Inventor · disambiguated record
You-Jung Park
Also filed as: PARK YOU-JUNG
10 granted patents·1 pending application·7 citations·filing 2013–2015
79Inventor score
Top patents by PatentIndex Score
11 records- 0176US10066057B2Organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Sep 4, 2018·2 cites·20 claims
- 0276US9665003B2Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2014·Granted May 30, 2017·3 cites·18 claims
- 0365US9529257B2Hard mask composition and method for forming pattern using sameCHEIL IND INC·Filed 2013·Granted Dec 27, 2016·1 cites·15 claims
- 0463US9513546B2Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask compositionCHEIL IND INC·Filed 2013·Granted Dec 6, 2016·1 cites·13 claims
- 0552US9823566B2Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask compositionCHEIL IND INC·Filed 2013·Granted Nov 21, 2017·0 cites·20 claims
- 0642US2015187566A1Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 0738US10345706B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionSONG HYUN JI·Filed 2014·Granted Jul 9, 2019·0 cites·10 claims
- 0838US10332751B2Monomer, organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 25, 2019·0 cites·15 claims
- 0936US8900997B2Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewithMOON JOON-YOUNG·Filed 2013·Granted Dec 2, 2014·0 cites·8 claims
- 1032US10018914B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·5 claims
- 1130US9908990B2Organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Mar 6, 2018·0 cites·19 claims
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