus and methodHITACHI LTD·Filed 2000·Granted Jan 1, 2002·5 cites·16 claims
- 3369US5526094AExposure apparatus and methodHITACHI LTD·Filed 1994·Granted Jun 11, 1996·11 cites·31 claims
- 3466US4458302AReflection type optical focusing apparatusHITACHI LTD·Filed 1982·Granted Jul 3, 1984·19 cites·14 claims
- 3565US4725737AAlignment method and apparatus for reduction projection type alignerHITACHI LTD·Filed 1985·Granted Feb 16, 1988·17 cites·15 claims
- 3664US7064813B2Apparatus and method for measuring micro area in specimenHITACHI HIGH TECH CORP·Filed 2002·Granted Jun 20, 2006·4 cites·20 claims
- 3763US5247329AProjection type exposure method and apparatusHITACHI LTD·Filed 1991·Granted Sep 21, 1993·19 cites·9 claims
- 3858US7012671B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2002·Granted Mar 14, 2006·2 cites·18 claims
- 3958US4993837AMethod and apparatus for pattern detectionHITACHI LTD·Filed 1989·Granted Feb 19, 1991·12 cites·35 claims
- 4057US4795261AReduction projection type alignerHITACHI LTD·Filed 1986·Granted Jan 3, 1989·12 cites·8 claims
- 4157US4701050ASemiconductor exposure apparatus and alignment method thereforHITACHI LTD·Filed 1985·Granted Oct 20, 1987·12 cites·12 claims
- 4255US7604925B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2005·Granted Oct 20, 2009·0 cites·10 claims
- 4354US7598020B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2005·Granted Oct 6, 2009·0 cites·10 claims
- 4452US4777374APattern position detecting method and apparatus for detecting the position of an alignment direction of a wafer target patternHITACHI LTD·Filed 1986·Granted Oct 11, 1988·10 cites·10 claims
- 4550US5414239AOptical apparatus for laser machiningHITACHI LTD·Filed 1993·Granted May 9, 1995·12 cites·23 claims
- 4650US5392115AMethod of detecting inclination of a specimen and a projection exposure device as well as method of detecting period of periodically varying signalHITACHI LTD·Filed 1992·Granted Feb 21, 1995·10 cites·9 claims
- 4749US2005130325A1Fluorescent beads detecting method and fluorescent beads detecting apparatusHITACHI SOFTWARE ENG·Filed 2004·Application pending·0 cites
- 4849US2008213705A1Pattern exposure method and pattern exposure apparatusHITACHI VIA MECHANICS LTD·Filed 2008·Application pending·0 cites
- 4948US6455944B1Alignment of an optical assemblyHITACHI LTD·Filed 1995·Granted Sep 24, 2002·13 cites·13 claims
- 5048US4744666AAlignment detection optical system of projection type alignerHITACHI LTD·Filed 1986·Granted May 17, 1988·8 cites·5 claims
Showing the top 50 of 59 patent records by PatentIndex Score.
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