Inventor · disambiguated record
Ryuji Sotoaka
Also filed as: SOTOAKA RYUJI
8 granted patents·6 pending applications·401 citations·filing 1997–2010
88Inventor score
Files withMITSUBISHI GAS CHEMICAL CO6TOKYO ELECTRON LTD2YAGUCHI KAZUYOSHI2FUJIOTO YOSHIKO1GOTO HIDETO1
Top patents by PatentIndex Score
14 records- 0194US5972862ACleaning liquid for semiconductor devicesMITSUBISHI GAS CHEMICAL CO·Filed 1997·Granted Oct 26, 1999·234 cites·33 claims
- 0287US6514352B2Cleaning method using an oxidizing agent, chelating agent and fluorine compoundTOKYO ELECTRON LTD·Filed 2001·Granted Feb 4, 2003·43 cites·18 claims
- 0386US6843981B1Tooth bleaching compositions and methods of bleaching discolored toothMITSUBISHI GAS CHEMICAL CO·Filed 2000·Granted Jan 18, 2005·37 cites·19 claims
- 0480US6265309B1Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the sameMITSUBISHI GAS CHEMICALS CO IN·Filed 1999·Granted Jul 24, 2001·78 cites·24 claims
- 0559US8883652B2Silicon etching liquid and etching methodYAGUCHI KAZUYOSHI·Filed 2008·Granted Nov 11, 2014·2 cites·9 claims
- 0657US6875288B2Cleaning agent and cleaning methodTOKYO ELECTRON LTD·Filed 2001·Granted Apr 5, 2005·6 cites·18 claims
- 0755US8562855B2Silicon etching liquid and etching methodYAGUCHI KAZUYOSHI·Filed 2009·Granted Oct 22, 2013·1 cites·18 claims
- 0848US2011146726A1Process for cleaning semiconductor elementMITSUBISHI GAS CHEMICAL CO·Filed 2009·Application pending·0 cites
- 0946US7892404B2Method for oxidizing substance and oxidation apparatus thereforMITSUBISHI GAS CHEMICAL CO·Filed 2005·Granted Feb 22, 2011·0 cites·20 claims
- 1043US2011171834A1Silicon etchant and etching methodMITSUBISHI GAS CHEMICAL CO·Filed 2009·Application pending·0 cites
- 1141US2009114619A1Wet etching method and wet etching apparatusMITSUBISHI GAS CHEMICAL CO·Filed 2006·Application pending·0 cites
- 1240US2008047577A1Substrate Cleaning Device and Cleaning Method ThereofGOTO HIDETO·Filed 2007·Application pending·0 cites
- 1323US2012190210A1Silicon etching solution and etching methodFUJIOTO YOSHIKO·Filed 2010·Application pending·0 cites
- 1423US2012225563A1Etching liquid for etching silicon substrate rear surface in through silicon via process and method for manufacturing semiconductor chip having through silicon via using the etching liquidSOTOAKA RYUJI·Filed 2010·Application pending·0 cites
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