Inventor · disambiguated record
Marinus Jan Remie
Also filed as: REMIE MARINUS JAN
11 granted patents·2 pending applications·8 citations·filing 2010–2025
84Inventor score
Technology areasG03F
Top patents by PatentIndex Score
13 records- 0186US12204255B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2023·Granted Jan 21, 2025·0 cites·20 claims
- 0283US11281115B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2020·Granted Mar 22, 2022·1 cites·20 claims
- 0383US10222713B2Patterning device cooling apparatusASML NETHERLANDS BV·Filed 2016·Granted Mar 5, 2019·2 cites·20 claims
- 0481US9632435B2Lithographic apparatus and methodTEN KATE NICOLAAS·Filed 2011·Granted Apr 25, 2017·2 cites·26 claims
- 0580US11630399B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2022·Granted Apr 18, 2023·0 cites·20 claims
- 0678US10520837B2Lithographic apparatus, support table for a lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Dec 31, 2019·1 cites·20 claims
- 0778US2025138440A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0873US10551752B2Lithographic apparatus and methodTEN KATE NICOLAAS·Filed 2011·Granted Feb 4, 2020·1 cites·33 claims
- 0968US11300890B2Lithographic apparatus, support table for a lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Apr 12, 2022·0 cites·20 claims
- 1068US9897928B2Lithographic apparatus, support table for a lithographic apparatus and device manufacturing methodKUNNEN JOHAN GERTRUDIS CORNELIS·Filed 2012·Granted Feb 20, 2018·1 cites·20 claims
- 1161US10990025B2Patterning device cooling apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 27, 2021·0 cites·21 claims
- 1243US10031428B2Gas flow optimization in reticle stage environmentASML NETHERLANDS BV·Filed 2014·Granted Jul 24, 2018·0 cites·38 claims
- 1337US2010302518A1Lithographic apparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →