Inventor · disambiguated record
Rachel E. Batzer
Also filed as: BATZER RACHEL · BATZER RACHEL E · BATZER RACHEL ELIZABETH
13 granted patents·15 pending applications·60 citations·filing 2012–2024
90Inventor score
Top patents by PatentIndex Score
28 records- 0197US11608559B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2021·Granted Mar 21, 2023·6 cites·20 claims
- 0296US11920239B2Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasmaLAM RES CORP·Filed 2022·Granted Mar 5, 2024·3 cites·15 claims
- 0396US9828672B2Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasmaLAM RES CORP·Filed 2015·Granted Nov 28, 2017·25 cites·19 claims
- 0494US12116669B2Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2021·Granted Oct 15, 2024·3 cites·18 claims
- 0594US11101164B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2020·Granted Aug 24, 2021·3 cites·24 claims
- 0693US12000047B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2023·Granted Jun 4, 2024·1 cites·20 claims
- 0793US10604841B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2016·Granted Mar 31, 2020·7 cites·24 claims
- 0890US11015247B2Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2018·Granted May 25, 2021·6 cites·14 claims
- 0987US12331402B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2024·Granted Jun 17, 2025·0 cites·20 claims
- 1081US2024218509A1Minimizing radical recombination using ald silicon oxide surface coating with intermittent restoration plasmaLAM RES CORP·Filed 2024·Application pending·0 cites
- 1181US2025003074A1Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2024·Application pending·0 cites
- 1270US11702748B2Wafer level uniformity control in remote plasma film depositionLAM RES CORP·Filed 2017·Granted Jul 18, 2023·1 cites·8 claims
- 1369US2023304156A1Wafer level uniformity control in remote plasma film depositionLAM RES CORP·Filed 2023·Application pending·0 cites
- 1466USD948658SHigh density hole pattern dual plenum hole showerhead assemblyLAM RES CORP·Filed 2020·Granted Apr 12, 2022·5 cites·1 claims
- 1557US2018044791A1Minimizing radical recombination using ald silicon oxide surface coating with intermittent restoration plasmaLAM RES CORP·Filed 2017·Application pending·0 cites
- 1656US2023332291A1Remote plasma architecture for true radical processingLAM RES CORP·Filed 2021·Application pending·0 cites
- 1755US2023374661A1Showerhead with integral divert flow pathLAM RES CORP·Filed 2021·Application pending·0 cites
- 1855US2022228263A1Independently adjustable flowpath conductance in multi-station semiconductor processingLAM RES CORP·Filed 2020·Application pending·0 cites
- 1954US2014235069A1Multi-plenum showerhead with temperature controlNOVELLUS SYSTEMS INC·Filed 2013·Application pending·0 cites
- 2053US2025132127A1Transformer coupled plasma source design for thin dielectric film depositionLAM RES CORP·Filed 2022·Application pending·0 cites
- 2152US2024412953A1Apparatuses and systems for ammonia/chlorine chemistry semiconductor processingLAM RES CORP·Filed 2022·Application pending·0 cites
- 2250US2025226227A1Deposition of metal-containing films and chamber cleanLAM RES CORP·Filed 2023·Application pending·0 cites
- 2348US2023223238A1Increasing plasma uniformity in a receptacleLAM RES CORP·Filed 2021·Application pending·0 cites
- 2444US12362153B2Pedestal setup using camera waferLAM RES CORP·Filed 2020·Granted Jul 15, 2025·0 cites·10 claims
- 2544US2023038880A1Protective coating for a semiconductor reaction chamberLAM RES CORP·Filed 2020·Application pending·0 cites
- 2641US2025022696A1Apparatuses and techniques for cleaning a multi-station semiconductor processing chamberLAM RES CORP·Filed 2021·Application pending·0 cites
- 2732USD1099688SThreaded nozzle insertLAM RES CORP·Filed 2022·Granted Oct 28, 2025·0 cites·1 claims
- 2831US2012203312A1Surgical cooling deviceBATZER RACHEL ELIZABETH·Filed 2012·Application pending·0 cites
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