Inventor · disambiguated record
Yukimasa Saito
Also filed as: SAITO YUKIMASA
18 granted patents·3 pending applications·735 citations·filing 1998–2022
94Inventor score
Top patents by PatentIndex Score
21 records- 0198US6383300B1Heat treatment apparatus and cleaning method of the sameTOKYO ELECTRON LTD·Filed 1999·Granted May 7, 2002·458 cites·31 claims
- 0295US8070302B2Laminate type light-emitting diode device, and reflection type light-emitting diode unitHATANAKA MITSUYUKI·Filed 2010·Granted Dec 6, 2011·65 cites·13 claims
- 0392US6807971B2Heat treatment apparatus and cleaning method of the sameTOKYO ELECTRON LTD·Filed 2002·Granted Oct 26, 2004·56 cites·12 claims
- 0483US6159298AThermal processing systemTOKYO ELECTRON LTD·Filed 1998·Granted Dec 12, 2000·71 cites·7 claims
- 0580US10786837B2Method for cleaning chamber of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 29, 2020·3 cites·12 claims
- 0675US7479619B2Thermal processing unitTOKYO ELECTRON LTD·Filed 2006·Granted Jan 20, 2009·4 cites·9 claims
- 0774US6805968B2Members for semiconductor manufacturing apparatus and method for producing the sameTOCALO CO LTD·Filed 2002·Granted Oct 19, 2004·14 cites·10 claims
- 0873US8057046B2Projector device having assembly of reflection type light emitting diodesHATANAKA MITSUYUKI·Filed 2006·Granted Nov 15, 2011·4 cites·8 claims
- 0972US6171104B1Oxidation treatment method and apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jan 9, 2001·40 cites·11 claims
- 1071US10882330B2PrinterSATO HOLDINGS KK·Filed 2017·Granted Jan 5, 2021·1 cites·17 claims
- 1163US12172198B2Gas cluster processing device and gas cluster processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Dec 24, 2024·0 cites·7 claims
- 1263US6936108B1Heat treatment deviceTOKYO ELECTRON LTD·Filed 2000·Granted Aug 30, 2005·9 cites·1 claims
- 1358US6736636B2Thermal processor with gas supplyTOKYO ELECTRON LTD·Filed 2001·Granted May 18, 2004·6 cites·14 claims
- 1456US2014373783A1Film forming deviceTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1554US2020278084A1Gas supply method and gas supply systemTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1650US7144823B2Thermal treatment apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Dec 5, 2006·2 cites·19 claims
- 1749US11267021B2Gas cluster processing device and gas cluster processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Mar 8, 2022·0 cites·6 claims
- 1848US7044731B2Heat treatment apparatusTOKYO ELECTRON LTD·Filed 2002·Granted May 16, 2006·2 cites·11 claims
- 1938US11761075B2Substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 19, 2023·0 cites·32 claims
- 2036US2004007186A1Heat-treating deviceFiled 2001·Application pending·0 cites
- 2132US10421218B2Roller-type depressing device, imprinting device, and roller-type depressing methodSCIVAX CORP·Filed 2015·Granted Sep 24, 2019·0 cites·11 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →