Inventor · disambiguated record
Moon-Gyu Jeong
Also filed as: JEONG MOON-GYU
12 granted patents·34 citations·filing 2011–2019
87Inventor score
Top patents by PatentIndex Score
12 records- 0190US10386713B2Method of providing initial bias value for optical proximity correction, and mask fabricating method with optical proximity correction based on the initial bias valueSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Aug 20, 2019·5 cites·20 claims
- 0285US8677288B2Test pattern selection method for OPC model calibrationVENGERTSEV DMITRY·Filed 2012·Granted Mar 18, 2014·8 cites·18 claims
- 0383US9129352B2Optical proximity correction modeling method and systemSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Sep 8, 2015·4 cites·20 claims
- 0481US8392854B2Method of manufacturing semiconductor device by using uniform optical proximity correctionKIM SANG-WOOK·Filed 2011·Granted Mar 5, 2013·8 cites·20 claims
- 0575US10222690B2Method of optimizing a mask using pixel-based learning and method for manufacturing a semiconductor device using an optimized maskSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Mar 5, 2019·2 cites·20 claims
- 0673US10255397B2Methods of rasterizing mask layout and methods of fabricating photomask using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 9, 2019·2 cites·20 claims
- 0769US10527929B2Methods of improving optical proximity correction models and methods of fabricating semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jan 7, 2020·1 cites·20 claims
- 0866US8510684B2Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effectJEONG MOON-GYU·Filed 2011·Granted Aug 13, 2013·2 cites·18 claims
- 0960US8694927B2Method of designing pattern layoutsSAMSUNG ELECTRONICS CO LTD·Filed 2012·Granted Apr 8, 2014·1 cites·19 claims
- 1057US9952499B2Method of fabricating a mask using common bias values in optical proximity correctionSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Apr 24, 2018·1 cites·20 claims
- 1143US12111567B2Method for performing optical proximity correction and method of manufacturing a mask using optical proximity correctionSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Oct 8, 2024·0 cites·8 claims
- 1240US9311439B2Methods of patterning wafers using self-aligned double patterning processesJEONG MOON-GYU·Filed 2014·Granted Apr 12, 2016·0 cites·12 claims
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