Inventor · disambiguated record
Masaya Nagato
Also filed as: NAGATO MASAYA
12 granted patents·2 pending applications·9 citations·filing 2017–2025
83Inventor score
Top patents by PatentIndex Score
14 records- 0196US11527402B2Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2020·Granted Dec 13, 2022·4 cites·20 claims
- 0288US10156012B2Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and a non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2017·Granted Dec 18, 2018·3 cites·15 claims
- 0386US11961733B2Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2021·Granted Apr 16, 2024·1 cites·23 claims
- 0474US2025327175A1Method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 0573US12424437B2Processing method, method of manufacturing semiconductor device, processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Granted Sep 23, 2025·0 cites·23 claims
- 0671US11978623B2Method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Granted May 7, 2024·0 cites·23 claims
- 0769US10096463B2Method of manufacturing semiconductor device, substrate processing apparatus comprising exhaust port and multiple nozzles, and recording mediumHITACHI INT ELECTRIC INC·Filed 2017·Granted Oct 9, 2018·1 cites·15 claims
- 0855US12371782B2Method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2020·Granted Jul 29, 2025·0 cites·19 claims
- 0947US10968517B2Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2018·Granted Apr 6, 2021·0 cites·13 claims
- 1045US12094708B2Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2018·Granted Sep 17, 2024·0 cites·12 claims
- 1145US9976214B2Cleaning method and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2017·Granted May 22, 2018·0 cites·17 claims
- 1242US10910214B2Method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumHITACHI INT ELECTRIC INC·Filed 2018·Granted Feb 2, 2021·0 cites·14 claims
- 1341US10586698B2Method of manufacturing semiconductor device, substrate processing apparatus and recording mediumHITACHI INT ELECTRIC INC·Filed 2017·Granted Mar 10, 2020·0 cites·16 claims
- 1439US2019127848A1Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording MediumKOKUSAI ELECTRIC CORP·Filed 2018·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →