Inventor · disambiguated record
Ryan L. Burns
Also filed as: BURNS RYAN · BURNS RYAN L
10 granted patents·3 pending applications·81 citations·filing 2001–2023
84Inventor score
Top patents by PatentIndex Score
13 records- 0191US7160356B2Dithiolene functionalized polymer membrane for olefin/paraffin separationUNIV TEXAS·Filed 2004·Granted Jan 9, 2007·61 cites·41 claims
- 0276US10622267B2Facilitation of spin-coat planarization over feature topography during substrate fabricationTOKYO ELECTRON LTD·Filed 2017·Granted Apr 14, 2020·2 cites·19 claims
- 0375US11455436B2Predicting across wafer spin-on planarization over a patterned topographyTOKYO ELECTRON LTD·Filed 2020·Granted Sep 27, 2022·1 cites·21 claims
- 0471US8084185B2Substrate planarization with imprint materials and processesBURNS SEAN D·Filed 2009·Granted Dec 27, 2011·3 cites·26 claims
- 0566US6602415B2Polymeric membrane for separation of fluids under elevated temperature and/or pressure conditionsUNIV TEXAS·Filed 2001·Granted Aug 5, 2003·13 cites·42 claims
- 0658US11262657B2System and method of planarization control using a cross-linkable materialTOKYO ELECTRON LTD·Filed 2019·Granted Mar 1, 2022·0 cites·37 claims
- 0758US8302034B2Performing optical proximity correction by incorporating critical dimension correctionBURNS RYAN L·Filed 2010·Granted Oct 30, 2012·1 cites·17 claims
- 0857US2025102738A1Surface relief grating performance and cost enhancements for augmented reality applicationsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0955US2025105066A1Systems and methods that use infrared (ir) spectroscopy to monitor process chemicals utilized in a semiconductor processTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1052US2023259030A1Providing a barrier layer for photoresist processingTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1147US11456185B2Planarization of semiconductor devicesTOKYO ELECTRON LTD·Filed 2020·Granted Sep 27, 2022·0 cites·21 claims
- 1242US11905043B2Methods and systems for trajectories, approaches, flybys, landings, and orbits in three-or-more body systemsCALIFORNIA INST OF TECHN·Filed 2021·Granted Feb 20, 2024·0 cites·20 claims
- 1334US8796134B2Methods of forming integrated circuit devices using modified rectangular mask patterns to increase reliability of contacts to electrically conductive linesKIM CHANG-HWA·Filed 2012·Granted Aug 5, 2014·0 cites·20 claims
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